SG11201803090WA - Process for creating nanometric structures by self-assembly of diblock copolymers - Google Patents
Process for creating nanometric structures by self-assembly of diblock copolymersInfo
- Publication number
- SG11201803090WA SG11201803090WA SG11201803090WA SG11201803090WA SG11201803090WA SG 11201803090W A SG11201803090W A SG 11201803090WA SG 11201803090W A SG11201803090W A SG 11201803090WA SG 11201803090W A SG11201803090W A SG 11201803090WA SG 11201803090W A SG11201803090W A SG 11201803090WA
- Authority
- SG
- Singapore
- Prior art keywords
- creating
- self
- assembly
- diblock copolymers
- nanometric structures
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1560161A FR3042794B1 (en) | 2015-10-23 | 2015-10-23 | PROCESS FOR CREATING NANOMETRIC STRUCTURES BY SELF-ASSEMBLY OF DI-BLOCK COPOLYMERS |
PCT/FR2016/052592 WO2017068259A1 (en) | 2015-10-23 | 2016-10-07 | Process for creating nanometric structures by self-assembly of diblock copolymers |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201803090WA true SG11201803090WA (en) | 2018-05-30 |
Family
ID=55646675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201803090WA SG11201803090WA (en) | 2015-10-23 | 2016-10-07 | Process for creating nanometric structures by self-assembly of diblock copolymers |
Country Status (9)
Country | Link |
---|---|
US (1) | US20200231731A1 (en) |
EP (1) | EP3365400A1 (en) |
JP (1) | JP6777736B2 (en) |
KR (1) | KR102191958B1 (en) |
CN (1) | CN108473812A (en) |
FR (1) | FR3042794B1 (en) |
SG (1) | SG11201803090WA (en) |
TW (1) | TWI655229B (en) |
WO (1) | WO2017068259A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111065965B (en) * | 2017-09-13 | 2023-11-03 | 株式会社Lg化学 | Method for preparing patterned substrate |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11322869A (en) * | 1998-05-19 | 1999-11-26 | Jsr Corp | Production of block copolymer |
CN100588426C (en) * | 2007-01-11 | 2010-02-10 | 中国科学院过程工程研究所 | Temperature sensing parents block polymer/iron oxide magnetic nano-carrier and its production and use |
EP2597113A1 (en) * | 2007-12-27 | 2013-05-29 | Bausch & Lomb Incorporated | Coating solutions comprising segmented reactive block copolymers |
US8304493B2 (en) * | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
FR3010414B1 (en) * | 2013-09-09 | 2015-09-25 | Arkema France | PROCESS FOR OBTAINING NANO-STRUCTURED THICK FILMS OBTAINED FROM A BLOCK COPOLYMER COMPOSITION |
FR3010412B1 (en) * | 2013-09-09 | 2016-10-21 | Arkema France | PROCESS FOR OBTAINING NANO-STRUCTURE THICK FILMS OBTAINED FROM BLOCK COPOLYMERS |
FR3014888B1 (en) * | 2013-12-13 | 2017-05-26 | Arkema France | PROCESS FOR CREATING NANOMETRIC STRUCTURES BY SELF-ASSEMBLING BLOCK COPOLYMERS |
FR3014887B1 (en) * | 2013-12-13 | 2017-05-26 | Arkema France | PROCESS FOR CREATING NANOMETRIC STRUCTURES BY SELF-ASSEMBLING BLOCK COPOLYMERS |
JP2015129261A (en) * | 2013-12-31 | 2015-07-16 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | Method of annealing block copolymer, article produced from block copolymer |
-
2015
- 2015-10-23 FR FR1560161A patent/FR3042794B1/en not_active Expired - Fee Related
-
2016
- 2016-10-07 WO PCT/FR2016/052592 patent/WO2017068259A1/en active Application Filing
- 2016-10-07 SG SG11201803090WA patent/SG11201803090WA/en unknown
- 2016-10-07 EP EP16793948.7A patent/EP3365400A1/en not_active Withdrawn
- 2016-10-07 KR KR1020187013891A patent/KR102191958B1/en active IP Right Grant
- 2016-10-07 CN CN201680062091.9A patent/CN108473812A/en active Pending
- 2016-10-07 JP JP2018520591A patent/JP6777736B2/en active Active
- 2016-10-07 US US15/768,976 patent/US20200231731A1/en not_active Abandoned
- 2016-10-18 TW TW105133588A patent/TWI655229B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20200231731A1 (en) | 2020-07-23 |
FR3042794B1 (en) | 2020-03-27 |
KR20180072730A (en) | 2018-06-29 |
FR3042794A1 (en) | 2017-04-28 |
TW201726768A (en) | 2017-08-01 |
TWI655229B (en) | 2019-04-01 |
JP6777736B2 (en) | 2020-10-28 |
JP2018534132A (en) | 2018-11-22 |
CN108473812A (en) | 2018-08-31 |
KR102191958B1 (en) | 2020-12-16 |
EP3365400A1 (en) | 2018-08-29 |
WO2017068259A1 (en) | 2017-04-27 |
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