SG11201508901XA - Reflective mask blank and method for manufacturing same, reflective mask, and method for manufacturing semiconductor device - Google Patents
Reflective mask blank and method for manufacturing same, reflective mask, and method for manufacturing semiconductor deviceInfo
- Publication number
- SG11201508901XA SG11201508901XA SG11201508901XA SG11201508901XA SG11201508901XA SG 11201508901X A SG11201508901X A SG 11201508901XA SG 11201508901X A SG11201508901X A SG 11201508901XA SG 11201508901X A SG11201508901X A SG 11201508901XA SG 11201508901X A SG11201508901X A SG 11201508901XA
- Authority
- SG
- Singapore
- Prior art keywords
- reflective mask
- manufacturing
- semiconductor device
- mask blank
- manufacturing semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 2
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Physical Vapour Deposition (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013193070 | 2013-09-18 | ||
| PCT/JP2014/072689 WO2015041023A1 (ja) | 2013-09-18 | 2014-08-29 | 反射型マスクブランク及びその製造方法、反射型マスク並びに半導体装置の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201508901XA true SG11201508901XA (en) | 2015-11-27 |
Family
ID=52688678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201508901XA SG11201508901XA (en) | 2013-09-18 | 2014-08-29 | Reflective mask blank and method for manufacturing same, reflective mask, and method for manufacturing semiconductor device |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9726969B2 (ja) |
| JP (2) | JP5716146B1 (ja) |
| KR (2) | KR20170120212A (ja) |
| SG (1) | SG11201508901XA (ja) |
| TW (2) | TWI526774B (ja) |
| WO (1) | WO2015041023A1 (ja) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6069609B2 (ja) * | 2015-03-26 | 2017-02-01 | 株式会社リガク | 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法 |
| JP6739960B2 (ja) * | 2016-03-28 | 2020-08-12 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及び半導体装置の製造方法 |
| KR20180057813A (ko) | 2016-11-22 | 2018-05-31 | 삼성전자주식회사 | 극자외선 리소그래피용 위상 반전 마스크 |
| KR20190117745A (ko) * | 2017-03-02 | 2019-10-16 | 호야 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크 및 그 제조 방법, 그리고 반도체 장치의 제조 방법 |
| JP6861095B2 (ja) * | 2017-03-03 | 2021-04-21 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及び半導体装置の製造方法 |
| KR20240025717A (ko) * | 2017-03-03 | 2024-02-27 | 호야 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크 및 반도체 장치의 제조 방법 |
| KR102631490B1 (ko) * | 2017-09-07 | 2024-01-30 | 가부시키가이샤 니콘 | 포토마스크 블랭크, 포토마스크, 노광 방법, 및 디바이스의 제조 방법 |
| JP6845122B2 (ja) * | 2017-11-27 | 2021-03-17 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法 |
| US11619875B2 (en) | 2020-06-29 | 2023-04-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV photo masks and manufacturing method thereof |
| TWI777614B (zh) * | 2021-06-11 | 2022-09-11 | 達運精密工業股份有限公司 | 金屬遮罩及其製造方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05189756A (ja) * | 1991-08-22 | 1993-07-30 | Hitachi Metals Ltd | 磁気記録媒体 |
| JPH0785463A (ja) * | 1993-09-20 | 1995-03-31 | A G Technol Kk | 磁気ディスク |
| JP2002288823A (ja) | 2002-03-14 | 2002-10-04 | Nippon Sheet Glass Co Ltd | 情報記録媒体用基板の製造方法 |
| JP2004199846A (ja) | 2002-10-23 | 2004-07-15 | Nippon Sheet Glass Co Ltd | 磁気記録媒体用ガラス基板及びその製造方法 |
| US7504185B2 (en) | 2005-10-03 | 2009-03-17 | Asahi Glass Company, Limited | Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography |
| JP2007272995A (ja) * | 2006-03-31 | 2007-10-18 | Hoya Corp | 磁気ディスク装置および非磁性基板の良否判定方法、磁気ディスク、並びに磁気ディスク装置 |
| JP4867695B2 (ja) | 2006-04-21 | 2012-02-01 | 旭硝子株式会社 | Ｅｕｖリソグラフィ用反射型マスクブランク |
| CN102077279B (zh) | 2008-06-30 | 2012-06-20 | Hoya株式会社 | 磁盘用基板以及磁盘 |
| JP5136647B2 (ja) | 2008-09-05 | 2013-02-06 | 旭硝子株式会社 | Ｅｕｖリソグラフィ用反射型マスクブランクおよびその製造方法 |
| KR101640333B1 (ko) | 2012-03-30 | 2016-07-15 | 호야 가부시키가이샤 | 마스크 블랭크용 기판, 다층 반사막 부착 기판, 투과형 마스크 블랭크, 반사형 마스크 블랭크, 투과형 마스크, 반사형 마스크 및 반도체 장치의 제조 방법 |
-
2014
- 2014-08-29 KR KR1020177030342A patent/KR20170120212A/ko not_active Application Discontinuation
- 2014-08-29 KR KR1020157031337A patent/KR101875790B1/ko active IP Right Grant
- 2014-08-29 US US14/787,532 patent/US9726969B2/en active Active
- 2014-08-29 TW TW103130024A patent/TWI526774B/zh active
- 2014-08-29 TW TW105100315A patent/TW201614363A/zh unknown
- 2014-08-29 JP JP2015504435A patent/JP5716146B1/ja active Active
- 2014-08-29 SG SG11201508901XA patent/SG11201508901XA/en unknown
- 2014-08-29 WO PCT/JP2014/072689 patent/WO2015041023A1/ja active Application Filing
-
2015
- 2015-03-16 JP JP2015052133A patent/JP2015156494A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20160055724A (ko) | 2016-05-18 |
| US9726969B2 (en) | 2017-08-08 |
| JPWO2015041023A1 (ja) | 2017-03-02 |
| TW201614363A (en) | 2016-04-16 |
| WO2015041023A1 (ja) | 2015-03-26 |
| TW201514608A (zh) | 2015-04-16 |
| JP5716146B1 (ja) | 2015-05-13 |
| US20160238925A1 (en) | 2016-08-18 |
| KR101875790B1 (ko) | 2018-07-06 |
| KR20170120212A (ko) | 2017-10-30 |
| TWI526774B (zh) | 2016-03-21 |
| JP2015156494A (ja) | 2015-08-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SG11201508899TA (en) | Reflective mask blank, method for manufacturing reflective mask blank, reflective mask, and method for manufacturing semiconductor device | |
| HK1214408A1 (zh) | 半導體裝置及其製造方法 | |
| HK1205357A1 (en) | Semiconductor device and method for manufacturing the same | |
| EP2930741A4 (en) | SEMICONDUCTOR COMPONENT AND METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT | |
| EP3082160A4 (en) | Semiconductor device and manufacturing method thereof | |
| SG10201406149PA (en) | Semiconductor Device And Method For Manufacturing The Same | |
| EP2833405A4 (en) | SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF | |
| EP2985790A4 (en) | SEMICONDUCTOR COMPONENT AND SEMICONDUCTOR COMPONENT MANUFACTURING METHOD | |
| SG11201508901XA (en) | Reflective mask blank and method for manufacturing same, reflective mask, and method for manufacturing semiconductor device | |
| SG10201911825SA (en) | Insulating film, method for manufacturing semiconductor device, and semiconductor device | |
| EP2960925A4 (en) | COMPOSITE SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | |
| EP2944248A4 (en) | METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT, SEMICONDUCTOR COMPONENT AND ENDOSCOPE | |
| HK1210869A1 (en) | Semiconductor device and method for manufacturing the same | |
| HK1219347A1 (zh) | 半導體裝置及其製造方法 | |
| HK1198562A1 (en) | Method of manufacturing semiconductor device, and semiconductor device | |
| EP2955748A4 (en) | SEMICONDUCTOR COMPONENT AND METHOD FOR THE PRODUCTION THEREOF | |
| SG11201508291QA (en) | Semiconductor device and method for manufacturing semiconductor device | |
| EP3067920A4 (en) | Semiconductor device and method for producing same | |
| EP3021353A4 (en) | Silicon-carbide semiconductor device and method for manufacturing silicon-carbide semiconductor device | |
| EP2980176A4 (en) | PRODUCTION METHOD FOR LAMINATED FILM, LAMINATED FILM, AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE USING THE SAME | |
| SG11201505421SA (en) | Method for manufacturing mask blank substrate, method for manufacturing mask blank and method for manufacturing transfer mask | |
| TWI562316B (en) | Semiconductor device and method for fabricating the same | |
| EP3010043A4 (en) | Semiconductor device and manufacturing method therefor | |
| SG11201505894RA (en) | Sealing sheet for semiconductor element, semiconductor device, and semiconductor device production method | |
| EP3024018A4 (en) | Semiconductor device, and method for manufacturing same |