SG11201502885SA - Rf pulse edge shaping - Google Patents
Rf pulse edge shapingInfo
- Publication number
- SG11201502885SA SG11201502885SA SG11201502885SA SG11201502885SA SG11201502885SA SG 11201502885S A SG11201502885S A SG 11201502885SA SG 11201502885S A SG11201502885S A SG 11201502885SA SG 11201502885S A SG11201502885S A SG 11201502885SA SG 11201502885S A SG11201502885S A SG 11201502885SA
- Authority
- SG
- Singapore
- Prior art keywords
- pulse edge
- edge shaping
- shaping
- pulse
- edge
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K4/00—Generating pulses having essentially a finite slope or stepped portions
- H03K4/02—Generating pulses having essentially a finite slope or stepped portions having stepped portions, e.g. staircase waveform
- H03K4/026—Generating pulses having essentially a finite slope or stepped portions having stepped portions, e.g. staircase waveform using digital techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32146—Amplitude modulation, includes pulsing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K5/00—Manipulating of pulses not covered by one of the other main groups of this subclass
- H03K5/00006—Changing the frequency
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Nonlinear Science (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/663,574 US8736377B2 (en) | 2012-10-30 | 2012-10-30 | RF pulse edge shaping |
| PCT/US2013/066499 WO2014070566A1 (fr) | 2012-10-30 | 2013-10-24 | Mise en forme de bord d'impulsion rf |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201502885SA true SG11201502885SA (en) | 2015-06-29 |
Family
ID=50546491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201502885SA SG11201502885SA (en) | 2012-10-30 | 2013-10-24 | Rf pulse edge shaping |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8736377B2 (fr) |
| EP (2) | EP2915252B1 (fr) |
| JP (1) | JP6169714B2 (fr) |
| KR (1) | KR101932154B1 (fr) |
| CN (1) | CN104798303B (fr) |
| SG (1) | SG11201502885SA (fr) |
| TW (1) | TWI544840B (fr) |
| WO (1) | WO2014070566A1 (fr) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8952765B2 (en) * | 2012-03-23 | 2015-02-10 | Mks Instruments, Inc. | System and methods of bimodal automatic power and frequency tuning of RF generators |
| US9865432B1 (en) | 2014-01-10 | 2018-01-09 | Reno Technologies, Inc. | RF impedance matching network |
| US9755641B1 (en) | 2014-01-10 | 2017-09-05 | Reno Technologies, Inc. | High speed high voltage switching circuit |
| US10431428B2 (en) | 2014-01-10 | 2019-10-01 | Reno Technologies, Inc. | System for providing variable capacitance |
| US10455729B2 (en) | 2014-01-10 | 2019-10-22 | Reno Technologies, Inc. | Enclosure cooling system |
| US9844127B2 (en) | 2014-01-10 | 2017-12-12 | Reno Technologies, Inc. | High voltage switching circuit |
| US9697991B2 (en) | 2014-01-10 | 2017-07-04 | Reno Technologies, Inc. | RF impedance matching network |
| US9496122B1 (en) | 2014-01-10 | 2016-11-15 | Reno Technologies, Inc. | Electronically variable capacitor and RF matching network incorporating same |
| US9196459B2 (en) | 2014-01-10 | 2015-11-24 | Reno Technologies, Inc. | RF impedance matching network |
| US10049857B2 (en) * | 2014-12-04 | 2018-08-14 | Mks Instruments, Inc. | Adaptive periodic waveform controller |
| TWI574296B (zh) * | 2014-12-04 | 2017-03-11 | 萬機科技股份有限公司 | 功率輸出產生系統與適用於週期性波形之方法 |
| US9536749B2 (en) * | 2014-12-15 | 2017-01-03 | Lam Research Corporation | Ion energy control by RF pulse shape |
| US10340879B2 (en) | 2015-02-18 | 2019-07-02 | Reno Technologies, Inc. | Switching circuit |
| US11017983B2 (en) | 2015-02-18 | 2021-05-25 | Reno Technologies, Inc. | RF power amplifier |
| US9306533B1 (en) | 2015-02-20 | 2016-04-05 | Reno Technologies, Inc. | RF impedance matching network |
| US9525412B2 (en) | 2015-02-18 | 2016-12-20 | Reno Technologies, Inc. | Switching circuit |
| US9729122B2 (en) | 2015-02-18 | 2017-08-08 | Reno Technologies, Inc. | Switching circuit |
| US12119206B2 (en) | 2015-02-18 | 2024-10-15 | Asm America, Inc. | Switching circuit |
| US11081316B2 (en) | 2015-06-29 | 2021-08-03 | Reno Technologies, Inc. | Impedance matching network and method |
| US11150283B2 (en) | 2015-06-29 | 2021-10-19 | Reno Technologies, Inc. | Amplitude and phase detection circuit |
| US10984986B2 (en) | 2015-06-29 | 2021-04-20 | Reno Technologies, Inc. | Impedance matching network and method |
| US11342160B2 (en) | 2015-06-29 | 2022-05-24 | Reno Technologies, Inc. | Filter for impedance matching |
| US11335540B2 (en) | 2015-06-29 | 2022-05-17 | Reno Technologies, Inc. | Impedance matching network and method |
| US10692699B2 (en) | 2015-06-29 | 2020-06-23 | Reno Technologies, Inc. | Impedance matching with restricted capacitor switching |
| US11342161B2 (en) | 2015-06-29 | 2022-05-24 | Reno Technologies, Inc. | Switching circuit with voltage bias |
| US9721758B2 (en) * | 2015-07-13 | 2017-08-01 | Mks Instruments, Inc. | Unified RF power delivery single input, multiple output control for continuous and pulse mode operation |
| KR20170075887A (ko) * | 2015-12-23 | 2017-07-04 | 삼성전자주식회사 | 플라즈마 처리 장치, 그의 플라즈마 처리 방법, 및 플라즈마 식각 방법 |
| US11615943B2 (en) * | 2017-07-07 | 2023-03-28 | Advanced Energy Industries, Inc. | Inter-period control for passive power distribution of multiple electrode inductive plasma source |
| US11651939B2 (en) * | 2017-07-07 | 2023-05-16 | Advanced Energy Industries, Inc. | Inter-period control system for plasma power delivery system and method of operating same |
| EP3616235B1 (fr) * | 2017-07-07 | 2024-10-09 | Advanced Energy Industries, Inc. | Système de commande inter-périodique pour système de fourniture de puissance de plasma et son procédé de fonctionnement |
| US11393659B2 (en) | 2017-07-10 | 2022-07-19 | Reno Technologies, Inc. | Impedance matching network and method |
| US11114280B2 (en) | 2017-07-10 | 2021-09-07 | Reno Technologies, Inc. | Impedance matching with multi-level power setpoint |
| US11289307B2 (en) | 2017-07-10 | 2022-03-29 | Reno Technologies, Inc. | Impedance matching network and method |
| US11315758B2 (en) | 2017-07-10 | 2022-04-26 | Reno Technologies, Inc. | Impedance matching using electronically variable capacitance and frequency considerations |
| US10714314B1 (en) | 2017-07-10 | 2020-07-14 | Reno Technologies, Inc. | Impedance matching network and method |
| US10727029B2 (en) | 2017-07-10 | 2020-07-28 | Reno Technologies, Inc | Impedance matching using independent capacitance and frequency control |
| US11521833B2 (en) | 2017-07-10 | 2022-12-06 | Reno Technologies, Inc. | Combined RF generator and RF solid-state matching network |
| US11101110B2 (en) | 2017-07-10 | 2021-08-24 | Reno Technologies, Inc. | Impedance matching network and method |
| US10483090B2 (en) | 2017-07-10 | 2019-11-19 | Reno Technologies, Inc. | Restricted capacitor switching |
| US11476091B2 (en) | 2017-07-10 | 2022-10-18 | Reno Technologies, Inc. | Impedance matching network for diagnosing plasma chamber |
| US11398370B2 (en) | 2017-07-10 | 2022-07-26 | Reno Technologies, Inc. | Semiconductor manufacturing using artificial intelligence |
| US20200058469A1 (en) * | 2018-08-14 | 2020-02-20 | Tokyo Electron Limited | Systems and methods of control for plasma processing |
| KR102126937B1 (ko) * | 2018-12-03 | 2020-06-25 | 주식회사 뉴파워 프라즈마 | 역방향 전력 저감 방법 및 이를 이용한 플라즈마 전력 장치 |
| CN114041201A (zh) | 2019-04-29 | 2022-02-11 | 朗姆研究公司 | 用于rf等离子体工具中的多级脉冲的系统和方法 |
| US11538662B2 (en) | 2019-05-21 | 2022-12-27 | Reno Technologies, Inc. | Impedance matching network and method with reduced memory requirements |
| US11328902B1 (en) | 2021-06-09 | 2022-05-10 | XP Power Limited | Radio frequency generator providing complex RF pulse pattern |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4372315A (en) * | 1980-07-03 | 1983-02-08 | Hair Free Centers | Impedance sensing epilator |
| US5450088A (en) * | 1992-11-25 | 1995-09-12 | Texas Instruments Deutschland Gmbh | Transponder arrangement |
| KR0183844B1 (ko) * | 1996-04-30 | 1999-05-15 | 김광호 | 알에프 발생 장치 및 이를 이용한 펄스 플라즈마 형성 방법 |
| KR100560886B1 (ko) * | 1997-09-17 | 2006-03-13 | 동경 엘렉트론 주식회사 | 가스 플라즈마 프로세스를 감시 및 제어하기 위한 시스템및 방법 |
| US6472822B1 (en) * | 2000-04-28 | 2002-10-29 | Applied Materials, Inc. | Pulsed RF power delivery for plasma processing |
| US6459067B1 (en) * | 2001-04-06 | 2002-10-01 | Eni Technology, Inc. | Pulsing intelligent RF modulation controller |
| US6586887B1 (en) * | 2002-03-06 | 2003-07-01 | Hitachi High-Technologies Corporation | High-frequency power supply apparatus for plasma generation apparatus |
| JP4141803B2 (ja) * | 2002-11-05 | 2008-08-27 | シャープ株式会社 | プラズマ処理装置 |
| EP1671347B1 (fr) * | 2003-09-22 | 2015-02-11 | MKS Instruments, Inc. | Procédé et dispositif permettant d'empêcher les instabilités dans un traitement au plasma radiofréquence |
| EP1701376B1 (fr) * | 2005-03-10 | 2006-11-08 | HÜTTINGER Elektronik GmbH + Co. KG | Generateur de plasma sous vide |
| JP4317826B2 (ja) * | 2005-03-10 | 2009-08-19 | パナソニック株式会社 | ジッタ検出装置 |
| US20080179948A1 (en) * | 2005-10-31 | 2008-07-31 | Mks Instruments, Inc. | Radio frequency power delivery system |
| US7453306B2 (en) * | 2005-11-07 | 2008-11-18 | Jds Uniphase Corporation | Pulse shaping circuit |
| US20090004836A1 (en) * | 2007-06-29 | 2009-01-01 | Varian Semiconductor Equipment Associates, Inc. | Plasma doping with enhanced charge neutralization |
| US9123509B2 (en) * | 2007-06-29 | 2015-09-01 | Varian Semiconductor Equipment Associates, Inc. | Techniques for plasma processing a substrate |
| US8134394B1 (en) * | 2008-03-18 | 2012-03-13 | University Of South Florida | RF microwave circuit and pulse shaping method |
| US8040068B2 (en) * | 2009-02-05 | 2011-10-18 | Mks Instruments, Inc. | Radio frequency power control system |
| US8659335B2 (en) * | 2009-06-25 | 2014-02-25 | Mks Instruments, Inc. | Method and system for controlling radio frequency power |
| KR101322539B1 (ko) * | 2009-08-07 | 2013-10-28 | 가부시끼가이샤교산세이사꾸쇼 | 펄스 변조 고주파 전력 제어 방법 및 펄스 변조 고주파 전원 장치 |
| CN101777891A (zh) * | 2009-12-18 | 2010-07-14 | 广东正业科技股份有限公司 | 超快边沿阶跃脉冲发生方法及其发生器 |
| US8436643B2 (en) * | 2010-11-04 | 2013-05-07 | Advanced Energy Industries, Inc. | High frequency solid state switching for impedance matching |
| WO2012094416A1 (fr) * | 2011-01-04 | 2012-07-12 | Advanced Energy Industries, Inc. | Fourniture de puissance au niveau système à une charge de traitement de plasma |
| JP5748204B2 (ja) * | 2011-03-03 | 2015-07-15 | 株式会社ダイヘン | 高周波電源装置 |
-
2012
- 2012-10-30 US US13/663,574 patent/US8736377B2/en active Active
-
2013
- 2013-10-24 CN CN201380057321.9A patent/CN104798303B/zh active Active
- 2013-10-24 SG SG11201502885SA patent/SG11201502885SA/en unknown
- 2013-10-24 WO PCT/US2013/066499 patent/WO2014070566A1/fr active Application Filing
- 2013-10-24 EP EP13851251.2A patent/EP2915252B1/fr active Active
- 2013-10-24 KR KR1020157014111A patent/KR101932154B1/ko active IP Right Grant
- 2013-10-24 JP JP2015539775A patent/JP6169714B2/ja active Active
- 2013-10-24 EP EP19195244.9A patent/EP3637617A1/fr active Pending
- 2013-10-30 TW TW102139338A patent/TWI544840B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016503558A (ja) | 2016-02-04 |
| JP6169714B2 (ja) | 2017-07-26 |
| EP2915252A1 (fr) | 2015-09-09 |
| EP3637617A1 (fr) | 2020-04-15 |
| US20140118031A1 (en) | 2014-05-01 |
| KR20150080589A (ko) | 2015-07-09 |
| CN104798303A (zh) | 2015-07-22 |
| TWI544840B (zh) | 2016-08-01 |
| US8736377B2 (en) | 2014-05-27 |
| WO2014070566A1 (fr) | 2014-05-08 |
| EP2915252B1 (fr) | 2019-10-16 |
| EP2915252A4 (fr) | 2016-12-14 |
| KR101932154B1 (ko) | 2018-12-24 |
| TW201417633A (zh) | 2014-05-01 |
| CN104798303B (zh) | 2017-07-07 |
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