SG11201408492QA - Reduction of radiation thermometry bias errors in a cvd reactor - Google Patents

Reduction of radiation thermometry bias errors in a cvd reactor

Info

Publication number
SG11201408492QA
SG11201408492QA SG11201408492QA SG11201408492QA SG11201408492QA SG 11201408492Q A SG11201408492Q A SG 11201408492QA SG 11201408492Q A SG11201408492Q A SG 11201408492QA SG 11201408492Q A SG11201408492Q A SG 11201408492QA SG 11201408492Q A SG11201408492Q A SG 11201408492QA
Authority
SG
Singapore
Prior art keywords
radiation
lllll
international
plainview
llll
Prior art date
Application number
SG11201408492QA
Other languages
English (en)
Inventor
Guray Tas
Jing Zhou
Daewon Kwon
Original Assignee
Veeco Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/531,162 external-priority patent/US9448119B2/en
Priority claimed from US13/531,220 external-priority patent/US9085824B2/en
Application filed by Veeco Instr Inc filed Critical Veeco Instr Inc
Publication of SG11201408492QA publication Critical patent/SG11201408492QA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/07—Arrangements for adjusting the solid angle of collected radiation, e.g. adjusting or orienting field of view, tracking position or encoding angular position
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma & Fusion (AREA)
  • Radiation Pyrometers (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Measurement Of Radiation (AREA)
  • Chemical Vapour Deposition (AREA)
SG11201408492QA 2012-06-22 2013-06-21 Reduction of radiation thermometry bias errors in a cvd reactor SG11201408492QA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/531,162 US9448119B2 (en) 2012-06-22 2012-06-22 Radiation thermometer using off-focus telecentric optics
US13/531,220 US9085824B2 (en) 2012-06-22 2012-06-22 Control of stray radiation in a CVD chamber
PCT/US2013/047024 WO2013192510A1 (en) 2012-06-22 2013-06-21 Reduction of radiation thermometry bias errors in a cvd reactor

Publications (1)

Publication Number Publication Date
SG11201408492QA true SG11201408492QA (en) 2015-01-29

Family

ID=49769419

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201408492QA SG11201408492QA (en) 2012-06-22 2013-06-21 Reduction of radiation thermometry bias errors in a cvd reactor

Country Status (7)

Country Link
JP (1) JP2015528106A (zh)
KR (1) KR101679995B1 (zh)
CN (2) CN107267964B (zh)
DE (1) DE112013003131T5 (zh)
SG (1) SG11201408492QA (zh)
TW (1) TWI576570B (zh)
WO (1) WO2013192510A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103776548A (zh) * 2014-02-14 2014-05-07 丹纳赫（上海）工业仪器技术研发有限公司 红外测温仪以及用于测量能量区域的温度的方法
JP6274578B2 (ja) * 2015-01-09 2018-02-07 信越半導体株式会社 エピタキシャルウェーハの製造方法
JP6574344B2 (ja) * 2015-06-23 2019-09-11 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法
DK3287190T3 (da) * 2016-08-26 2020-08-10 aquila biolabs GmbH Fremgangsmåde til at overvåge en målprocesparameter
JP6824080B2 (ja) 2017-03-17 2021-02-03 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および放射温度計の測定位置調整方法
CN108254912B (zh) * 2018-01-23 2020-03-27 电子科技大学 一种用于氮化物mocvd外延生长模式的实时显微监测系统
AU2019288652B2 (en) * 2018-06-22 2023-06-08 Avava, Inc. Feedback detection for a treatment device
CN110006533A (zh) * 2019-04-11 2019-07-12 中国航发湖南动力机械研究所 用于抑制辐射源尺寸效应的器件及辐射测温计

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57200827A (en) * 1981-06-04 1982-12-09 Kansai Coke & Chem Co Ltd Temperature measuring method of combustion chamber in coke oven
JPH07104210B2 (ja) * 1987-03-27 1995-11-13 ミノルタ株式会社 放射温度計
US5209570A (en) * 1989-05-30 1993-05-11 Deutsche Forschungsanstalt Fur Luft- Und Raumfahrt E.V. Device for measuring the radiation temperature of a melt in vacuum
US6411377B1 (en) * 1991-04-02 2002-06-25 Hitachi, Ltd. Optical apparatus for defect and particle size inspection
JP4240754B2 (ja) * 1999-05-11 2009-03-18 コニカミノルタセンシング株式会社 テレセントリック光学系
US6614539B1 (en) * 1999-05-11 2003-09-02 Minolta Co., Ltd. Telecentric optical system
AU775563B2 (en) * 1999-05-14 2004-08-05 Brandeis University Nucleic acid-based detection
US6680377B1 (en) * 1999-05-14 2004-01-20 Brandeis University Nucleic acid-based detection
US6310347B1 (en) * 1999-06-29 2001-10-30 Goodrich Corporation Spectrometer with planar reflective slit to minimize thermal background at focal plane
US7136159B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Excimer laser inspection system
US6492625B1 (en) * 2000-09-27 2002-12-10 Emcore Corporation Apparatus and method for controlling temperature uniformity of substrates
JP2002122480A (ja) * 2000-10-12 2002-04-26 Toshiba Corp 温度測定方法および装置、並びにプラズマ処理装置
CN1295745C (zh) * 2001-05-23 2007-01-17 马特森热力产品有限责任公司 用于热处理衬底的方法和装置
JP4873242B2 (ja) * 2004-06-22 2012-02-08 株式会社ニコン ベストフォーカス検出方法及び露光方法、並びに露光装置
US7275861B2 (en) * 2005-01-31 2007-10-02 Veeco Instruments Inc. Calibration wafer and method of calibrating in situ temperatures
US7946759B2 (en) * 2007-02-16 2011-05-24 Applied Materials, Inc. Substrate temperature measurement by infrared transmission
EP2299250B1 (en) * 2009-09-17 2014-04-23 LayTec Aktiengesellschaft Pyrometer adapted for detecting UV-radiation and use thereof
US9121760B2 (en) * 2010-01-27 2015-09-01 Ci Systems Ltd. Room-temperature filtering for passive infrared imaging
JP5565458B2 (ja) * 2010-03-31 2014-08-06 コニカミノルタ株式会社 測定用光学系ならびにそれを用いた色彩輝度計および色彩計

Also Published As

Publication number Publication date
KR20150021119A (ko) 2015-02-27
CN107267964A (zh) 2017-10-20
TWI576570B (zh) 2017-04-01
DE112013003131T5 (de) 2015-04-16
CN107267964B (zh) 2020-06-05
KR101679995B1 (ko) 2016-12-06
JP2015528106A (ja) 2015-09-24
TW201403037A (zh) 2014-01-16
CN104520470A (zh) 2015-04-15
CN104520470B (zh) 2017-05-17
WO2013192510A1 (en) 2013-12-27

Similar Documents

Publication Publication Date Title
SG11201408492QA (en) Reduction of radiation thermometry bias errors in a cvd reactor
SG11201901642XA (en) Constitutively active cytokine receptors for cell therapy
SG11201407017WA (en) Site-specific labeling methods and molecules produced thereby
SG11201407610WA (en) Cd33 antibodies and use of same to treat cancer
SG11201806442YA (en) Systems and methods for calibrating an optical distance sensor
SG11201908847TA (en) Apparatuses, systems and methods for imaging flow cytometry
SG11201407793TA (en) Compounds and compositions for modulating egfr activity
SG11201811468UA (en) Fluid control
SG11201408781YA (en) Process for acrylate production
SG11201408385TA (en) Methods of detecting diseases or conditions
SG11201809913PA (en) Methods for detecting target nucleic acids in a sample
SG11201804234UA (en) Devices and methods for a rotary joint with multiple wireless links
SG11201906699WA (en) Systems and methods for supporting multiple automated workflows
SG11201809795VA (en) Memory access techniques in memory devices with multiple partitions
SG11201809830WA (en) Selective reduction of cysteine-engineered antibodies
SG11201808528VA (en) Modified wound dressings
SG11201407292QA (en) Kernel-level security agent
SG11201809393PA (en) Optical rotation angle measuring system
SG11201407473XA (en) Nontransactional store instruction
SG11201407362YA (en) Total money management system
SG11201407907XA (en) Apparatus and method for film formation
SG11201407972RA (en) High-affinity monoclonal antibodies to glypican-3 and use thereof
SG11201408069XA (en) Hair styling device
SG11201803468UA (en) Delayed control feedback in a time division duplex carrier utilizing common bursts
SG11201806778UA (en) Wireless positioning pen with pressure-sensitive tip