SG11201404960TA - Method for temporary bonding of a product substrate to a carrier substrate - Google Patents

Method for temporary bonding of a product substrate to a carrier substrate

Info

Publication number
SG11201404960TA
SG11201404960TA SG11201404960TA SG11201404960TA SG11201404960TA SG 11201404960T A SG11201404960T A SG 11201404960TA SG 11201404960T A SG11201404960T A SG 11201404960TA SG 11201404960T A SG11201404960T A SG 11201404960TA SG 11201404960T A SG11201404960T A SG 11201404960TA
Authority
SG
Singapore
Prior art keywords
substrate
temporary bonding
product
carrier substrate
carrier
Prior art date
Application number
SG11201404960TA
Other languages
English (en)
Inventor
Jürgen Burggraf
Gerald Mittendorfer
Original Assignee
Ev Group E Thallner Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ev Group E Thallner Gmbh filed Critical Ev Group E Thallner Gmbh
Publication of SG11201404960TA publication Critical patent/SG11201404960TA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0213—Electrical arrangements not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68309—Auxiliary support including alignment aids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Combinations Of Printed Boards (AREA)
SG11201404960TA 2012-02-16 2013-01-17 Method for temporary bonding of a product substrate to a carrier substrate SG11201404960TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102012101237A DE102012101237A1 (de) 2012-02-16 2012-02-16 Verfahren zum temporären Verbinden eines Produktsubstrats mit einem Trägersubstrat
PCT/EP2013/050849 WO2013120648A1 (de) 2012-02-16 2013-01-17 Verfahren zum temporären verbinden eines produktsubstrats mit einem trägersubstrat

Publications (1)

Publication Number Publication Date
SG11201404960TA true SG11201404960TA (en) 2014-11-27

Family

ID=47594741

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201404960TA SG11201404960TA (en) 2012-02-16 2013-01-17 Method for temporary bonding of a product substrate to a carrier substrate

Country Status (8)

Country Link
US (1) US9390956B2 (ja)
JP (1) JP6140194B2 (ja)
KR (1) KR102061369B1 (ja)
CN (1) CN104115267B (ja)
AT (1) AT517748B1 (ja)
DE (2) DE102012101237A1 (ja)
SG (1) SG11201404960TA (ja)
WO (1) WO2013120648A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101502239B1 (ko) * 2013-11-29 2015-03-19 엘지디스플레이 주식회사 기판분리장치
US10978334B2 (en) * 2014-09-02 2021-04-13 Applied Materials, Inc. Sealing structure for workpiece to substrate bonding in a processing chamber
CN104916574B (zh) * 2015-04-22 2017-11-10 四川虹视显示技术有限公司 一种柔性oled脱膜装置
TWI557831B (zh) * 2015-05-15 2016-11-11 友達光電股份有限公司 微組件的傳送方法
DE102015118742A1 (de) * 2015-11-02 2017-05-04 Ev Group E. Thallner Gmbh Verfahren zum Bonden und Lösen von Substraten
DE102016106351A1 (de) * 2016-04-07 2017-10-12 Ev Group E. Thallner Gmbh Verfahren und Vorrichtung zum Bonden zweier Substrate
CN111048461B (zh) * 2018-10-12 2022-06-03 瀚宇彩晶股份有限公司 电子装置的离型前结构及电子装置的制造方法
WO2020178080A1 (en) * 2019-03-05 2020-09-10 Evatec Ag Method for processing fragile substrates employing temporary bonding of the substrates to carriers
FR3113771B1 (fr) * 2020-08-27 2022-10-21 Commissariat Energie Atomique Procédé de fabrication d'un substrat-poignée destiné au collage temporaire d'un substrat.

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0828580B2 (ja) * 1993-04-21 1996-03-21 日本電気株式会社 配線基板構造及びその製造方法
DE4339604C2 (de) 1993-11-20 1996-06-05 Beiersdorf Ag Verwendung eines Klebfolien-Abschnitts für eine wiederablösbare Verklebung
KR0165467B1 (ko) 1995-10-31 1999-02-01 김광호 웨이퍼 디본더 및 이를 이용한 웨이퍼 디본딩법
JP2001196404A (ja) 2000-01-11 2001-07-19 Fujitsu Ltd 半導体装置及びその製造方法
DE10140827B4 (de) 2001-08-21 2004-07-29 Infineon Technologies Ag Vorrichtung zum Debonden von Dünnwafern
AU2003299296A1 (en) * 2002-11-29 2004-06-23 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Method and device for machining a wafer, in addition to a wafer comprising a separation layer and a support layer
JP2004288725A (ja) 2003-03-19 2004-10-14 Citizen Watch Co Ltd 半導体装置の製造方法，この製造方法に用いるシール部材及びこのシール部材の供給装置
JP4447280B2 (ja) 2003-10-16 2010-04-07 リンテック株式会社 表面保護用シートおよび半導体ウエハの研削方法
JP2006086479A (ja) * 2004-09-17 2006-03-30 Toshiba Corp 薄膜基板の保持方法及び半導体装置の製造方法
DE102006000687B4 (de) * 2006-01-03 2010-09-09 Thallner, Erich, Dipl.-Ing. Kombination aus einem Träger und einem Wafer, Vorrichtung zum Trennen der Kombination und Verfahren zur Handhabung eines Trägers und eines Wafers
GB0602410D0 (en) 2006-02-07 2006-03-15 Filtronic Compound Semiconduct A method of bonding a semiconductor wafer to a support substrate
JP2007214271A (ja) 2006-02-08 2007-08-23 Zycube:Kk 基板の接合方法および半導体装置
WO2007099146A1 (de) 2006-03-01 2007-09-07 Jakob + Richter Ip-Verwertungsgesellschaft Mbh Verfahren zum bearbeiten insbesondere dünnen der rückseite eines wafers, wafer-träger-anordnung hierfür und verfahren zur herstellung einer solchen wafer-träger-anordnung
JP2006332686A (ja) * 2006-07-03 2006-12-07 Matsushita Electric Ind Co Ltd 固体撮像装置
US20090017248A1 (en) * 2007-07-13 2009-01-15 3M Innovative Properties Company Layered body and method for manufacturing thin substrate using the layered body
JP5338250B2 (ja) * 2008-08-21 2013-11-13 株式会社東京精密 ワーク分離方法及び切削加工装置
JP2010283097A (ja) * 2009-06-04 2010-12-16 Lintec Corp 両面接着シート
US7975378B1 (en) * 2010-01-06 2011-07-12 Banpil Photonics, Inc. Method of manufacturing high speed printed circuit board interconnects
US7883991B1 (en) 2010-02-18 2011-02-08 Taiwan Semiconductor Manufacturing Company, Ltd. Temporary carrier bonding and detaching processes
US8852391B2 (en) * 2010-06-21 2014-10-07 Brewer Science Inc. Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate

Also Published As

Publication number Publication date
JP2015507373A (ja) 2015-03-05
DE112013000980A5 (de) 2014-11-27
CN104115267B (zh) 2017-08-25
AT517748B1 (de) 2023-05-15
US20140374144A1 (en) 2014-12-25
US9390956B2 (en) 2016-07-12
DE112013000980B4 (de) 2020-09-24
KR102061369B1 (ko) 2020-02-11
JP6140194B2 (ja) 2017-05-31
WO2013120648A1 (de) 2013-08-22
KR20140128976A (ko) 2014-11-06
AT517748A5 (de) 2017-04-15
CN104115267A (zh) 2014-10-22
DE102012101237A1 (de) 2013-08-22

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