SG11201403396SA - Homogeneous hipims coating method - Google Patents

Homogeneous hipims coating method

Info

Publication number
SG11201403396SA
SG11201403396SA SG11201403396SA SG11201403396SA SG11201403396SA SG 11201403396S A SG11201403396S A SG 11201403396SA SG 11201403396S A SG11201403396S A SG 11201403396SA SG 11201403396S A SG11201403396S A SG 11201403396SA SG 11201403396S A SG11201403396S A SG 11201403396SA
Authority
SG
Singapore
Prior art keywords
gruppe
internationales
internationale
der
hipims
Prior art date
Application number
SG11201403396SA
Other languages
English (en)
Inventor
Siegfried Krassnitzer
Helmut Rudigier
Original Assignee
Oerlikon Trading Ag Trübbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag Trübbach filed Critical Oerlikon Trading Ag Trübbach
Publication of SG11201403396SA publication Critical patent/SG11201403396SA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3492—Variation of parameters during sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3417—Arrangements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Pretreatment Of Seeds And Plants (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
SG11201403396SA 2011-12-21 2012-11-23 Homogeneous hipims coating method SG11201403396SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011121770A DE102011121770A1 (de) 2011-12-21 2011-12-21 Homogenes HIPIMS-Beschichtungsverfahren
PCT/EP2012/004847 WO2013091761A1 (fr) 2011-12-21 2012-11-23 Procédé pour produire un revêtement homogène par hipims

Publications (1)

Publication Number Publication Date
SG11201403396SA true SG11201403396SA (en) 2014-12-30

Family

ID=47520875

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201403396SA SG11201403396SA (en) 2011-12-21 2012-11-23 Homogeneous hipims coating method

Country Status (13)

Country Link
US (1) US10982321B2 (fr)
EP (1) EP2795658A1 (fr)
JP (1) JP6180431B2 (fr)
KR (1) KR101934141B1 (fr)
CN (1) CN104160470B (fr)
BR (1) BR112014014793B1 (fr)
CA (1) CA2859747C (fr)
DE (1) DE102011121770A1 (fr)
MX (1) MX341506B (fr)
PH (1) PH12014501435A1 (fr)
RU (1) RU2633516C2 (fr)
SG (1) SG11201403396SA (fr)
WO (1) WO2013091761A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011117177A1 (de) * 2011-10-28 2013-05-02 Oerlikon Trading Ag, Trübbach Verfahren zur Bereitstellung sequenzieller Leistungspulse
EP4385521A2 (fr) * 2015-06-18 2024-06-19 Lenz Therapeutics, Inc. Compositions stables au stockage et procédés de traitement d'erreurs de réfraction de l' il
KR20210118198A (ko) 2019-02-11 2021-09-29 어플라이드 머티어리얼스, 인코포레이티드 펄스형 pvd에서의 플라즈마 수정을 통한 웨이퍼들로부터의 입자 제거를 위한 방법

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4515668A (en) * 1984-04-25 1985-05-07 Honeywell Inc. Method of forming a dielectric layer comprising a gettering material
JPS6141766A (ja) * 1984-08-06 1986-02-28 Hitachi Ltd スパツタリング方法およびスパツタ−装置
DE3700633C2 (de) * 1987-01-12 1997-02-20 Reinar Dr Gruen Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma
JPH07116596B2 (ja) * 1989-02-15 1995-12-13 株式会社日立製作所 薄膜形成方法、及びその装置
DE19651615C1 (de) * 1996-12-12 1997-07-10 Fraunhofer Ges Forschung Verfahren zum Aufbringen von Kohlenstoffschichten durch reaktives Magnetron-Sputtern
US20050103620A1 (en) * 2003-11-19 2005-05-19 Zond, Inc. Plasma source with segmented magnetron cathode
US9771648B2 (en) * 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
US7718042B2 (en) * 2004-03-12 2010-05-18 Oc Oerlikon Balzers Ag Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source
JP2006124753A (ja) * 2004-10-27 2006-05-18 Bridgestone Corp Ｃｕ２Ｏ膜、その成膜方法及び太陽電池
DE102006017382A1 (de) * 2005-11-14 2007-05-16 Itg Induktionsanlagen Gmbh Verfahren und Vorrichtung zum Beschichten und/oder zur Behandlung von Oberflächen
DE102006021565A1 (de) 2005-12-20 2007-06-28 Itg Induktionsanlagen Gmbh Verfahren und Vorrichtung zum Erzeugen eines Magnetfeldsystems
US7691544B2 (en) * 2006-07-21 2010-04-06 Intel Corporation Measurement of a scattered light point spread function (PSF) for microelectronic photolithography
JP5162464B2 (ja) * 2006-10-24 2013-03-13 株式会社アルバック 薄膜形成方法及び薄膜形成装置
US20080197015A1 (en) * 2007-02-16 2008-08-21 Terry Bluck Multiple-magnetron sputtering source with plasma confinement
JP5037475B2 (ja) * 2008-11-11 2012-09-26 株式会社神戸製鋼所 スパッタ装置
DE202010001497U1 (de) * 2010-01-29 2010-04-22 Hauzer Techno-Coating B.V. Beschichtungsvorrichtung mit einer HIPIMS-Leistungsquelle
DE102010007516A1 (de) 2010-02-11 2011-08-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 Großflächige Kathode für Plasmaprozesse mit hohem Ionisierungsgrad
DE102010007515A1 (de) * 2010-02-11 2011-08-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 Verfahren zum Betreiben einer großflächigen Kathode für Plasmaprozesse mit hohem Ionisierungsgrad
DE102011018363A1 (de) * 2011-04-20 2012-10-25 Oerlikon Trading Ag, Trübbach Hochleistungszerstäubungsquelle
DE102011117177A1 (de) * 2011-10-28 2013-05-02 Oerlikon Trading Ag, Trübbach Verfahren zur Bereitstellung sequenzieller Leistungspulse

Also Published As

Publication number Publication date
RU2014129572A (ru) 2016-02-10
RU2633516C2 (ru) 2017-10-13
MX341506B (es) 2016-08-22
PH12014501435B1 (en) 2014-09-22
PH12014501435A1 (en) 2014-09-22
KR101934141B1 (ko) 2018-12-31
BR112014014793A2 (pt) 2017-06-13
CA2859747C (fr) 2019-12-31
JP2015508448A (ja) 2015-03-19
WO2013091761A1 (fr) 2013-06-27
CN104160470A (zh) 2014-11-19
EP2795658A1 (fr) 2014-10-29
JP6180431B2 (ja) 2017-08-16
US10982321B2 (en) 2021-04-20
CA2859747A1 (fr) 2013-06-27
DE102011121770A1 (de) 2013-06-27
KR20140116102A (ko) 2014-10-01
US20150001063A1 (en) 2015-01-01
CN104160470B (zh) 2017-01-18
BR112014014793B1 (pt) 2021-08-10
MX2014007668A (es) 2014-11-25

Similar Documents

Publication Publication Date Title
SG11201806624XA (en) Deposition of molybdenum thin films using a molybdenum carbonyl precursor
SG11201804672QA (en) Systems and methods for production of low oxygen content silicon
SG11201408094YA (en) Neprilysin inhibitors
SG11201806485RA (en) Pyrrolobenzodiazepine conjugates
SG11201803887SA (en) Sputter target backing plate assemblies with cooling structures
SG11201809884TA (en) Fire-stopping product
SG11201407728RA (en) Pul-core method with a pmi foam core
SG11201809356YA (en) Multilayer coating and process of preparing the multilayer coating
SG11201407987SA (en) Catalytic surfaces and coatings for the manufacture of petrochemicals
SG11201407570SA (en) Surface covering system and method for producing such a system
SG11201810389XA (en) New antibacterial compounds
SG11201804919TA (en) Glass substrate for chemical strengthening and method for chemically strengthening with controlled curvature
SG11201804019QA (en) Process for the generation of metallic films
SG11201804583YA (en) Press, actuator set and method for encapsulating electronic components with at least two individual controllable actuators
SG11201403396SA (en) Homogeneous hipims coating method
SG11201407844SA (en) Smoking agent and smoking device
SG11201902257TA (en) Process for the generation of thin silicon-containing films
SG11201806880QA (en) Communicating with two or more slaves
SG11201406598TA (en) Aluminium coated copper bond wire and method of making the same
SG11201804171UA (en) Method for producing high-quality feedstock for a steam cracking process
SG11201908605XA (en) Antifouling article
SG11201407712RA (en) Thermal insulation body and method for the production thereof
SG11201808094WA (en) Antireflective glass substrate and method for manufacturing the same
SG11201900313QA (en) An actuator component
SG11201407113PA (en) Insecticidal water-in-oil (w/o) formulation