SG11201402207UA - Method for cleaning a filter - Google Patents

Method for cleaning a filter

Info

Publication number
SG11201402207UA
SG11201402207UA SG11201402207UA SG11201402207UA SG11201402207UA SG 11201402207U A SG11201402207U A SG 11201402207UA SG 11201402207U A SG11201402207U A SG 11201402207UA SG 11201402207U A SG11201402207U A SG 11201402207UA SG 11201402207U A SG11201402207U A SG 11201402207UA
Authority
SG
Singapore
Prior art keywords
cleaning
filter
Prior art date
Application number
SG11201402207UA
Other languages
English (en)
Inventor
Franz Brummer
Original Assignee
Highq Factory Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Highq Factory Gmbh filed Critical Highq Factory Gmbh
Publication of SG11201402207UA publication Critical patent/SG11201402207UA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/145—Ultrafiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/18—Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/22—Controlling or regulating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
    • B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2313/00—Details relating to membrane modules or apparatus
    • B01D2313/18—Specific valves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
    • B01D2321/04—Backflushing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
    • B01D2321/18—Use of gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
    • B01D2321/18—Use of gases
    • B01D2321/185—Aeration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
    • B01D2321/20—By influencing the flow
    • B01D2321/2066—Pulsated flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/02—Hollow fibre modules
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/16—Regeneration of sorbents, filters

Landscapes

  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Organic Chemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG11201402207UA 2011-12-19 2012-12-18 Method for cleaning a filter SG11201402207UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011056633.3A DE102011056633B4 (de) 2011-12-19 2011-12-19 Verfahren zum Reinigen eines Filters
PCT/EP2012/075983 WO2013092606A1 (de) 2011-12-19 2012-12-18 Verfahren zum reinigen eines filters

Publications (1)

Publication Number Publication Date
SG11201402207UA true SG11201402207UA (en) 2014-09-26

Family

ID=47552978

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201402207UA SG11201402207UA (en) 2011-12-19 2012-12-18 Method for cleaning a filter

Country Status (10)

Country Link
US (1) US9855529B2 (de)
EP (1) EP2794073B1 (de)
JP (1) JP6050831B2 (de)
KR (1) KR101622133B1 (de)
CN (1) CN103998114B (de)
DE (1) DE102011056633B4 (de)
IL (1) IL232831B (de)
MY (1) MY168853A (de)
SG (1) SG11201402207UA (de)
WO (1) WO2013092606A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10646828B2 (en) 2014-05-08 2020-05-12 Georgia Tech Research Corporation Cyclic filtration system
WO2016187263A1 (en) * 2015-05-18 2016-11-24 Massachusetts Institute Of Technology Maintenance of gas layers for fouling prevention on submerged surfaces
KR200485467Y1 (ko) 2017-07-19 2018-01-11 카리페어퓨처 주식회사 이동식 차량정비장치 및 이를 구비하는 이동식 정비차량
FI127838B (en) * 2018-03-08 2019-03-29 Sofi Filtration Oy A method of cleaning a filter element and a filtering device
CN110354686B (zh) * 2018-03-26 2022-07-08 东莞新科技术研究开发有限公司 一种过滤膜的清洗方法
DE102020131637A1 (de) * 2020-05-22 2021-11-25 Taiwan Semiconductor Manufacturing Co., Ltd. Filtervorrichtung für prozess zur herstellung von halbleitervorrichtungen
KR102503150B1 (ko) * 2020-11-30 2023-02-23 롯데케미칼 주식회사 기체 분리막 운전 방법
US12005408B1 (en) 2023-04-14 2024-06-11 Sharkninja Operating Llc Mixing funnel

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3828236C1 (de) * 1988-08-19 1990-01-04 Ag Fuer Industrielle Elektronik Agie Losone Bei Locarno, Losone, Ch
DE4037329A1 (de) * 1990-11-23 1992-05-27 Linde Ag Verfahren zur aufbereitung von abwaessern aus glasschleifereien
JPH0679146A (ja) * 1992-09-04 1994-03-22 Fuji Photo Film Co Ltd ろ過方法
JP3426149B2 (ja) 1998-12-25 2003-07-14 富士通株式会社 半導体製造における研磨廃液再利用方法及び再利用装置
JP3708748B2 (ja) 1999-04-23 2005-10-19 松下電器産業株式会社 研磨剤の再生装置および研磨剤の再生方法
EP1055447A3 (de) 1999-05-27 2001-05-16 Sanyo Electric Co., Ltd. Verfahren zur Filtration einer Flüssigkeit
AU6426800A (en) * 1999-08-05 2001-03-05 Microfiltration Technology A/S A method of cross-flow filtration and a cross-flow filtration installation
WO2001051186A1 (de) 2000-01-13 2001-07-19 Bucher-Guyer Ag Verfahren und vorrichtung zum freimachen von durchflusswegen in filtrationsmodulen
DE10120608B4 (de) * 2000-05-03 2007-10-04 Karl-Heinz Pfaff Verfahren zur Filtration einer Flüssigkeit und Filtereinrichtung dafür
JP2002079061A (ja) 2000-07-06 2002-03-19 Nitto Denko Corp スパイラル型膜エレメントおよびスパイラル型膜モジュールの運転方法ならびに処理システム
US6878294B2 (en) * 2000-07-06 2005-04-12 Nitto Denko Corporation Running method and treatment system for spiral wound membrane element and spiral wound membrane module
US7531042B2 (en) * 2002-12-19 2009-05-12 Hydranautics Methods for cleaning and maintaining membrane surface during filtration
US6929532B1 (en) * 2003-05-08 2005-08-16 Lsi Logic Corporation Method and apparatus for filtering a chemical polishing slurry of a wafer fabrication process
FR2867394B1 (fr) * 2004-03-10 2006-12-15 Degremont Procede de nettoyage de membranes de filtration, et installation pour la mise en oeuvre de ce procede
DE202005021612U1 (de) * 2005-04-04 2008-11-27 Wehrle Umwelt Gmbh Anlage zur Durchführung von Verfahren zur Abtrennung von Inhaltsstoffen aus einem fließfähigen Stoffgemisch
JP4709095B2 (ja) * 2006-08-04 2011-06-22 水道機工株式会社 スラリー固液分離膜ろ過装置の運転方法およびスラリー固液分離膜ろ過装置
DE102006040451A1 (de) * 2006-08-24 2008-02-28 Institut für Bioprozess- und Analysenmesstechnik e.V. Membranmodulanordnung und Membranverfahren
US8652331B2 (en) * 2008-08-20 2014-02-18 Siemens Water Technologies Llc Membrane system backwash energy efficiency
KR20110132458A (ko) 2009-03-25 2011-12-07 어플라이드 머티어리얼스, 인코포레이티드 화학기계적 폴리싱 슬러리의 소요지 재생 시스템
DE102009044204A1 (de) 2009-10-08 2011-04-28 Fab Service Gmbh Wiederaufbereitungsverfahren und Wiederaufbereitungsvorrichtung zur Wiederaufbereitung von Slurry-Abwasser aus einem Halbleiterbearbeitungs-prozess, insbesondere aus einem chemisch-mechanischen Polierprozess
DE102009044294A1 (de) 2009-10-20 2011-05-05 Kla-Tencor Mie Gmbh Koordinatenmessmaschine zur Bestimmung der Lage von Strukturen auf einer Maske

Also Published As

Publication number Publication date
IL232831A0 (en) 2014-07-31
KR20140123477A (ko) 2014-10-22
EP2794073B1 (de) 2019-02-06
JP6050831B2 (ja) 2016-12-21
EP2794073A1 (de) 2014-10-29
DE102011056633A1 (de) 2013-06-20
US20140332467A1 (en) 2014-11-13
CN103998114A (zh) 2014-08-20
WO2013092606A1 (de) 2013-06-27
CN103998114B (zh) 2017-02-22
US9855529B2 (en) 2018-01-02
MY168853A (en) 2018-12-04
IL232831B (en) 2018-03-29
KR101622133B1 (ko) 2016-05-18
JP2015506826A (ja) 2015-03-05
DE102011056633B4 (de) 2014-02-13

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