SG11201401090PA - Method for forming diffusion regions in a silicon substrate - Google Patents

Method for forming diffusion regions in a silicon substrate

Info

Publication number
SG11201401090PA
SG11201401090PA SG11201401090PA SG11201401090PA SG11201401090PA SG 11201401090P A SG11201401090P A SG 11201401090PA SG 11201401090P A SG11201401090P A SG 11201401090PA SG 11201401090P A SG11201401090P A SG 11201401090PA SG 11201401090P A SG11201401090P A SG 11201401090PA
Authority
SG
Singapore
Prior art keywords
silicon substrate
diffusion regions
forming diffusion
forming
regions
Prior art date
Application number
SG11201401090PA
Other languages
English (en)
Inventor
Kahn C Wu
Steven M Kraft
Paul Loscutoff
Steve Edward Molesa
Original Assignee
Sunpower Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sunpower Corp filed Critical Sunpower Corp
Publication of SG11201401090PA publication Critical patent/SG11201401090PA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • H01L31/182Special manufacturing methods for polycrystalline Si, e.g. Si ribbon, poly Si ingots, thin films of polycrystalline Si
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/028Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/546Polycrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
SG11201401090PA 2011-09-30 2012-09-26 Method for forming diffusion regions in a silicon substrate SG11201401090PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/250,594 US8586397B2 (en) 2011-09-30 2011-09-30 Method for forming diffusion regions in a silicon substrate
PCT/US2012/057350 WO2013049216A2 (fr) 2011-09-30 2012-09-26 Procédé pour former des régions de diffusion dans un substrat de silicium

Publications (1)

Publication Number Publication Date
SG11201401090PA true SG11201401090PA (en) 2014-04-28

Family

ID=47991480

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401090PA SG11201401090PA (en) 2011-09-30 2012-09-26 Method for forming diffusion regions in a silicon substrate

Country Status (8)

Country Link
US (2) US8586397B2 (fr)
JP (2) JP2014534617A (fr)
KR (1) KR20140071478A (fr)
CN (1) CN103843159B (fr)
DE (1) DE112012004079T5 (fr)
MY (1) MY167102A (fr)
SG (1) SG11201401090PA (fr)
WO (1) WO2013049216A2 (fr)

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Also Published As

Publication number Publication date
MY167102A (en) 2018-08-10
JP2018011066A (ja) 2018-01-18
CN103843159A (zh) 2014-06-04
WO2013049216A2 (fr) 2013-04-04
CN103843159B (zh) 2016-06-15
KR20140071478A (ko) 2014-06-11
US20140048133A1 (en) 2014-02-20
US8586397B2 (en) 2013-11-19
WO2013049216A3 (fr) 2013-05-23
US20130081687A1 (en) 2013-04-04
JP2014534617A (ja) 2014-12-18
US9018033B2 (en) 2015-04-28
DE112012004079T5 (de) 2014-07-10

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