SG107676A1 - Diffuser plate and method of making same - Google Patents
Diffuser plate and method of making sameInfo
- Publication number
- SG107676A1 SG107676A1 SG200400112A SG200400112A SG107676A1 SG 107676 A1 SG107676 A1 SG 107676A1 SG 200400112 A SG200400112 A SG 200400112A SG 200400112 A SG200400112 A SG 200400112A SG 107676 A1 SG107676 A1 SG 107676A1
- Authority
- SG
- Singapore
- Prior art keywords
- diffuser plate
- making same
- making
- same
- diffuser
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US44005303P | 2003-01-15 | 2003-01-15 | |
US10/688,923 US7002747B2 (en) | 2003-01-15 | 2003-10-21 | Diffuser plate and method of making same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG107676A1 true SG107676A1 (en) | 2004-12-29 |
Family
ID=32600287
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200400112A SG107676A1 (en) | 2003-01-15 | 2004-01-12 | Diffuser plate and method of making same |
SG200602856-7A SG143070A1 (en) | 2003-01-15 | 2004-01-12 | Diffuser plate and method of making same |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200602856-7A SG143070A1 (en) | 2003-01-15 | 2004-01-12 | Diffuser plate and method of making same |
Country Status (8)
Country | Link |
---|---|
US (2) | US7002747B2 (ja) |
EP (1) | EP1439426B1 (ja) |
JP (1) | JP4131704B2 (ja) |
KR (1) | KR100586344B1 (ja) |
CN (1) | CN1278142C (ja) |
DE (1) | DE602004009841T2 (ja) |
SG (2) | SG107676A1 (ja) |
TW (1) | TWI287693B (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7837361B2 (en) * | 2000-07-14 | 2010-11-23 | Ledalite Architectural Products | Light control devices implemented with diffusers having controllable diffusion characteristics |
US6867846B2 (en) * | 2003-01-15 | 2005-03-15 | Asml Holding Nv | Tailored reflecting diffractor for EUV lithographic system aberration measurement |
US7027164B2 (en) * | 2003-01-15 | 2006-04-11 | Asml Holding N.V. | Speckle reduction method and system for EUV interferometry |
US7268891B2 (en) * | 2003-01-15 | 2007-09-11 | Asml Holding N.V. | Transmission shear grating in checkerboard configuration for EUV wavefront sensor |
US7081956B1 (en) * | 2003-12-04 | 2006-07-25 | Advanced Micro Devices, Inc. | Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system |
US20050259269A1 (en) * | 2004-05-19 | 2005-11-24 | Asml Holding N.V. | Shearing interferometer with dynamic pupil fill |
US20050275841A1 (en) * | 2004-06-09 | 2005-12-15 | Asml Netherlands B.V. | Alignment marker and lithographic apparatus and device manufacturing method using the same |
JP4518078B2 (ja) | 2004-09-22 | 2010-08-04 | 株式会社ニコン | 照明装置、露光装置及びマイクロデバイスの製造方法 |
JP2006332586A (ja) * | 2005-04-25 | 2006-12-07 | Canon Inc | 測定装置、露光装置及び方法、並びに、デバイス製造方法 |
KR100735530B1 (ko) * | 2006-02-02 | 2007-07-04 | 삼성전자주식회사 | 단차를 가진 반사층을 포함하는 반사형 포토마스크 및 그 제조방법 |
EP2145130B1 (en) * | 2007-04-10 | 2014-12-17 | Ledalite Architectural Products, Inc. | Light control device exhibiting batwing luminous intensity distributions in upper and lower hemispheres |
NL1036305A1 (nl) * | 2007-12-21 | 2009-06-23 | Asml Netherlands Bv | Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system. |
US7821900B2 (en) * | 2008-05-15 | 2010-10-26 | Northrop Grumman Systems Corporation | Diffractive optical element and method of designing the same |
NL2002838A1 (nl) * | 2008-05-30 | 2009-12-01 | Asml Netherlands Bv | Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter. |
CN101907781B (zh) * | 2010-07-13 | 2012-04-18 | 杭州电子科技大学 | 一种具有光束会聚功能的光学平板制作方法 |
WO2013113537A2 (en) * | 2012-01-30 | 2013-08-08 | Asml Netherlands B.V. | Optical element, lithographic apparatus incorporating such an element, method of manufacturing an optical element |
CN104111120B (zh) * | 2014-07-25 | 2017-05-31 | 中国科学院上海光学精密机械研究所 | 基于朗奇剪切干涉仪的相位提取方法 |
DE102014221313A1 (de) | 2014-10-21 | 2016-04-21 | Carl Zeiss Smt Gmbh | Beleuchtung für die EUV-Projektionslithografie |
WO2019079010A1 (en) * | 2017-10-19 | 2019-04-25 | Cymer, Llc | FORMATION OF MULTIPLE AERIAL IMAGES IN ONE LITHOGRAPHIC EXPOSURE PASSAGE |
CN108709160A (zh) * | 2018-06-15 | 2018-10-26 | 浙江彩丞照明科技有限公司 | 一种可对光线进行漫反射的眩光抑制板 |
US20200379336A1 (en) * | 2019-06-03 | 2020-12-03 | Kla Corporation | Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspection Systems |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5641593A (en) * | 1993-10-15 | 1997-06-24 | Canon Kabushiki Kaisha | Lithographic mask and exposure apparatus using the same |
JP2000266914A (ja) * | 1999-03-12 | 2000-09-29 | Toppan Printing Co Ltd | 光拡散体およびそれを用いた表示装置 |
US6163405A (en) * | 1999-04-15 | 2000-12-19 | Industrial Technology Research Institute | Structure of a reflection-type light diffuser in a LCD |
US20010051304A1 (en) * | 1999-12-30 | 2001-12-13 | Stivers Alan R. | Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength |
US6392792B1 (en) * | 2000-12-05 | 2002-05-21 | The Regents Of The University Of California | Method of fabricating reflection-mode EUV diffraction elements |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2269055B (en) * | 1992-07-09 | 1996-06-05 | Flat Antenna Co Ltd | Phase correcting zone plate |
EP0712012A1 (en) * | 1994-11-09 | 1996-05-15 | International Business Machines Corporation | Authentication label and authenticating pattern incorporating diffracting structure and method of fabricating them |
US5958629A (en) * | 1997-12-22 | 1999-09-28 | Intel Corporation | Using thin films as etch stop in EUV mask fabrication process |
US6072631A (en) * | 1998-07-09 | 2000-06-06 | 3M Innovative Properties Company | Diffractive homogenizer with compensation for spatial coherence |
DE19958201A1 (de) * | 1999-12-02 | 2001-06-21 | Infineon Technologies Ag | Lithographieverfahren und Maske zu dessen Durchführung |
GB9928483D0 (en) | 1999-12-03 | 2000-02-02 | Renishaw Plc | Opto-electronic scale reading apparatus |
EP1197803B1 (en) | 2000-10-10 | 2012-02-01 | ASML Netherlands B.V. | Lithographic apparatus |
US6656643B2 (en) | 2001-02-20 | 2003-12-02 | Chartered Semiconductor Manufacturing Ltd. | Method of extreme ultraviolet mask engineering |
US7027226B2 (en) * | 2001-09-17 | 2006-04-11 | Euv Llc | Diffractive optical element for extreme ultraviolet wavefront control |
-
2003
- 2003-10-21 US US10/688,923 patent/US7002747B2/en not_active Expired - Lifetime
-
2004
- 2004-01-12 SG SG200400112A patent/SG107676A1/en unknown
- 2004-01-12 SG SG200602856-7A patent/SG143070A1/en unknown
- 2004-01-13 TW TW093100808A patent/TWI287693B/zh not_active IP Right Cessation
- 2004-01-13 DE DE602004009841T patent/DE602004009841T2/de not_active Expired - Fee Related
- 2004-01-13 EP EP04000512A patent/EP1439426B1/en not_active Expired - Fee Related
- 2004-01-14 KR KR1020040002562A patent/KR100586344B1/ko not_active IP Right Cessation
- 2004-01-15 CN CNB2004100019076A patent/CN1278142C/zh not_active Expired - Fee Related
- 2004-01-15 JP JP2004008392A patent/JP4131704B2/ja not_active Expired - Fee Related
-
2005
- 2005-07-19 US US11/183,847 patent/US7164534B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5641593A (en) * | 1993-10-15 | 1997-06-24 | Canon Kabushiki Kaisha | Lithographic mask and exposure apparatus using the same |
JP2000266914A (ja) * | 1999-03-12 | 2000-09-29 | Toppan Printing Co Ltd | 光拡散体およびそれを用いた表示装置 |
US6163405A (en) * | 1999-04-15 | 2000-12-19 | Industrial Technology Research Institute | Structure of a reflection-type light diffuser in a LCD |
US20010051304A1 (en) * | 1999-12-30 | 2001-12-13 | Stivers Alan R. | Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength |
US6392792B1 (en) * | 2000-12-05 | 2002-05-21 | The Regents Of The University Of California | Method of fabricating reflection-mode EUV diffraction elements |
Also Published As
Publication number | Publication date |
---|---|
DE602004009841D1 (de) | 2007-12-20 |
US7002747B2 (en) | 2006-02-21 |
TW200417814A (en) | 2004-09-16 |
US7164534B2 (en) | 2007-01-16 |
KR100586344B1 (ko) | 2006-06-08 |
CN1519590A (zh) | 2004-08-11 |
EP1439426A3 (en) | 2005-02-16 |
EP1439426A2 (en) | 2004-07-21 |
US20050248743A1 (en) | 2005-11-10 |
TWI287693B (en) | 2007-10-01 |
DE602004009841T2 (de) | 2008-02-21 |
US20040136075A1 (en) | 2004-07-15 |
SG143070A1 (en) | 2008-06-27 |
CN1278142C (zh) | 2006-10-04 |
KR20040066017A (ko) | 2004-07-23 |
EP1439426B1 (en) | 2007-11-07 |
JP2004221599A (ja) | 2004-08-05 |
JP4131704B2 (ja) | 2008-08-13 |
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