SG10201709844WA - Laser processing apparatus - Google Patents
Laser processing apparatusInfo
- Publication number
- SG10201709844WA SG10201709844WA SG10201709844WA SG10201709844WA SG10201709844WA SG 10201709844W A SG10201709844W A SG 10201709844WA SG 10201709844W A SG10201709844W A SG 10201709844WA SG 10201709844W A SG10201709844W A SG 10201709844WA SG 10201709844W A SG10201709844W A SG 10201709844WA
- Authority
- SG
- Singapore
- Prior art keywords
- workpiece
- processing apparatus
- cassette
- laser processing
- laser beam
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/359—Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
- B23K37/04—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Laser Beam Processing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
Abstract
LASER PROCESSING APPARATUS Disclosed herein is a laser processing apparatus for processing a plate-shaped workpiece by applying a laser beam to the workpiece. The laser processing apparatus includes a cassette table for placing thereon a cassette in which a plurality of workpieces are accommodated, a carrying-out unit for carrying out the workpiece from the cassette placed on the cassette table, and a laser beam applying unit including a focusing unit for applying the laser beam to the workpiece held on the chuck table. The carrying-out unit carries out the workpiece having been processed by the laser beam applying unit from the chuck table, and accommodates the workpiece into the cassette placed on the cassette table. (Figure 2)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016241591A JP6767253B2 (en) | 2016-12-13 | 2016-12-13 | Laser processing equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201709844WA true SG10201709844WA (en) | 2018-07-30 |
Family
ID=62201601
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201709844WA SG10201709844WA (en) | 2016-12-13 | 2017-11-28 | Laser processing apparatus |
Country Status (8)
Country | Link |
---|---|
US (1) | US10695862B2 (en) |
JP (1) | JP6767253B2 (en) |
KR (1) | KR102245112B1 (en) |
CN (1) | CN108213725B (en) |
DE (1) | DE102017222478B4 (en) |
MY (1) | MY185737A (en) |
SG (1) | SG10201709844WA (en) |
TW (1) | TWI733937B (en) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG11202010365TA (en) * | 2018-04-27 | 2020-11-27 | Tokyo Electron Ltd | Substrate processing system and substrate processing method |
KR102654506B1 (en) * | 2018-10-26 | 2024-04-03 | 세메스 주식회사 | Wafer debonding method and wafer debonding apparatus |
JP7109863B2 (en) * | 2018-11-30 | 2022-08-01 | 株式会社ディスコ | Conveyor system |
JP7355618B2 (en) * | 2018-12-04 | 2023-10-03 | 株式会社ディスコ | Wafer splitting device |
JP7246904B2 (en) * | 2018-12-05 | 2023-03-28 | 株式会社ディスコ | Conveyor |
JP7162513B2 (en) * | 2018-12-07 | 2022-10-28 | 株式会社ディスコ | processing equipment |
JP7312579B2 (en) * | 2019-03-15 | 2023-07-21 | 株式会社東京精密 | Eccentricity detection device and eccentricity detection method |
JP7399552B2 (en) * | 2019-03-27 | 2023-12-18 | 株式会社オーク製作所 | Container transport device and laser processing device |
JP7325897B2 (en) * | 2019-04-18 | 2023-08-15 | 株式会社ディスコ | Machining device and machining method of workpiece |
JP7358107B2 (en) * | 2019-07-31 | 2023-10-10 | 株式会社ディスコ | laser processing equipment |
JP7350438B2 (en) | 2019-09-09 | 2023-09-26 | 株式会社ディスコ | Chuck table and chuck table manufacturing method |
JP2022059212A (en) * | 2020-10-01 | 2022-04-13 | 日本電産サンキョー株式会社 | Conveyance system |
TWI766466B (en) * | 2020-12-07 | 2022-06-01 | 上銀科技股份有限公司 | Rotary seat and rotary table |
KR20230108336A (en) | 2021-02-10 | 2023-07-18 | 야마하하쓰도키 가부시키가이샤 | processing equipment |
CN114695227B (en) * | 2022-03-29 | 2023-02-03 | 苏州矽行半导体技术有限公司 | Stage system and wafer driving method adopting stage system |
CN114799389B (en) * | 2022-04-26 | 2023-12-22 | 浙江雅晶电子有限公司 | TO tube seat eutectic welding machine |
CN117506174B (en) * | 2024-01-08 | 2024-04-02 | 衡水威格橡塑金属制品有限公司 | Optical fiber laser cutting machine for cutting rubber pipe |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04174529A (en) * | 1990-11-07 | 1992-06-22 | Nec Corp | Wafer marking equipment |
JP2004022936A (en) * | 2002-06-19 | 2004-01-22 | Disco Abrasive Syst Ltd | Semiconductor-wafer dividing method and semiconductor-wafer dividing apparatus |
JP4303041B2 (en) * | 2003-06-18 | 2009-07-29 | 株式会社ディスコ | Semiconductor wafer processing equipment |
JP4231349B2 (en) * | 2003-07-02 | 2009-02-25 | 株式会社ディスコ | Laser processing method and laser processing apparatus |
JP4342992B2 (en) * | 2004-03-17 | 2009-10-14 | 株式会社ディスコ | Laser processing machine chuck table |
US20050279453A1 (en) * | 2004-06-17 | 2005-12-22 | Uvtech Systems, Inc. | System and methods for surface cleaning |
JP2006049384A (en) * | 2004-07-30 | 2006-02-16 | Laserfront Technologies Inc | Gantry xy stage |
JP2008053432A (en) * | 2006-08-24 | 2008-03-06 | Disco Abrasive Syst Ltd | Wafer machining device |
JP2008170366A (en) * | 2007-01-15 | 2008-07-24 | Disco Abrasive Syst Ltd | Device of measuring workpiece held by chuck table, and laser beam processing machine |
CN201058765Y (en) * | 2007-06-01 | 2008-05-14 | 深圳市大族激光科技股份有限公司 | Material pushing device |
JP5133855B2 (en) * | 2008-11-25 | 2013-01-30 | 株式会社ディスコ | Protective film coating method |
JP5324232B2 (en) * | 2009-01-08 | 2013-10-23 | 日東電工株式会社 | Semiconductor wafer alignment system |
JP2010186863A (en) * | 2009-02-12 | 2010-08-26 | Disco Abrasive Syst Ltd | Aligning mechanism, working device and aligning method |
JP5484821B2 (en) * | 2009-08-13 | 2014-05-07 | 株式会社ディスコ | Detection method |
JP5872799B2 (en) * | 2011-06-17 | 2016-03-01 | 株式会社ディスコ | Laser processing equipment |
JP5972702B2 (en) * | 2012-07-31 | 2016-08-17 | 東芝機械株式会社 | Machine tool manufacturing method |
JP5479569B1 (en) * | 2012-12-26 | 2014-04-23 | 株式会社ソディック | Mobile device |
JP6463227B2 (en) * | 2015-07-07 | 2019-01-30 | 東京エレクトロン株式会社 | Substrate transfer method |
-
2016
- 2016-12-13 JP JP2016241591A patent/JP6767253B2/en active Active
-
2017
- 2017-11-03 TW TW106138109A patent/TWI733937B/en active
- 2017-11-27 CN CN201711202021.1A patent/CN108213725B/en active Active
- 2017-11-28 SG SG10201709844WA patent/SG10201709844WA/en unknown
- 2017-11-29 KR KR1020170161903A patent/KR102245112B1/en active IP Right Grant
- 2017-11-29 MY MYPI2017704596A patent/MY185737A/en unknown
- 2017-12-12 US US15/839,276 patent/US10695862B2/en active Active
- 2017-12-12 DE DE102017222478.9A patent/DE102017222478B4/en active Active
Also Published As
Publication number | Publication date |
---|---|
TW201821206A (en) | 2018-06-16 |
US20180161920A1 (en) | 2018-06-14 |
TWI733937B (en) | 2021-07-21 |
CN108213725B (en) | 2021-07-09 |
JP6767253B2 (en) | 2020-10-14 |
CN108213725A (en) | 2018-06-29 |
DE102017222478B4 (en) | 2022-06-02 |
KR20180068285A (en) | 2018-06-21 |
KR102245112B1 (en) | 2021-04-26 |
US10695862B2 (en) | 2020-06-30 |
DE102017222478A1 (en) | 2018-06-14 |
JP2018098363A (en) | 2018-06-21 |
MY185737A (en) | 2021-06-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG10201709844WA (en) | Laser processing apparatus | |
LT3311947T (en) | Methods for laser processing transparent workpieces using non-axisymmetric beam spots | |
MY170046A (en) | Wafer processing method | |
MY179210A (en) | Laser processing apparatus | |
MY183578A (en) | Laser processing apparatus | |
SG11202103563XA (en) | Laser-processing apparatus, methods of operating the same, and methods of processing workpieces using the same | |
TW201613707A (en) | Machine tool and control device for machine tool | |
MY174992A (en) | Wafer processing method | |
EP3774166A4 (en) | Laser-processing apparatus, methods of operating the same, and methods of processing workpieces using the same | |
WO2014064017A3 (en) | Method and processing machine for grooving, drilling or cutting metal workpieces, with determination of the intensity of the process radiation | |
SG10201908236PA (en) | Wafer producing method and laser processing apparatus | |
SG11201806983VA (en) | Exposure system, exposure device and exposure method | |
SG11202109881XA (en) | Laser processing apparatus, methods of operating the same, and methods of processing workpieces using the same | |
SG11201805682WA (en) | Method and device for producing planar modifications in solid bodies | |
SG10201806236TA (en) | Cutting apparatus and wafer processing method | |
EP3490750A4 (en) | Laser processing apparatus and methods of laser-processing workpieces | |
SG10202002979RA (en) | Processing apparatus and workpiece processing method | |
EP3549703A4 (en) | Machining apparatus, method for using machining apparatus and chuck device | |
EP3604999A4 (en) | Workpiece processing device and manufacturing method for processed workpieces | |
EP3603872C0 (en) | Device and method for processing a workpiece by means of a laser beam | |
SG10201709847QA (en) | Laser processing apparatus | |
EP3922399A3 (en) | Laser processing apparatus and processing method | |
PL3515618T3 (en) | Tool and machine tool and method for machining planar workpieces | |
EP3939744A4 (en) | Chip processing device for machine tool and chip processing method | |
EP3684535B8 (en) | Machining tool, processing device, and method for processing workpieces |