SE9200555D0 - A method of coating a piezoelectric substrate - Google Patents
A method of coating a piezoelectric substrateInfo
- Publication number
- SE9200555D0 SE9200555D0 SE9200555A SE9200555A SE9200555D0 SE 9200555 D0 SE9200555 D0 SE 9200555D0 SE 9200555 A SE9200555 A SE 9200555A SE 9200555 A SE9200555 A SE 9200555A SE 9200555 D0 SE9200555 D0 SE 9200555D0
- Authority
- SE
- Sweden
- Prior art keywords
- pct
- semi
- conducting material
- date sep
- substrate
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14209—Structure of print heads with piezoelectric elements of finger type, chamber walls consisting integrally of piezoelectric material
- B41J2002/14225—Finger type piezoelectric element on only one side of the chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9200555A SE9200555D0 (sv) | 1992-02-25 | 1992-02-25 | A method of coating a piezoelectric substrate |
US08/290,975 US5518952A (en) | 1992-02-25 | 1993-02-01 | Method of coating a piezoelectric substrate with a semiconducting material |
EP93905696A EP0628091B1 (en) | 1992-02-25 | 1993-02-01 | A method of coating a piezoelectric substrate with a semi-conducting material and a method of producing a droplet ejector arrangement including the coating method |
JP5514732A JPH07504535A (ja) | 1992-02-25 | 1993-02-01 | 圧電性基体を半導体材料で被覆する方法およびこの被覆方法を含む小滴エゼクタ装置の製造方法 |
DE69302569T DE69302569T2 (de) | 1992-02-25 | 1993-02-01 | Verfahren zur beschichtung eines piezoelektrischen substrats mit einem halbleitermaterial und verfahren zur herstellung eines tröpfchenausstosssystems mit dem beschichtungsverfahren |
PCT/SE1993/000072 WO1993017147A1 (en) | 1992-02-25 | 1993-02-01 | A method of coating a piezoelectric substrate with a semi-conducting material and a method of producing a droplet ejector arrangement including the coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9200555A SE9200555D0 (sv) | 1992-02-25 | 1992-02-25 | A method of coating a piezoelectric substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
SE9200555D0 true SE9200555D0 (sv) | 1992-02-25 |
Family
ID=20385421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9200555A SE9200555D0 (sv) | 1992-02-25 | 1992-02-25 | A method of coating a piezoelectric substrate |
Country Status (6)
Country | Link |
---|---|
US (1) | US5518952A (xx) |
EP (1) | EP0628091B1 (xx) |
JP (1) | JPH07504535A (xx) |
DE (1) | DE69302569T2 (xx) |
SE (1) | SE9200555D0 (xx) |
WO (1) | WO1993017147A1 (xx) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9318985D0 (en) * | 1993-09-14 | 1993-10-27 | Xaar Ltd | Passivation of ceramic piezoelectric ink jet print heads |
JP3183010B2 (ja) * | 1993-12-24 | 2001-07-03 | ブラザー工業株式会社 | インク噴射装置 |
US6367132B2 (en) * | 1998-08-31 | 2002-04-09 | Eastman Kodak Company | Method of making a print head |
US6503573B1 (en) | 1998-09-29 | 2003-01-07 | The United States Of America As Represented By The Secretary Of The Navy | Bomb annealing of thin films |
US6848773B1 (en) | 2000-09-15 | 2005-02-01 | Spectra, Inc. | Piezoelectric ink jet printing module |
US7052117B2 (en) | 2002-07-03 | 2006-05-30 | Dimatix, Inc. | Printhead having a thin pre-fired piezoelectric layer |
US7281778B2 (en) | 2004-03-15 | 2007-10-16 | Fujifilm Dimatix, Inc. | High frequency droplet ejection device and method |
US8491076B2 (en) | 2004-03-15 | 2013-07-23 | Fujifilm Dimatix, Inc. | Fluid droplet ejection devices and methods |
KR20070087223A (ko) | 2004-12-30 | 2007-08-27 | 후지필름 디마틱스, 인크. | 잉크 분사 프린팅 |
US7988247B2 (en) | 2007-01-11 | 2011-08-02 | Fujifilm Dimatix, Inc. | Ejection of drops having variable drop size from an ink jet printer |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4367478A (en) * | 1979-04-25 | 1983-01-04 | Xerox Corporation | Pressure pulse drop ejector apparatus |
JPS58219732A (ja) * | 1982-06-16 | 1983-12-21 | Tokyo Inst Of Technol | フツ素含有アモルフアス半導体の製造方法 |
FR2555206B1 (fr) * | 1983-11-22 | 1986-05-09 | Thomson Csf | Procede de depot de silicium amorphe par decomposition thermique a basse temperature et dispositif de mise en oeuvre du procede |
GB2176443B (en) * | 1985-06-10 | 1990-11-14 | Canon Kk | Liquid jet recording head and recording system incorporating the same |
DE3630206A1 (de) * | 1985-09-06 | 1987-03-19 | Fuji Electric Co Ltd | Tintenstrahldruckkopf |
US4719477A (en) * | 1986-01-17 | 1988-01-12 | Hewlett-Packard Company | Integrated thermal ink jet printhead and method of manufacture |
US4762808A (en) * | 1987-06-22 | 1988-08-09 | Dow Corning Corporation | Method of forming semiconducting amorphous silicon films from the thermal decomposition of fluorohydridodisilanes |
SE458189B (sv) * | 1987-07-13 | 1989-03-06 | Markpoint System Ab | Anordning vid skrivare utnyttjande trycksatt, vaetskeformigt medium foer uppteckning av tecken paa en informationsbaerare |
JP2746703B2 (ja) * | 1989-11-09 | 1998-05-06 | 松下電器産業株式会社 | インクジェットヘッド装置及びその製造法 |
WO1992010367A1 (en) * | 1990-12-06 | 1992-06-25 | Markpoint Development Ab | Drop-on-demand liquid ejector arrangement |
-
1992
- 1992-02-25 SE SE9200555A patent/SE9200555D0/xx unknown
-
1993
- 1993-02-01 US US08/290,975 patent/US5518952A/en not_active Expired - Fee Related
- 1993-02-01 EP EP93905696A patent/EP0628091B1/en not_active Expired - Lifetime
- 1993-02-01 JP JP5514732A patent/JPH07504535A/ja active Pending
- 1993-02-01 DE DE69302569T patent/DE69302569T2/de not_active Expired - Fee Related
- 1993-02-01 WO PCT/SE1993/000072 patent/WO1993017147A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US5518952A (en) | 1996-05-21 |
DE69302569D1 (de) | 1996-06-13 |
JPH07504535A (ja) | 1995-05-18 |
EP0628091A1 (en) | 1994-12-14 |
DE69302569T2 (de) | 1996-11-21 |
EP0628091B1 (en) | 1996-05-08 |
WO1993017147A1 (en) | 1993-09-02 |
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