SE9100372L - Metalliseringsfoerfarande - Google Patents

Metalliseringsfoerfarande

Info

Publication number
SE9100372L
SE9100372L SE9100372A SE9100372A SE9100372L SE 9100372 L SE9100372 L SE 9100372L SE 9100372 A SE9100372 A SE 9100372A SE 9100372 A SE9100372 A SE 9100372A SE 9100372 L SE9100372 L SE 9100372L
Authority
SE
Sweden
Prior art keywords
melt
piece
instance
coated
time
Prior art date
Application number
SE9100372A
Other languages
Unknown language ( )
English (en)
Other versions
SE502384C2 (sv
SE9100372D0 (sv
Inventor
J Nordlander
Original Assignee
Applied Vacuum Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Vacuum Tech filed Critical Applied Vacuum Tech
Priority to SE9100372A priority Critical patent/SE502384C2/sv
Publication of SE9100372D0 publication Critical patent/SE9100372D0/sv
Priority to DE69216628T priority patent/DE69216628T2/de
Priority to EP92904776A priority patent/EP0604424B1/en
Priority to JP4505108A priority patent/JPH06505307A/ja
Priority to AU12550/92A priority patent/AU1255092A/en
Priority to PCT/SE1992/000070 priority patent/WO1992013980A1/en
Publication of SE9100372L publication Critical patent/SE9100372L/sv
Priority to US08/499,637 priority patent/US5858456A/en
Publication of SE502384C2 publication Critical patent/SE502384C2/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SE9100372A 1991-02-06 1991-02-06 Förfarande för styckvis metallbeläggning av CD-skivor SE502384C2 (sv)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SE9100372A SE502384C2 (sv) 1991-02-06 1991-02-06 Förfarande för styckvis metallbeläggning av CD-skivor
DE69216628T DE69216628T2 (de) 1991-02-06 1992-02-06 Dampfbeschichtung
EP92904776A EP0604424B1 (en) 1991-02-06 1992-02-06 Vapour deposition
JP4505108A JPH06505307A (ja) 1991-02-06 1992-02-06 蒸着
AU12550/92A AU1255092A (en) 1991-02-06 1992-02-06 Vapour deposition
PCT/SE1992/000070 WO1992013980A1 (en) 1991-02-06 1992-02-06 Vapour deposition
US08/499,637 US5858456A (en) 1991-02-06 1995-07-07 Method for metal coating discrete objects by vapor deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9100372A SE502384C2 (sv) 1991-02-06 1991-02-06 Förfarande för styckvis metallbeläggning av CD-skivor

Publications (3)

Publication Number Publication Date
SE9100372D0 SE9100372D0 (sv) 1991-02-06
SE9100372L true SE9100372L (sv) 1992-08-07
SE502384C2 SE502384C2 (sv) 1995-10-09

Family

ID=20381834

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9100372A SE502384C2 (sv) 1991-02-06 1991-02-06 Förfarande för styckvis metallbeläggning av CD-skivor

Country Status (6)

Country Link
EP (1) EP0604424B1 (sv)
JP (1) JPH06505307A (sv)
AU (1) AU1255092A (sv)
DE (1) DE69216628T2 (sv)
SE (1) SE502384C2 (sv)
WO (1) WO1992013980A1 (sv)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103849837B (zh) * 2014-03-24 2016-02-10 四川虹视显示技术有限公司 一种蒸发源装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2821131C2 (de) * 1978-05-13 1986-02-06 Leybold-Heraeus GmbH, 5000 Köln Vakuumbeschichtungsanlage mit einer Kondensat-Auffangeinrichtung
US4406252A (en) * 1980-12-29 1983-09-27 Rockwell International Corporation Inductive heating arrangement for evaporating thin film alloy onto a substrate
GB8425917D0 (en) * 1984-10-13 1984-11-21 Metal Box Plc Evaporating metal
US4812101A (en) * 1987-04-27 1989-03-14 American Telephone And Telegraph Company, At&T Bell Laboratories Method and apparatus for continuous throughput in a vacuum environment

Also Published As

Publication number Publication date
JPH06505307A (ja) 1994-06-16
WO1992013980A1 (en) 1992-08-20
EP0604424A1 (en) 1994-07-06
SE502384C2 (sv) 1995-10-09
DE69216628T2 (de) 1997-07-31
EP0604424B1 (en) 1997-01-08
AU1255092A (en) 1992-09-07
DE69216628D1 (de) 1997-02-20
SE9100372D0 (sv) 1991-02-06

Similar Documents

Publication Publication Date Title
NO924752L (no) Sputter-belagte glassgjenstander som kan varmebehandles
DE69108079T2 (de) Sputteranlage.
LV12724A (lv) Linear aperture deposition apparatus and containing process
DE69422369T2 (de) Transparentes Substrat beschichtet mit einem Metallnitridfilm
NO930085L (no) Fremgangsmaate for belegging av varmefoelsomme materialer med pulvermaling
SE9100372D0 (sv) Metalliseringsfoerfarande
EP0458388B1 (en) Method and device for measuring temperature radiation using a pyrometer wherein compensation lamps are used
US3117024A (en) Detection of evaporant temperature
US20240091878A1 (en) Method of running a laser system, laser system and evaporation system
JPS55122870A (en) Vacuum vapor deposition method
JPS56107335A (en) Tracking system for optical recorder
RU2271409C2 (ru) Установка для нанесения покрытий в вакууме
JPH0543090Y2 (sv)
Ashkinadze et al. The Metastable State of the Condensed Phase of Excitons in Germanium as Affected by Pulsed Illumination and High-Frequency Heating
Zhongming et al. Method of manufacturing a semiconductor device
JPS56119949A (en) Production of medium for optical recording
JPH0521981B2 (sv)
NL8003329A (nl) Registratiemedium.
JPS6144153B2 (sv)
JPH07113160A (ja) 真空蒸着装置
MOONEY et al. Transmittance measurements of ultra violet and visible wavelength interference filters flown aboard LDEF(Abstract Only)
ZEWEI et al. Computation of Methods for Infrared Imaging Guidance Tracking
JPS5623270A (en) Temperature rise preventing method for substrate of vapor deposition apparatus
Park et al. A Study on the Grating Foemation and Optical Properties of Amorphous (Se, S)-based Chalcogenide Thin Films
JPS649888A (en) Heating mechanism for molecular beam source

Legal Events

Date Code Title Description
NUG Patent has lapsed