SE7412194L - - Google Patents

Info

Publication number
SE7412194L
SE7412194L SE7412194A SE7412194A SE7412194L SE 7412194 L SE7412194 L SE 7412194L SE 7412194 A SE7412194 A SE 7412194A SE 7412194 A SE7412194 A SE 7412194A SE 7412194 L SE7412194 L SE 7412194L
Authority
SE
Sweden
Prior art keywords
tetrazolium
cathodic
etch
deposits
sites
Prior art date
Application number
SE7412194A
Other languages
English (en)
Other versions
SE401526B (sv
Inventor
W C Erdman
V C Garbarini
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of SE7412194L publication Critical patent/SE7412194L/xx
Publication of SE401526B publication Critical patent/SE401526B/xx

Links

Classifications

    • H10P50/283—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/04—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in markedly acid liquids
    • H10P95/00—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silicon Compounds (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
SE7412194A 1973-10-11 1974-09-27 Forfarande for selektiv etsning SE401526B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US405564A US3860464A (en) 1973-10-11 1973-10-11 Oxide etchant

Publications (2)

Publication Number Publication Date
SE7412194L true SE7412194L (OSRAM) 1975-04-14
SE401526B SE401526B (sv) 1978-05-16

Family

ID=23604211

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7412194A SE401526B (sv) 1973-10-11 1974-09-27 Forfarande for selektiv etsning

Country Status (10)

Country Link
US (1) US3860464A (OSRAM)
JP (1) JPS528676B2 (OSRAM)
BE (1) BE820808A (OSRAM)
CA (1) CA1035258A (OSRAM)
DE (1) DE2447670C3 (OSRAM)
FR (1) FR2247280B1 (OSRAM)
GB (1) GB1474294A (OSRAM)
IT (1) IT1020975B (OSRAM)
NL (1) NL162124C (OSRAM)
SE (1) SE401526B (OSRAM)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3992235A (en) * 1975-05-21 1976-11-16 Bell Telephone Laboratories, Incorporated Etching of thin layers of reactive metals
JP2581268B2 (ja) * 1990-05-22 1997-02-12 日本電気株式会社 半導体基板の処理方法
US5695661A (en) 1995-06-07 1997-12-09 Micron Display Technology, Inc. Silicon dioxide etch process which protects metal
KR0175009B1 (ko) * 1995-07-28 1999-04-01 김광호 식각용액 및 이를 이용한 반도체 장치의 식각방법
KR100234541B1 (ko) * 1997-03-07 1999-12-15 윤종용 반도체장치 제조용 웨이퍼의 세정을 위한 세정조성물 및 그를 이용한 세정방법
US5876879A (en) * 1997-05-29 1999-03-02 International Business Machines Corporation Oxide layer patterned by vapor phase etching
US6074951A (en) * 1997-05-29 2000-06-13 International Business Machines Corporation Vapor phase etching of oxide masked by resist or masking material
US5838055A (en) * 1997-05-29 1998-11-17 International Business Machines Corporation Trench sidewall patterned by vapor phase etching
US6117796A (en) * 1998-08-13 2000-09-12 International Business Machines Corporation Removal of silicon oxide
US6585933B1 (en) 1999-05-03 2003-07-01 Betzdearborn, Inc. Method and composition for inhibiting corrosion in aqueous systems
US6379587B1 (en) 1999-05-03 2002-04-30 Betzdearborn Inc. Inhibition of corrosion in aqueous systems
US6187262B1 (en) 1998-08-19 2001-02-13 Betzdearborn Inc. Inhibition of corrosion in aqueous systems
CN103980216A (zh) * 2014-06-05 2014-08-13 湖北百诺捷生物科技有限公司 一种氯化-2,3,5-三苯基四氮唑的合成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3421985A (en) * 1965-10-19 1969-01-14 Sylvania Electric Prod Method of producing semiconductor devices having connecting leads attached thereto
US3560280A (en) * 1965-11-17 1971-02-02 Hitachi Ltd Method of selective removal of oxide coatings in the manufacture of semiconductor devices

Also Published As

Publication number Publication date
SE401526B (sv) 1978-05-16
US3860464A (en) 1975-01-14
DE2447670A1 (de) 1975-04-24
IT1020975B (it) 1977-12-30
NL162124B (nl) 1979-11-15
CA1035258A (en) 1978-07-25
JPS5067581A (OSRAM) 1975-06-06
DE2447670C3 (de) 1978-06-08
FR2247280B1 (OSRAM) 1979-02-09
DE2447670B2 (de) 1977-09-22
JPS528676B2 (OSRAM) 1977-03-10
NL162124C (nl) 1980-04-15
NL7413345A (nl) 1975-04-15
GB1474294A (en) 1977-05-18
FR2247280A1 (OSRAM) 1975-05-09
BE820808A (fr) 1975-02-03

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