SE317257B - - Google Patents

Info

Publication number
SE317257B
SE317257B SE2859/62A SE285962A SE317257B SE 317257 B SE317257 B SE 317257B SE 2859/62 A SE2859/62 A SE 2859/62A SE 285962 A SE285962 A SE 285962A SE 317257 B SE317257 B SE 317257B
Authority
SE
Sweden
Application number
SE2859/62A
Inventor
M Reichel
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of SE317257B publication Critical patent/SE317257B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/0166Diazonium salts or compounds characterised by the non-macromolecular additives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
SE2859/62A 1961-03-15 1962-03-14 SE317257B (sr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEK43194A DE1206308B (de) 1961-03-15 1961-03-15 Lichtempfindliche Schicht mit gerbenden Eigenschaften
DEK0050933 1963-09-26

Publications (1)

Publication Number Publication Date
SE317257B true SE317257B (sr) 1969-11-10

Family

ID=25983383

Family Applications (2)

Application Number Title Priority Date Filing Date
SE2859/62A SE317257B (sr) 1961-03-15 1962-03-14
SE11430/64A SE334813B (sr) 1961-03-15 1964-09-23

Family Applications After (1)

Application Number Title Priority Date Filing Date
SE11430/64A SE334813B (sr) 1961-03-15 1964-09-23

Country Status (7)

Country Link
US (2) US3189451A (sr)
BE (2) BE653467A (sr)
CH (2) CH419833A (sr)
DE (2) DE1206308B (sr)
GB (2) GB998838A (sr)
NL (2) NL6410778A (sr)
SE (2) SE317257B (sr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE615056A (sr) * 1961-03-15
DE1224611B (de) * 1963-09-25 1966-09-08 Kalle Ag Lichtempfindliches Kopiermaterial fuer die Diazotypie mit 2, 5-Dialkoxy-4-tert.-aminobenzol-diazoniumsalzen
US3390992A (en) * 1964-06-15 1968-07-02 North American Rockwell Non-etching circuit fabrication
US3463638A (en) * 1965-08-20 1969-08-26 Ibm Heat-fixable light-sensitive compositions and elements
DE2057473C2 (de) * 1970-11-23 1982-04-08 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
US3853561A (en) * 1970-11-26 1974-12-10 Hoechst Ag Process for the preparation of screen printing stencils using intermediate support for light sensitive layer
DE2058178C2 (de) * 1970-11-26 1982-04-01 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Siebdruckformen
DE2522225C2 (de) * 1975-05-20 1983-12-08 Nippon Paint Co., Ltd., Osaka Wässriges lichtempfindliches Gemisch und seine Verwendung für die Herstellung von Siebdruckschablonen
US4154614A (en) * 1975-07-02 1979-05-15 Nippon Paint Co., Ltd. Photosensitive diazo composition with graft copolymer for use in printing screen
FR2411432A1 (fr) * 1977-12-09 1979-07-06 Issec Labo Physicochimie Appli Procede d'impressions couleur photochimique et dispositif pour sa mise en oeuvre
AU557375B2 (en) * 1981-06-19 1986-12-18 Sericol Group Ltd. Photo sensitive compositions and their use
DE3135804A1 (de) * 1981-09-10 1983-03-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
EP0363504A1 (en) * 1988-10-10 1990-04-18 Dräger Nederland B.V. Method of providing a substrate with a layer comprising a polyvinylbased hydrogel and a biochemically active material
FR2866887A1 (fr) * 2004-02-27 2005-09-02 Oreal Para-phenylenediamine secondaire n-heteroaryle, compositon tinctoriale comprenant une telle para-phenylenediamine, procede mettant en oeuvre cette composition et utilisation
US7329288B2 (en) 2004-02-27 2008-02-12 L'oreal S.A. N-heteroaryl secondary para-phenylenediamine, a dye composition comprising such a para-phenylenediamine, a process for preparing this composition and use thereof

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2679498A (en) * 1954-05-25 Atent office
DE596731C (de) * 1932-05-23 1934-05-09 Kalle & Co Akt Ges Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen
NL70798C (sr) * 1948-10-15
NL150528B (nl) * 1949-05-14 Hollandse Signaalapparaten Bv Werkwijze voor het vervaardigen van twistloos of nagenoeg twistloos garen en het door toepassing van deze werkwijze verkregen garen.
US2690968A (en) * 1952-10-04 1954-10-05 Powers Chemco Inc Development of diazo and azide sensitized colloids
NL92615C (sr) * 1953-05-28
US2937085A (en) * 1954-01-11 1960-05-17 Ditto Inc Composite photosensitive plate, and method of making printing plate therefrom
US3012886A (en) * 1954-05-10 1961-12-12 Harry H Lerner Emulsion coating and method of preparation
US3029146A (en) * 1955-02-25 1962-04-10 Azoplate Corp Reproduction material
BE549814A (sr) * 1955-07-29
AT209359B (de) * 1958-01-22 1960-06-10 Kalle & Co Ag Lichtempfindliches Reproduktionsmaterial, bestehend aus Schichtträger und lichtempfindlicher Kolloidschicht
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
US2976152A (en) * 1958-12-19 1961-03-21 Gen Aniline & Film Corp Photographic gelatin layers containing triazine hardeners
BE595534A (sr) * 1959-10-02
BE615056A (sr) * 1961-03-15

Also Published As

Publication number Publication date
DE1206308B (de) 1965-12-02
GB1069366A (en) 1967-05-17
CH419833A (de) 1966-08-31
NL6410778A (sr) 1965-03-29
GB998838A (en) 1965-07-21
US3322541A (en) 1967-05-30
NL275561A (sr)
US3189451A (en) 1965-06-15
BE615056A (sr)
SE334813B (sr) 1971-05-03
CH459760A (de) 1968-07-15
BE653467A (sr) 1965-03-23
DE1447729B (de) 1969-09-04

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