PT2387796T - Sistema e método para inspecionar uma pastilha de semicondutor - Google Patents

Sistema e método para inspecionar uma pastilha de semicondutor

Info

Publication number
PT2387796T
PT2387796T PT107314460T PT10731446T PT2387796T PT 2387796 T PT2387796 T PT 2387796T PT 107314460 T PT107314460 T PT 107314460T PT 10731446 T PT10731446 T PT 10731446T PT 2387796 T PT2387796 T PT 2387796T
Authority
PT
Portugal
Prior art keywords
inspect
semiconductor tablet
tablet
semiconductor
Prior art date
Application number
PT107314460T
Other languages
English (en)
Portuguese (pt)
Original Assignee
Semiconductor Tech & Instruments Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SG200900229-6A external-priority patent/SG163442A1/en
Application filed by Semiconductor Tech & Instruments Pte Ltd filed Critical Semiconductor Tech & Instruments Pte Ltd
Publication of PT2387796T publication Critical patent/PT2387796T/pt

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • G06T7/001Industrial image inspection using an image reference approach
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/40Analysis of texture
    • G06T7/41Analysis of texture based on statistical description of texture
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8822Dark field detection
    • G01N2021/8825Separate detection of dark field and bright field
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/10Image acquisition modality
    • G06T2207/10141Special mode during image acquisition
    • G06T2207/10152Varying illumination
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/20Special algorithmic details
    • G06T2207/20212Image combination
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Theoretical Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Probability & Statistics with Applications (AREA)
  • Quality & Reliability (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
PT107314460T 2009-01-13 2010-01-13 Sistema e método para inspecionar uma pastilha de semicondutor PT2387796T (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SG200900229-6A SG163442A1 (en) 2009-01-13 2009-01-13 System and method for inspecting a wafer
SG200901110-7A SG164293A1 (en) 2009-01-13 2009-02-16 System and method for inspecting a wafer

Publications (1)

Publication Number Publication Date
PT2387796T true PT2387796T (pt) 2021-11-16

Family

ID=54601546

Family Applications (1)

Application Number Title Priority Date Filing Date
PT107314460T PT2387796T (pt) 2009-01-13 2010-01-13 Sistema e método para inspecionar uma pastilha de semicondutor

Country Status (11)

Country Link
US (1) US8885918B2 (https=)
EP (1) EP2387796B1 (https=)
JP (1) JP5934874B2 (https=)
KR (1) KR101646743B1 (https=)
CN (1) CN101853797B (https=)
IL (1) IL213946A (https=)
MY (1) MY188165A (https=)
PT (1) PT2387796T (https=)
SG (1) SG164293A1 (https=)
TW (1) TWI551855B (https=)
WO (1) WO2010082902A2 (https=)

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Also Published As

Publication number Publication date
EP2387796B1 (en) 2021-09-22
CN101853797B (zh) 2015-11-25
IL213946A (en) 2017-01-31
IL213946A0 (en) 2011-08-31
SG164293A1 (en) 2010-09-29
KR20100083745A (ko) 2010-07-22
CN101853797A (zh) 2010-10-06
US8885918B2 (en) 2014-11-11
WO2010082902A2 (en) 2010-07-22
JP2012515332A (ja) 2012-07-05
KR101646743B1 (ko) 2016-08-08
TW201100779A (en) 2011-01-01
WO2010082902A3 (en) 2010-10-28
US20100189339A1 (en) 2010-07-29
HK1149367A1 (zh) 2011-09-30
TWI551855B (zh) 2016-10-01
JP5934874B2 (ja) 2016-06-15
EP2387796A4 (en) 2017-10-18
MY188165A (en) 2021-11-24
EP2387796A2 (en) 2011-11-23

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