EP2387796A4 - System and method for inspecting a wafer - Google Patents
System and method for inspecting a wafer Download PDFInfo
- Publication number
- EP2387796A4 EP2387796A4 EP10731446.0A EP10731446A EP2387796A4 EP 2387796 A4 EP2387796 A4 EP 2387796A4 EP 10731446 A EP10731446 A EP 10731446A EP 2387796 A4 EP2387796 A4 EP 2387796A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- inspecting
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/40—Analysis of texture
- G06T7/41—Analysis of texture based on statistical description of texture
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8822—Dark field detection
- G01N2021/8825—Separate detection of dark field and bright field
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10141—Special mode during image acquisition
- G06T2207/10152—Varying illumination
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20212—Image combination
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG200900229-6A SG163442A1 (en) | 2009-01-13 | 2009-01-13 | System and method for inspecting a wafer |
SG200901110-7A SG164293A1 (en) | 2009-01-13 | 2009-02-16 | System and method for inspecting a wafer |
PCT/SG2010/000006 WO2010082902A2 (en) | 2009-01-13 | 2010-01-13 | System and method for inspecting a wafer |
Publications (3)
Publication Number | Publication Date |
---|---|
EP2387796A2 EP2387796A2 (en) | 2011-11-23 |
EP2387796A4 true EP2387796A4 (en) | 2017-10-18 |
EP2387796B1 EP2387796B1 (en) | 2021-09-22 |
Family
ID=54601546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP10731446.0A Active EP2387796B1 (en) | 2009-01-13 | 2010-01-13 | System and method for inspecting a wafer |
Country Status (12)
Country | Link |
---|---|
US (1) | US8885918B2 (en) |
EP (1) | EP2387796B1 (en) |
JP (1) | JP5934874B2 (en) |
KR (1) | KR101646743B1 (en) |
CN (1) | CN101853797B (en) |
HK (1) | HK1149367A1 (en) |
IL (1) | IL213946A (en) |
MY (1) | MY188165A (en) |
PT (1) | PT2387796T (en) |
SG (1) | SG164293A1 (en) |
TW (1) | TWI551855B (en) |
WO (1) | WO2010082902A2 (en) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9768082B2 (en) * | 2009-02-13 | 2017-09-19 | Hermes Microvision Inc. | Method and machine for examining wafers |
CN102378909B (en) * | 2009-04-30 | 2014-07-02 | 威尔科克斯联营公司 | An inspection method and an inspection apparatus |
JP5500871B2 (en) * | 2009-05-29 | 2014-05-21 | 株式会社日立ハイテクノロジーズ | Template matching template creation method and template creation apparatus |
KR101199619B1 (en) * | 2011-01-21 | 2012-11-08 | 세크론 주식회사 | Method of forming a wafer map |
TW201234464A (en) * | 2011-02-14 | 2012-08-16 | Horng Terng Automation Co Ltd | Breaking point height detection method of wafer breaking |
WO2012109712A1 (en) * | 2011-02-18 | 2012-08-23 | National Ict Australia Limited | Image quality assessment |
US9595091B2 (en) * | 2012-04-19 | 2017-03-14 | Applied Materials Israel, Ltd. | Defect classification using topographical attributes |
US9858658B2 (en) | 2012-04-19 | 2018-01-02 | Applied Materials Israel Ltd | Defect classification using CAD-based context attributes |
US8896827B2 (en) | 2012-06-26 | 2014-11-25 | Kla-Tencor Corporation | Diode laser based broad band light sources for wafer inspection tools |
JP6025489B2 (en) * | 2012-10-11 | 2016-11-16 | 株式会社ニューフレアテクノロジー | Inspection device and inspection device system |
US9189844B2 (en) * | 2012-10-15 | 2015-11-17 | Kla-Tencor Corp. | Detecting defects on a wafer using defect-specific information |
TWI490482B (en) * | 2013-06-06 | 2015-07-01 | Chroma Ate Inc | Defect inspection method for semiconductor element |
US10079183B2 (en) * | 2013-06-26 | 2018-09-18 | Kla-Tenor Corporation | Calculated electrical performance metrics for process monitoring and yield management |
JP6002112B2 (en) * | 2013-11-07 | 2016-10-05 | 東京エレクトロン株式会社 | Substrate defect analysis apparatus, substrate processing system, substrate defect analysis method, program, and computer storage medium |
US9772297B2 (en) | 2014-02-12 | 2017-09-26 | Kla-Tencor Corporation | Apparatus and methods for combined brightfield, darkfield, and photothermal inspection |
CN103871921A (en) * | 2014-02-21 | 2014-06-18 | 上海华力微电子有限公司 | Wafer defect monitoring analysis method based on server |
TWI489098B (en) * | 2014-03-11 | 2015-06-21 | Utechzone Co Ltd | Defect detection method and defect detection device |
CN104198495A (en) * | 2014-09-02 | 2014-12-10 | 上海华力微电子有限公司 | Method for detecting step evolution abnormality of semiconductor substrate |
US9734422B2 (en) * | 2014-11-12 | 2017-08-15 | Kla-Tencor Corporation | System and method for enhanced defect detection with a digital matched filter |
US9816940B2 (en) * | 2015-01-21 | 2017-11-14 | Kla-Tencor Corporation | Wafer inspection with focus volumetric method |
TWI627588B (en) * | 2015-04-23 | 2018-06-21 | 日商思可林集團股份有限公司 | Inspection device and substrate processing apparatus |
JP6496832B2 (en) * | 2015-09-30 | 2019-04-10 | 富士フイルム株式会社 | Image registration apparatus, image registration method, and image registration system |
DE102016107900B4 (en) * | 2016-04-28 | 2020-10-08 | Carl Zeiss Industrielle Messtechnik Gmbh | Method and device for determining the edge of a measurement object in optical measurement technology |
US10768114B2 (en) * | 2016-04-29 | 2020-09-08 | Synaptive Medical (Barbados) Inc. | Multi-modal optical imaging system for tissue analysis |
US10192302B2 (en) * | 2016-05-25 | 2019-01-29 | Kla-Tencor Corporation | Combined patch and design-based defect detection |
CN108878307B (en) * | 2017-05-11 | 2020-12-08 | 北京北方华创微电子装备有限公司 | Chip detection system and chip detection method |
EP3635771A4 (en) * | 2017-06-08 | 2021-03-10 | Rudolph Technologies, Inc. | Wafer inspection system including a laser triangulation sensor |
CN109387518B (en) * | 2017-08-02 | 2022-06-17 | 上海微电子装备(集团)股份有限公司 | Automatic optical detection method |
US10402963B2 (en) | 2017-08-24 | 2019-09-03 | Kla-Tencor Corporation | Defect detection on transparent or translucent wafers |
KR102464279B1 (en) * | 2017-11-15 | 2022-11-09 | 삼성디스플레이 주식회사 | A device for detecting a defect and a method of driving the same |
EP3735121A4 (en) * | 2017-12-28 | 2020-12-23 | Fuji Corporation | Tracing device |
US10854486B2 (en) | 2018-09-19 | 2020-12-01 | Kla Corporation | System and method for characterization of buried defects |
CN109285933B (en) * | 2018-09-27 | 2019-09-17 | 先进光电器材(深圳)有限公司 | A kind of die-bonding method and terminal |
IL263097B2 (en) * | 2018-11-18 | 2024-01-01 | Inspekto A M V Ltd | Optimizing a set-up stage in an automatic visual inspection process |
CN109596639A (en) * | 2018-11-30 | 2019-04-09 | 德淮半导体有限公司 | Defect detecting system and defect inspection method |
TWI699465B (en) * | 2019-05-16 | 2020-07-21 | 亞亞科技股份有限公司 | Wafer inner and outer layer imaging device |
US20210143039A1 (en) * | 2019-11-12 | 2021-05-13 | Applied Materials, Inc. | Systems and methods for controlling non-uniformity |
KR102342827B1 (en) * | 2019-11-18 | 2021-12-24 | 그린정보통신(주) | Wafer defect detecting system semiconductor photolithography process |
EP4050560B1 (en) * | 2021-01-08 | 2023-07-12 | Changxin Memory Technologies, Inc. | Wafer testing method and apparatus, and device and storage medium |
CN113034474A (en) * | 2021-03-30 | 2021-06-25 | 无锡美科微电子技术有限公司 | Test method for wafer map of OLED display |
TWI782589B (en) * | 2021-06-23 | 2022-11-01 | 力晶積成電子製造股份有限公司 | Wafer searching method and device |
KR20230033445A (en) | 2021-09-01 | 2023-03-08 | 에스케이하이닉스 주식회사 | Method for failure analysis on semiconductor wafer and system thereof |
TWI783667B (en) * | 2021-09-03 | 2022-11-11 | 由田新技股份有限公司 | Automatic image inspection method, apparatus, computer readable medium with stored programs, and computer program product with stored programs |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5455870A (en) * | 1991-07-10 | 1995-10-03 | Raytheon Company | Apparatus and method for inspection of high component density printed circuit board |
US5822055A (en) * | 1995-06-06 | 1998-10-13 | Kla Instruments Corporation | Optical inspection of a specimen using multi-channel responses from the specimen using bright and darkfield detection |
US6324298B1 (en) * | 1998-07-15 | 2001-11-27 | August Technology Corp. | Automated wafer defect inspection system and a process of performing such inspection |
US6829559B2 (en) * | 2000-09-20 | 2004-12-07 | K.L.A.-Tencor Technologies | Methods and systems for determining a presence of macro and micro defects on a specimen |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1173513A (en) * | 1997-06-25 | 1999-03-16 | Matsushita Electric Works Ltd | Device and method for pattern inspection |
JP2002267615A (en) * | 2001-03-12 | 2002-09-18 | Olympus Optical Co Ltd | Defect inspection method and device therefor |
KR100425447B1 (en) * | 2001-05-10 | 2004-03-30 | 삼성전자주식회사 | Method of grey level compensation and selective wafer-defect inspection for patterns and recording medium recorded thereof |
US20070258085A1 (en) * | 2006-05-02 | 2007-11-08 | Robbins Michael D | Substrate illumination and inspection system |
US7525659B2 (en) * | 2003-01-15 | 2009-04-28 | Negevtech Ltd. | System for detection of water defects |
JP3913715B2 (en) * | 2003-06-18 | 2007-05-09 | 株式会社東芝 | Defect detection method |
JP2005077109A (en) | 2003-08-29 | 2005-03-24 | Olympus Corp | Flaw inspection device |
DE102004004761A1 (en) * | 2004-01-30 | 2005-09-08 | Leica Microsystems Semiconductor Gmbh | Apparatus and method for inspecting a wafer |
KR20050117710A (en) * | 2004-06-11 | 2005-12-15 | 삼성전자주식회사 | Method of detecting defect of a wafer |
KR20060070003A (en) * | 2004-12-20 | 2006-06-23 | 삼성전자주식회사 | Method for detecting defect of semiconductor substrate |
CN100380621C (en) * | 2005-04-08 | 2008-04-09 | 力晶半导体股份有限公司 | Wafer fault detecting method and system and storage media |
JP2006308372A (en) * | 2005-04-27 | 2006-11-09 | Tokyo Seimitsu Co Ltd | Visual inspection device and visual inspection method |
US7554656B2 (en) * | 2005-10-06 | 2009-06-30 | Kla-Tencor Technologies Corp. | Methods and systems for inspection of a wafer |
JP2007156262A (en) * | 2005-12-07 | 2007-06-21 | Seiko Epson Corp | Photomask inspection method and photomask inspection device |
JP4908925B2 (en) * | 2006-02-08 | 2012-04-04 | 株式会社日立ハイテクノロジーズ | Wafer surface defect inspection apparatus and method |
DE102006059190B4 (en) * | 2006-12-15 | 2009-09-10 | Vistec Semiconductor Systems Gmbh | Device for wafer inspection |
-
2009
- 2009-02-16 SG SG200901110-7A patent/SG164293A1/en unknown
-
2010
- 2010-01-13 WO PCT/SG2010/000006 patent/WO2010082902A2/en active Application Filing
- 2010-01-13 EP EP10731446.0A patent/EP2387796B1/en active Active
- 2010-01-13 JP JP2011545327A patent/JP5934874B2/en active Active
- 2010-01-13 TW TW099100877A patent/TWI551855B/en active
- 2010-01-13 MY MYPI2010000165A patent/MY188165A/en unknown
- 2010-01-13 US US12/657,076 patent/US8885918B2/en active Active
- 2010-01-13 PT PT107314460T patent/PT2387796T/en unknown
- 2010-01-13 KR KR1020100003273A patent/KR101646743B1/en active IP Right Grant
- 2010-01-13 CN CN201010004240.0A patent/CN101853797B/en active Active
-
2011
- 2011-04-06 HK HK11103452.2A patent/HK1149367A1/en unknown
- 2011-07-05 IL IL213946A patent/IL213946A/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5455870A (en) * | 1991-07-10 | 1995-10-03 | Raytheon Company | Apparatus and method for inspection of high component density printed circuit board |
US5822055A (en) * | 1995-06-06 | 1998-10-13 | Kla Instruments Corporation | Optical inspection of a specimen using multi-channel responses from the specimen using bright and darkfield detection |
US6324298B1 (en) * | 1998-07-15 | 2001-11-27 | August Technology Corp. | Automated wafer defect inspection system and a process of performing such inspection |
US6829559B2 (en) * | 2000-09-20 | 2004-12-07 | K.L.A.-Tencor Technologies | Methods and systems for determining a presence of macro and micro defects on a specimen |
Also Published As
Publication number | Publication date |
---|---|
PT2387796T (en) | 2021-11-16 |
TWI551855B (en) | 2016-10-01 |
WO2010082902A2 (en) | 2010-07-22 |
JP5934874B2 (en) | 2016-06-15 |
SG164293A1 (en) | 2010-09-29 |
CN101853797A (en) | 2010-10-06 |
TW201100779A (en) | 2011-01-01 |
JP2012515332A (en) | 2012-07-05 |
EP2387796A2 (en) | 2011-11-23 |
WO2010082902A3 (en) | 2010-10-28 |
KR101646743B1 (en) | 2016-08-08 |
IL213946A0 (en) | 2011-08-31 |
US20100189339A1 (en) | 2010-07-29 |
CN101853797B (en) | 2015-11-25 |
KR20100083745A (en) | 2010-07-22 |
HK1149367A1 (en) | 2011-09-30 |
IL213946A (en) | 2017-01-31 |
EP2387796B1 (en) | 2021-09-22 |
MY188165A (en) | 2021-11-24 |
US8885918B2 (en) | 2014-11-11 |
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