PL2860152T3 - Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych - Google Patents

Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych

Info

Publication number
PL2860152T3
PL2860152T3 PL14182597T PL14182597T PL2860152T3 PL 2860152 T3 PL2860152 T3 PL 2860152T3 PL 14182597 T PL14182597 T PL 14182597T PL 14182597 T PL14182597 T PL 14182597T PL 2860152 T3 PL2860152 T3 PL 2860152T3
Authority
PL
Poland
Prior art keywords
surface plasmon
generate surface
plasmon waves
microstructure
fabricating
Prior art date
Application number
PL14182597T
Other languages
English (en)
Inventor
Cheng-Sheng Tsung
Shih-Hao Chuang
Original Assignee
Tsung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tsung filed Critical Tsung
Publication of PL2860152T3 publication Critical patent/PL2860152T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/008—Surface plasmon devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58—Optical field-shaping elements
    • H01L33/60—Reflective elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0147—Film patterning
    • B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008—Processes
    • H01L2933/0033—Processes relating to semiconductor body packages
    • H01L2933/0058—Processes relating to semiconductor body packages relating to optical field-shaping elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Led Devices (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)
  • Luminescent Compositions (AREA)
PL14182597T 2013-10-09 2014-08-28 Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych PL2860152T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW102136489A TWI472059B (zh) 2013-10-09 2013-10-09 A method of forming a surface plasma using a microstructure

Publications (1)

Publication Number Publication Date
PL2860152T3 true PL2860152T3 (pl) 2017-09-29

Family

ID=51492816

Family Applications (1)

Application Number Title Priority Date Filing Date
PL14182597T PL2860152T3 (pl) 2013-10-09 2014-08-28 Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych

Country Status (7)

Country Link
US (2) US9450154B2 (pl)
EP (1) EP2860152B1 (pl)
JP (1) JP6305873B2 (pl)
CN (1) CN104576873B (pl)
ES (1) ES2631178T3 (pl)
PL (1) PL2860152T3 (pl)
TW (1) TWI472059B (pl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI581452B (zh) * 2014-10-24 2017-05-01 Nat Chunghsing Univ High light extraction rate of light-emitting diodes, conductive films, and conductive films The production method
CN108507678A (zh) * 2018-03-01 2018-09-07 东南大学 一种等离激元多谐振机制增强的可调超光谱探测芯片
CN113694241A (zh) * 2020-05-20 2021-11-26 宗成圣 一种除霾抑菌膜

Family Cites Families (25)

* Cited by examiner, † Cited by third party
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US8178165B2 (en) * 2005-01-21 2012-05-15 The Regents Of The University Of California Method for fabricating a long-range ordered periodic array of nano-features, and articles comprising same
JP2006343650A (ja) * 2005-06-10 2006-12-21 Fuji Xerox Co Ltd 調光組成物、光学素子、及びその調光方法。
JP4794294B2 (ja) * 2005-12-19 2011-10-19 桜宮化学株式会社 無機酸化物構造体及びその製造方法
KR100742720B1 (ko) * 2006-06-07 2007-07-25 한양대학교 산학협력단 화학적 큐어링에 의한 나노입자의 제조방법
EP2050792B1 (en) * 2006-08-09 2013-11-20 DIC Corporation Metal nanoparticle dispersion and production process of the same
TWI363440B (en) 2007-11-01 2012-05-01 Univ Nat Taiwan Light-emitting device, light-emitting diode and method for forming a light-emitting device
GB2455991B (en) * 2007-12-28 2010-12-01 Hauzer Techno Coating Bv A method of giving an article a coloured appearance and an article having a coloured appearance
TWI395348B (zh) 2008-06-05 2013-05-01 Alps Electric Co Ltd Semiconductor light emitting element
WO2010054891A1 (en) * 2008-11-17 2010-05-20 Imec Solution processing method for forming electrical contacts of organic devices
JP5312146B2 (ja) * 2009-03-30 2013-10-09 ユー・ディー・シー アイルランド リミテッド 発光素子
US8223425B2 (en) * 2009-11-06 2012-07-17 Sharp Laboratories Of America, Inc. Plasmonic device tuned using physical modulation
US8895844B2 (en) * 2009-10-23 2014-11-25 The Board Of Trustees Of The Leland Stanford Junior University Solar cell comprising a plasmonic back reflector and method therefor
US9372283B2 (en) * 2009-11-13 2016-06-21 Babak NIKOOBAKHT Nanoengineered devices based on electro-optical modulation of the electrical and optical properties of plasmonic nanoparticles
WO2011065358A1 (ja) * 2009-11-27 2011-06-03 国立大学法人大阪大学 有機電界発光素子、および有機電界発光素子の製造方法
US20130081692A1 (en) * 2010-03-19 2013-04-04 Tokyo Institute Of Technology Solar cell having porous structure in which metal nanoparticles are carried in pores
WO2011135922A1 (ja) * 2010-04-27 2011-11-03 独立行政法人物質・材料研究機構 近接場光源２次元アレイとその製造方法、２次元アレイ型表面プラズモン共振器、太陽電池、光センサー及びバイオセンサー
JP5667511B2 (ja) * 2011-05-23 2015-02-12 Ｊｘ日鉱日石エネルギー株式会社 光電変換素子
JP5822239B2 (ja) * 2010-12-08 2015-11-24 公立大学法人大阪府立大学 金属ナノ粒子集積構造体を利用した被検出物質の検出装置および方法
JP2012132804A (ja) * 2010-12-22 2012-07-12 Kyoto Univ 光増強素子
CN102154010B (zh) * 2011-01-29 2014-08-06 陈哲艮 光增强光致发光材料及其制备方法和应用
US20130329272A1 (en) * 2011-02-09 2013-12-12 Nippon Steel & Sumikin Chemical Co., Ltd. Metal fine-particle dispersed composite, method for fabricating the same, and substrate capable of inducing localized surface plasmon resonance
JP6085095B2 (ja) * 2011-03-31 2017-02-22 住友化学株式会社 光学素子
DE102011079063A1 (de) * 2011-07-13 2013-01-17 Osram Opto Semiconductors Gmbh Lichtemittierendes Bauelement und Verfahren zum Herstellen eines lichtemittierenden Bauelements
US9490148B2 (en) * 2012-09-27 2016-11-08 Taiwan Semiconductor Manufacturing Company, Ltd. Adhesion promoter apparatus and method
KR20150018246A (ko) * 2013-08-09 2015-02-23 한국전자통신연구원 유기발광 다이오드 및 이의 제조 방법

Also Published As

Publication number Publication date
JP2015076608A (ja) 2015-04-20
ES2631178T3 (es) 2017-08-29
EP2860152B1 (en) 2017-03-22
US20150228863A1 (en) 2015-08-13
TWI472059B (zh) 2015-02-01
CN104576873B (zh) 2017-07-14
CN104576873A (zh) 2015-04-29
JP6305873B2 (ja) 2018-04-04
TW201515258A (zh) 2015-04-16
US9450154B2 (en) 2016-09-20
EP2860152A1 (en) 2015-04-15
US9293659B2 (en) 2016-03-22
US20150099321A1 (en) 2015-04-09

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