PL2860152T3 - Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych - Google Patents

Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych

Info

Publication number
PL2860152T3
PL2860152T3 PL14182597T PL14182597T PL2860152T3 PL 2860152 T3 PL2860152 T3 PL 2860152T3 PL 14182597 T PL14182597 T PL 14182597T PL 14182597 T PL14182597 T PL 14182597T PL 2860152 T3 PL2860152 T3 PL 2860152T3
Authority
PL
Poland
Prior art keywords
surface plasmon
generate surface
plasmon waves
microstructure
fabricating
Prior art date
Application number
PL14182597T
Other languages
English (en)
Inventor
Cheng-Sheng Tsung
Shih-Hao Chuang
Original Assignee
Tsung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tsung filed Critical Tsung
Publication of PL2860152T3 publication Critical patent/PL2860152T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/008—Surface plasmon devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58—Optical field-shaping elements
    • H01L33/60—Reflective elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0147—Film patterning
    • B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008—Processes
    • H01L2933/0033—Processes relating to semiconductor body packages
    • H01L2933/0058—Processes relating to semiconductor body packages relating to optical field-shaping elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Led Devices (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Luminescent Compositions (AREA)
  • Chemical Vapour Deposition (AREA)
PL14182597T 2013-10-09 2014-08-28 Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych PL2860152T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW102136489A TWI472059B (zh) 2013-10-09 2013-10-09 A method of forming a surface plasma using a microstructure

Publications (1)

Publication Number Publication Date
PL2860152T3 true PL2860152T3 (pl) 2017-09-29

Family

ID=51492816

Family Applications (1)

Application Number Title Priority Date Filing Date
PL14182597T PL2860152T3 (pl) 2013-10-09 2014-08-28 Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych

Country Status (7)

Country Link
US (2) US9450154B2 (pl)
EP (1) EP2860152B1 (pl)
JP (1) JP6305873B2 (pl)
CN (1) CN104576873B (pl)
ES (1) ES2631178T3 (pl)
PL (1) PL2860152T3 (pl)
TW (1) TWI472059B (pl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI581452B (zh) * 2014-10-24 2017-05-01 Nat Chunghsing Univ High light extraction rate of light-emitting diodes, conductive films, and conductive films The production method
CN108507678A (zh) * 2018-03-01 2018-09-07 东南大学 一种等离激元多谐振机制增强的可调超光谱探测芯片
CN113694241A (zh) * 2020-05-20 2021-11-26 宗成圣 一种除霾抑菌膜

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006078952A1 (en) * 2005-01-21 2006-07-27 University Of California Methods for fabricating a long-range ordered periodic array of nano-features, and articles comprising same
JP2006343650A (ja) * 2005-06-10 2006-12-21 Fuji Xerox Co Ltd 調光組成物、光学素子、及びその調光方法。
JP4794294B2 (ja) * 2005-12-19 2011-10-19 桜宮化学株式会社 無機酸化物構造体及びその製造方法
KR100742720B1 (ko) * 2006-06-07 2007-07-25 한양대학교 산학협력단 화학적 큐어링에 의한 나노입자의 제조방법
US20090198009A1 (en) * 2006-08-09 2009-08-06 Dic Corporation Metal nanoparticle dispersion and production process of the same
TWI363440B (en) 2007-11-01 2012-05-01 Univ Nat Taiwan Light-emitting device, light-emitting diode and method for forming a light-emitting device
GB2455991B (en) * 2007-12-28 2010-12-01 Hauzer Techno Coating Bv A method of giving an article a coloured appearance and an article having a coloured appearance
TWI395348B (zh) 2008-06-05 2013-05-01 Alps Electric Co Ltd Semiconductor light emitting element
JP5560281B2 (ja) * 2008-11-17 2014-07-23 アイメック 有機デバイスの電気コンタクトを形成するための溶液処理方法
JP5312146B2 (ja) * 2009-03-30 2013-10-09 ユー・ディー・シー アイルランド リミテッド 発光素子
US8223425B2 (en) * 2009-11-06 2012-07-17 Sharp Laboratories Of America, Inc. Plasmonic device tuned using physical modulation
US8895844B2 (en) * 2009-10-23 2014-11-25 The Board Of Trustees Of The Leland Stanford Junior University Solar cell comprising a plasmonic back reflector and method therefor
US9372283B2 (en) * 2009-11-13 2016-06-21 Babak NIKOOBAKHT Nanoengineered devices based on electro-optical modulation of the electrical and optical properties of plasmonic nanoparticles
US20120313129A1 (en) * 2009-11-27 2012-12-13 Osaka University Organic electroluminescent element, and method for manufacturing organic electroluminescent element
JP5731478B2 (ja) * 2010-03-19 2015-06-10 国立大学法人東京工業大学 細孔の中に金属ナノ粒子が担持されている多孔質構造を有する太陽電池
WO2011135922A1 (ja) * 2010-04-27 2011-11-03 独立行政法人物質・材料研究機構 近接場光源２次元アレイとその製造方法、２次元アレイ型表面プラズモン共振器、太陽電池、光センサー及びバイオセンサー
JP5667511B2 (ja) * 2011-05-23 2015-02-12 Ｊｘ日鉱日石エネルギー株式会社 光電変換素子
WO2012077756A1 (ja) * 2010-12-08 2012-06-14 公立大学法人大阪府立大学 金属ナノ粒子集積構造体を利用した被検出物質の検出装置および方法
JP2012132804A (ja) * 2010-12-22 2012-07-12 Kyoto Univ 光増強素子
CN102154010B (zh) * 2011-01-29 2014-08-06 陈哲艮 光增强光致发光材料及其制备方法和应用
KR20140043323A (ko) * 2011-02-09 2014-04-09 신닛테츠 수미킨 가가쿠 가부시키가이샤 금속 미립자 분산 복합체 및 그 제조 방법, 그리고 국재형 표면 플라즈몬 공명 발생 기판
JP6085095B2 (ja) * 2011-03-31 2017-02-22 住友化学株式会社 光学素子
DE102011079063A1 (de) * 2011-07-13 2013-01-17 Osram Opto Semiconductors Gmbh Lichtemittierendes Bauelement und Verfahren zum Herstellen eines lichtemittierenden Bauelements
US9490148B2 (en) * 2012-09-27 2016-11-08 Taiwan Semiconductor Manufacturing Company, Ltd. Adhesion promoter apparatus and method
KR20150018246A (ko) * 2013-08-09 2015-02-23 한국전자통신연구원 유기발광 다이오드 및 이의 제조 방법

Also Published As

Publication number Publication date
TW201515258A (zh) 2015-04-16
CN104576873A (zh) 2015-04-29
EP2860152B1 (en) 2017-03-22
CN104576873B (zh) 2017-07-14
US20150099321A1 (en) 2015-04-09
EP2860152A1 (en) 2015-04-15
US20150228863A1 (en) 2015-08-13
US9293659B2 (en) 2016-03-22
JP6305873B2 (ja) 2018-04-04
ES2631178T3 (es) 2017-08-29
JP2015076608A (ja) 2015-04-20
TWI472059B (zh) 2015-02-01
US9450154B2 (en) 2016-09-20

Similar Documents

Publication Publication Date Title
EP3730205C0 (en) SURFACE HUMIDIFYING METHOD
ZA201603220B (en) Processes for producing effects layers
EP3056469A4 (en) Production method for graphene
EP2964455A4 (en) PROCESS FOR THE MANUFACTURE OF DIAMOND NANOSTRUCTURES
PL3006568T3 (pl) Sposób wytwarzania tagatozy
SG11201602587TA (en) Method for producing instant noodles and instant noodles
ZA201600018B (en) Method for improving adherence
EP2977353A4 (en) PROCESS FOR PRODUCING POTASSIUM TITANATE
PL3053888T3 (pl) Sposób wytwarzania tafli szkła
EP2957543A4 (en) PROCESS FOR THE PREPARATION OF TRICHLOROSILANE
EP2960338A4 (en) SUGAR SOLUTION PROCESS
EP2998395A4 (en) METHOD FOR OBTAINING COMPOSITION CONTAINING LACTASE
EP2808376A4 (en) PROCESS FOR PRODUCING A COMPOSITION
GB2512711B (en) Graphene production method
HK1224087A1 (zh) 用於生產薄膜的濕式方法
EP2868476A4 (en) PROCESS FOR PRODUCING PRINTED MEDIA
EP2982770A4 (en) METHOD FOR PRODUCING STEEL FOR SHOVELS
EP2905617A4 (en) IMMUNOLOGICAL ASSAY METHOD USING SURFACE PLASMONS
IL241287A0 (en) Processes for the preparation of subfervir
EP3064384A4 (en) STRUCTURE OF DIFFERENT THICKNESS AND MANUFACTURING METHOD THEREFOR
PL2860152T3 (pl) Sposób wytwarzania mikrostruktury do generowania powierzchniowych fal plazmonowych
EP3026146A4 (en) METHOD FOR MANUFACTURING SiC SUBSTRATES
EP2990396A4 (en) PROCESS FOR PRODUCTION OF OLEFIN CONTAINING FLUORINE
EP2962843A4 (en) LAMINATE AND METHOD FOR THE MANUFACTURE THEREOF
IL229813A0 (en) The process of producing energy from sea waves