PL2283170T3 - Kąpiele elektrolitowe PD i PD-NI - Google Patents
Kąpiele elektrolitowe PD i PD-NIInfo
- Publication number
- PL2283170T3 PL2283170T3 PL08758401T PL08758401T PL2283170T3 PL 2283170 T3 PL2283170 T3 PL 2283170T3 PL 08758401 T PL08758401 T PL 08758401T PL 08758401 T PL08758401 T PL 08758401T PL 2283170 T3 PL2283170 T3 PL 2283170T3
- Authority
- PL
- Poland
- Prior art keywords
- electrolyte
- palladium
- electrolyte baths
- relates
- metallic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08758401A EP2283170B1 (de) | 2008-05-07 | 2008-05-07 | Pd- und pd-ni-elektrolytbäder |
PCT/EP2008/003667 WO2009135505A1 (de) | 2008-05-07 | 2008-05-07 | Pd- und pd-ni-elektrolytbäder |
Publications (1)
Publication Number | Publication Date |
---|---|
PL2283170T3 true PL2283170T3 (pl) | 2012-09-28 |
Family
ID=40193655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL08758401T PL2283170T3 (pl) | 2008-05-07 | 2008-05-07 | Kąpiele elektrolitowe PD i PD-NI |
Country Status (10)
Country | Link |
---|---|
US (1) | US8900436B2 (pl) |
EP (1) | EP2283170B1 (pl) |
JP (1) | JP5586587B2 (pl) |
KR (1) | KR101502804B1 (pl) |
CN (1) | CN102037162B (pl) |
AT (1) | ATE555235T1 (pl) |
ES (1) | ES2387055T3 (pl) |
PL (1) | PL2283170T3 (pl) |
TW (1) | TWI475134B (pl) |
WO (1) | WO2009135505A1 (pl) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009029558A1 (de) * | 2009-09-17 | 2011-03-31 | Schott Solar Ag | Elektrolytzusammensetzung |
RU2469697C1 (ru) * | 2011-05-23 | 2012-12-20 | Открытое акционерное общество "Научно-производственный комплекс "Суперметалл" имени Е.И. Рытвина" | Способ нанесения гальванического покрытия на съемные зубные протезы |
US10263467B2 (en) * | 2012-12-12 | 2019-04-16 | Ls Cable & System Ltd. | Antenna for wireless power, and dual mode antenna comprising same |
KR102482321B1 (ko) * | 2014-09-04 | 2022-12-27 | 니혼 고쥰도가가쿠 가부시키가이샤 | 팔라듐 도금액 및 그것을 사용하여 얻어진 팔라듐 피막 |
JP6189878B2 (ja) * | 2015-01-14 | 2017-08-30 | 松田産業株式会社 | パラジウム又はパラジウム合金めっき用シアン耐性付与剤、めっき液、めっき液へのシアン耐性付与方法 |
AT516876B1 (de) * | 2015-03-09 | 2016-11-15 | Ing W Garhöfer Ges M B H | Abscheidung von dekorativen Palladium-Eisen-Legierungsbeschichtungen auf metallischen Substanzen |
US20180053714A1 (en) * | 2016-08-18 | 2018-02-22 | Rohm And Haas Electronic Materials Llc | Multi-layer electrical contact element |
JP6663335B2 (ja) * | 2016-10-07 | 2020-03-11 | 松田産業株式会社 | パラジウム−ニッケル合金皮膜及びその製造方法 |
KR101867733B1 (ko) * | 2016-12-22 | 2018-06-14 | 주식회사 포스코 | 철-니켈 합금 전해액, 표면조도가 우수한 철-니켈 합금 포일 및 이의 제조방법 |
CN107385481A (zh) * | 2017-07-26 | 2017-11-24 | 苏州鑫旷新材料科技有限公司 | 一种无氰电镀金液 |
EP3456870A1 (en) * | 2017-09-13 | 2019-03-20 | ATOTECH Deutschland GmbH | A bath and method for filling a vertical interconnect access or trench of a work piece with nickel or a nickel alloy |
CN108864200B (zh) * | 2018-08-06 | 2020-12-11 | 金川集团股份有限公司 | 电镀用硫酸乙二胺钯的一步制备方法 |
DE102018133244A1 (de) | 2018-12-20 | 2020-06-25 | Umicore Galvanotechnik Gmbh | Nickel-Amin-Komplex mit reduzierter Tendenz zur Bildung schädlicher Abbauprodukte |
CN110144729B (zh) * | 2019-06-14 | 2020-07-07 | 中国科学院长春应用化学研究所 | 一种导电金包覆聚酰亚胺纤维及其制备方法 |
JP7282136B2 (ja) * | 2021-02-12 | 2023-05-26 | 松田産業株式会社 | パラジウムめっき液及びパラジウムめっき補充液 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3972787A (en) * | 1974-06-14 | 1976-08-03 | Lea-Ronal, Inc. | Palladium electrolyte baths utilizing quaternized pyridine compounds as brighteners |
US4328286A (en) * | 1979-04-26 | 1982-05-04 | The International Nickel Co., Inc. | Electrodeposited palladium, method of preparation and electrical contact made thereby |
US4401527A (en) * | 1979-08-20 | 1983-08-30 | Occidental Chemical Corporation | Process for the electrodeposition of palladium |
US4278514A (en) * | 1980-02-12 | 1981-07-14 | Technic, Inc. | Bright palladium electrodeposition solution |
WO1982002908A1 (en) * | 1981-02-27 | 1982-09-02 | Western Electric Co | Palladium and palladium alloys electroplating procedure |
US4686017A (en) * | 1981-11-05 | 1987-08-11 | Union Oil Co. Of California | Electrolytic bath and methods of use |
US4406755A (en) * | 1982-03-08 | 1983-09-27 | Technic Inc. | Bright palladium electrodeposition |
JPS61502619A (ja) * | 1984-07-02 | 1986-11-13 | アメリカン テレフオン アンド テレグラフ カムパニ− | パラジウム電気メッキプロセス |
JPS6199694A (ja) * | 1984-10-19 | 1986-05-17 | Nippon Kokan Kk <Nkk> | 金属ストリツプの電気めつき方法 |
DD288291A7 (de) * | 1988-08-24 | 1991-03-28 | Fi F. Ne-Metalle,De | Verfahren zur herstellung von palladiumtetrammindihydrogencarbonat |
GB2242200B (en) * | 1990-02-20 | 1993-11-17 | Omi International | Plating compositions and processes |
US5178745A (en) * | 1991-05-03 | 1993-01-12 | At&T Bell Laboratories | Acidic palladium strike bath |
US5415685A (en) | 1993-08-16 | 1995-05-16 | Enthone-Omi Inc. | Electroplating bath and process for white palladium |
CN1214990A (zh) * | 1997-10-22 | 1999-04-28 | 林锦暖 | 聚烯烃塑料一体成型的鞋中底制法 |
RU2161535C2 (ru) * | 1998-07-15 | 2001-01-10 | Парфенов Анатолий Николаевич | Способ приготовления палладиевого катализатора |
FR2807450B1 (fr) * | 2000-04-06 | 2002-07-05 | Engelhard Clal Sas | Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages |
FR2807422B1 (fr) * | 2000-04-06 | 2002-07-05 | Engelhard Clal Sas | Sel complexe de palladium et son utilisation pour ajuster la concentration en palladium d'un bain electrolytique destine au depot de palladium ou d'un de ses alliages |
CN1289716C (zh) * | 2001-11-30 | 2006-12-13 | 松田产业株式会社 | 钯电镀液 |
-
2008
- 2008-05-07 PL PL08758401T patent/PL2283170T3/pl unknown
- 2008-05-07 CN CN2008801290502A patent/CN102037162B/zh active Active
- 2008-05-07 ES ES08758401T patent/ES2387055T3/es active Active
- 2008-05-07 WO PCT/EP2008/003667 patent/WO2009135505A1/de active Application Filing
- 2008-05-07 AT AT08758401T patent/ATE555235T1/de active
- 2008-05-07 JP JP2011507793A patent/JP5586587B2/ja active Active
- 2008-05-07 US US12/990,864 patent/US8900436B2/en active Active
- 2008-05-07 EP EP08758401A patent/EP2283170B1/de active Active
- 2008-05-07 KR KR1020107024801A patent/KR101502804B1/ko active IP Right Grant
-
2009
- 2009-04-13 TW TW098112180A patent/TWI475134B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR101502804B1 (ko) | 2015-03-16 |
KR20110003519A (ko) | 2011-01-12 |
ATE555235T1 (de) | 2012-05-15 |
CN102037162B (zh) | 2013-03-27 |
US20110168566A1 (en) | 2011-07-14 |
ES2387055T3 (es) | 2012-09-12 |
JP2011520036A (ja) | 2011-07-14 |
EP2283170A1 (de) | 2011-02-16 |
US8900436B2 (en) | 2014-12-02 |
WO2009135505A1 (de) | 2009-11-12 |
TW201006967A (en) | 2010-02-16 |
JP5586587B2 (ja) | 2014-09-10 |
TWI475134B (zh) | 2015-03-01 |
EP2283170B1 (de) | 2012-04-25 |
CN102037162A (zh) | 2011-04-27 |
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