PL2274763T3 - Sposób wytwarzania obrabianych elementów z wytrawianymi jonowo powierzchniami - Google Patents

Sposób wytwarzania obrabianych elementów z wytrawianymi jonowo powierzchniami

Info

Publication number
PL2274763T3
PL2274763T3 PL09734820T PL09734820T PL2274763T3 PL 2274763 T3 PL2274763 T3 PL 2274763T3 PL 09734820 T PL09734820 T PL 09734820T PL 09734820 T PL09734820 T PL 09734820T PL 2274763 T3 PL2274763 T3 PL 2274763T3
Authority
PL
Poland
Prior art keywords
ion
etched surface
manufacturing workpieces
workpieces
manufacturing
Prior art date
Application number
PL09734820T
Other languages
English (en)
Inventor
Siegfried Krassnitzer
Oliver Gstoehl
Markus Esselbach
Original Assignee
Oerlikon Surface Solutions Ag, Pfäffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag, Pfäffikon filed Critical Oerlikon Surface Solutions Ag, Pfäffikon
Publication of PL2274763T3 publication Critical patent/PL2274763T3/pl

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00Etching of wafers, substrates or parts of devices
    • H10P50/20Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • H10W20/071Manufacture or treatment of dielectric parts thereof
    • H10W20/093Manufacture or treatment of dielectric parts thereof by modifying materials of the dielectric parts
    • H10W20/095Manufacture or treatment of dielectric parts thereof by modifying materials of the dielectric parts by irradiating with electromagnetic or particle radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
PL09734820T 2008-04-22 2009-04-15 Sposób wytwarzania obrabianych elementów z wytrawianymi jonowo powierzchniami PL2274763T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4687708P 2008-04-22 2008-04-22
PCT/EP2009/054463 WO2009130148A1 (en) 2008-04-22 2009-04-15 Method for manufacturing workpieces with ion-etched surface
EP09734820.5A EP2274763B1 (en) 2008-04-22 2009-04-15 Method for manufacturing workpieces with ion-etched surface

Publications (1)

Publication Number Publication Date
PL2274763T3 true PL2274763T3 (pl) 2019-03-29

Family

ID=40941643

Family Applications (1)

Application Number Title Priority Date Filing Date
PL09734820T PL2274763T3 (pl) 2008-04-22 2009-04-15 Sposób wytwarzania obrabianych elementów z wytrawianymi jonowo powierzchniami

Country Status (17)

Country Link
US (1) US8864959B2 (pl)
EP (1) EP2274763B1 (pl)
JP (1) JP5490098B2 (pl)
KR (1) KR101558018B1 (pl)
CN (1) CN102017055B (pl)
AU (1) AU2009240083B2 (pl)
BR (1) BRPI0910613B1 (pl)
CA (1) CA2721249C (pl)
ES (1) ES2703385T3 (pl)
MX (1) MX2010011590A (pl)
PL (1) PL2274763T3 (pl)
RU (1) RU2504860C2 (pl)
SG (1) SG188799A1 (pl)
SI (1) SI2274763T1 (pl)
TR (1) TR201820226T4 (pl)
TW (1) TWI449077B (pl)
WO (1) WO2009130148A1 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102560432B (zh) * 2010-12-13 2015-02-25 北京北方微电子基地设备工艺研究中心有限责任公司 一种基片承载装置及应用该装置的基片处理设备
AT510606B1 (de) * 2011-02-09 2012-05-15 Leica Mikrosysteme Gmbh Vorrichtung und verfahren zur probenpräparation

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0724205B2 (ja) * 1986-10-08 1995-03-15 株式会社日立製作所 イオンビ−ムの加工装置
JPH02159389A (ja) * 1988-12-14 1990-06-19 Hitachi Ltd 自公転ホルダ、及びこれを備えたイオンビーム加工機
DE3920772A1 (de) 1989-06-24 1991-01-03 Leyendecker Toni Geraet zur beschichtung von substraten durch kathodenzerstaeubung
DE4125365C1 (pl) * 1991-07-31 1992-05-21 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
DE29615190U1 (de) * 1996-03-11 1996-11-28 Balzers Verschleissschutz GmbH, 55411 Bingen Anlage zur Beschichtung von Werkstücken
DE69706983T2 (de) * 1996-05-31 2002-05-29 Ipec Precision, Inc.(N.D.Ges.D.Staates Delaware) Anlage zum behandeln von substraten mit einem plasmastrahl
DE19725930C2 (de) * 1997-06-16 2002-07-18 Eberhard Moll Gmbh Dr Verfahren und Anlage zum Behandeln von Substraten mittels Ionen aus einer Niedervoltbogenentladung
EP1078110B1 (de) * 1998-04-29 2002-11-27 Unaxis Trading AG Werkzeug oder maschinenbauteil und verfahren zu dessen herstellung sowie vakuumbehandlungsanlage
JP2000057986A (ja) 1998-08-10 2000-02-25 Hitachi Ltd イオンビーム加工装置
RU2161662C2 (ru) * 1999-03-29 2001-01-10 Слепцов Владимир Владимирович Способ обработки поверхности твердого тела
US6236163B1 (en) * 1999-10-18 2001-05-22 Yuri Maishev Multiple-beam ion-beam assembly
EP1186681B1 (de) * 2000-09-05 2010-03-31 Oerlikon Trading AG, Trübbach Vakuumanlage mit koppelbarem Werkstückträger
JP2002212724A (ja) * 2001-01-19 2002-07-31 Hitachi Ltd イオンビームスパッタ装置
KR20040111096A (ko) * 2003-06-20 2004-12-31 마츠시타 덴끼 산교 가부시키가이샤 고압방전램프의 점등방법 및 점등장치, 고압방전램프장치및 투사형 화상표시장치
US9997338B2 (en) * 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
JP4693002B2 (ja) * 2005-10-17 2011-06-01 株式会社神戸製鋼所 アークイオンプレーティング装置
US20070209932A1 (en) 2006-03-10 2007-09-13 Veeco Instruments Inc. Sputter deposition system and methods of use
WO2008005541A2 (en) * 2006-07-07 2008-01-10 Accretech Usa, Inc. Clean ignition system for wafer substrate processing

Also Published As

Publication number Publication date
AU2009240083A1 (en) 2009-10-29
US20090260977A1 (en) 2009-10-22
MX2010011590A (es) 2011-05-25
EP2274763B1 (en) 2018-10-03
CN102017055B (zh) 2014-05-07
TW201005786A (en) 2010-02-01
AU2009240083B2 (en) 2013-08-29
KR20110015566A (ko) 2011-02-16
CA2721249C (en) 2016-10-18
JP2011524602A (ja) 2011-09-01
WO2009130148A1 (en) 2009-10-29
US8864959B2 (en) 2014-10-21
CA2721249A1 (en) 2009-10-29
SI2274763T1 (sl) 2019-02-28
CN102017055A (zh) 2011-04-13
RU2010147405A (ru) 2012-05-27
KR101558018B1 (ko) 2015-10-19
TR201820226T4 (tr) 2019-01-21
ES2703385T3 (es) 2019-03-08
TWI449077B (zh) 2014-08-11
BRPI0910613B1 (pt) 2021-06-22
RU2504860C2 (ru) 2014-01-20
JP5490098B2 (ja) 2014-05-14
SG188799A1 (en) 2013-04-30
BRPI0910613A2 (pt) 2017-08-29
EP2274763A1 (en) 2011-01-19

Similar Documents

Publication Publication Date Title
TWI370769B (en) Manufacturing method for ornamented container
EP2345515A4 (en) METHOD OF REMOVING
PL2373494T3 (pl) Sposoby wytwarzania paneli
PL2620214T3 (pl) Sposób wytwarzania izobutenu
HUE036661T2 (hu) Eljárás biodízel elõállítására
EP2343413A4 (en) WALL TITLE AND METHOD FOR THE PRODUCTION THEREOF
ZA201004482B (en) Method for preparing linear alpha-olefins
PL2159292T3 (pl) Sposób wytwarzania kształtowanego wyrobu
PT2370400T (pt) Processo para o fabrico de isocianatos
TWI365788B (en) Surface crack sealing method
EP2207818A4 (en) PROCESS FOR PRODUCING PURIFIED FLUORINATED POLYMERS
ZA201100511B (en) Manufacturing method for absorptive article.
EP2312170A4 (en) MECHANICAL COMPONENT AND MANUFACTURING METHOD THEREFOR
EP2261262A4 (en) METHOD FOR PRODUCING POLYURONATE
EP2312025A4 (en) PROCESS FOR TREATING LIBERAL FIBER MATERIALS
EP2340161A4 (en) MANUFACTURING PROCESS
TWI367821B (en) Mold and method for manufacturing the same
TWI339612B (en) Cutting wheel with surface modification and method for manufacturing the same
EP2234759A4 (en) METHOD FOR PRODUCING AN EXTREMELY HYDROPHOBIC SURFACE
PL2212302T3 (pl) Sposób wytwarzania melaminy
TWI365967B (en) Heat-dissipating sheet and method for manufacturing heat-dissipating sheet
EP2376666A4 (en) STEEL WITH INSULATED SURFACE COOLING AND MANUFACTURING METHOD THEREFOR
PL2274763T3 (pl) Sposób wytwarzania obrabianych elementów z wytrawianymi jonowo powierzchniami
GB0802686D0 (en) High surface area metal production
IL199635A0 (en) Surface treating method for cutting tools