PL2219996T3 - Nowy strąceniowy kwas krzemowy do zagęszczania i wytwarzania zachowania tiksotropowego w systemach ciekłych - Google Patents

Nowy strąceniowy kwas krzemowy do zagęszczania i wytwarzania zachowania tiksotropowego w systemach ciekłych

Info

Publication number
PL2219996T3
PL2219996T3 PL08854777T PL08854777T PL2219996T3 PL 2219996 T3 PL2219996 T3 PL 2219996T3 PL 08854777 T PL08854777 T PL 08854777T PL 08854777 T PL08854777 T PL 08854777T PL 2219996 T3 PL2219996 T3 PL 2219996T3
Authority
PL
Poland
Prior art keywords
thickening
liquid systems
generating
silicic acid
precipitated silicic
Prior art date
Application number
PL08854777T
Other languages
English (en)
Inventor
Christian Panz
Karl Meier
James J Toth
Matthew Romaine
Mario Scholz
Guido Titz
Original Assignee
Evonik Degussa Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa Gmbh filed Critical Evonik Degussa Gmbh
Publication of PL2219996T3 publication Critical patent/PL2219996T3/pl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/10Solid density
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/19Oil-absorption capacity, e.g. DBP values
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/259Silicic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Disintegrating Or Milling (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
PL08854777T 2007-11-26 2008-10-24 Nowy strąceniowy kwas krzemowy do zagęszczania i wytwarzania zachowania tiksotropowego w systemach ciekłych PL2219996T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/944,851 US7985292B2 (en) 2007-11-26 2007-11-26 Precipitated silica for thickening and creating thixotropic behavior in liquid systems
EP08854777A EP2219996B1 (de) 2007-11-26 2008-10-24 Neue fällungskieselsäure zur verdickung und erzeugung von thixotropem verhalten in flüssigen systemen
PCT/EP2008/064413 WO2009068379A1 (de) 2007-11-26 2008-10-24 Neue fällungskieselsäure zur verdickung und erzeugung von thixotropem verhalten in flüssigen systemen

Publications (1)

Publication Number Publication Date
PL2219996T3 true PL2219996T3 (pl) 2012-05-31

Family

ID=40566528

Family Applications (1)

Application Number Title Priority Date Filing Date
PL08854777T PL2219996T3 (pl) 2007-11-26 2008-10-24 Nowy strąceniowy kwas krzemowy do zagęszczania i wytwarzania zachowania tiksotropowego w systemach ciekłych

Country Status (14)

Country Link
US (1) US7985292B2 (pl)
EP (1) EP2219996B1 (pl)
JP (1) JP5295261B2 (pl)
KR (1) KR101498752B1 (pl)
CN (1) CN101873995B (pl)
AT (1) ATE537110T1 (pl)
BR (1) BRPI0819910B1 (pl)
ES (1) ES2378120T3 (pl)
MX (1) MX2010005575A (pl)
MY (1) MY148331A (pl)
PL (1) PL2219996T3 (pl)
PT (1) PT2219996E (pl)
TW (1) TWI457280B (pl)
WO (1) WO2009068379A1 (pl)

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JP4637178B2 (ja) * 2004-09-21 2011-02-23 ヴィヴェス,ホアン イグレシアス 赤外線を用いた粉末材料の造粒及び/又は乾燥方法及び装置
JP4785802B2 (ja) * 2007-07-31 2011-10-05 株式会社日清製粉グループ本社 粉体分級装置
PL2218703T3 (pl) * 2009-02-13 2013-10-31 Evonik Degussa Gmbh Materiał termoizolacyjny zawierający strącaną krzemionkę
WO2011014139A1 (en) * 2009-07-28 2011-02-03 Photokinetic Coatings & Adhesives, Llc. Uv-curable floor sealants
DE102009045116A1 (de) * 2009-09-29 2011-03-31 Evonik Degussa Gmbh Niederdruckvermahlungsverfahren
DE102011014643A1 (de) * 2011-03-21 2012-09-27 Roland Nied Betriebsverfahren für eine Strahlmühlenanlage und Strahlmühlenanlage
DE102011102614A1 (de) * 2011-05-27 2012-11-29 Roland Nied Verfahren zum Betrieb einer Strahlmühle sowie Strahlmühle
PL222564B1 (pl) 2012-05-18 2016-08-31 Inst Inżynierii Materiałów Polimerowych I Barwników Kompozycja poliestrowa o ograniczonej palności
CN104291345B (zh) * 2014-09-22 2017-01-25 无锡恒诚硅业有限公司 具有低硅醇基的沉淀二氧化硅、制备方法和用途
CN104291342B (zh) * 2014-09-22 2017-01-25 无锡恒诚硅业有限公司 一种沉淀二氧化硅、制备方法及其用途
US11261284B2 (en) * 2016-11-07 2022-03-01 Allnex Netherlands B.V. Process for the preparation of a thixotropic composition
US10221302B2 (en) * 2016-12-13 2019-03-05 E I Du Pont De Nemours And Company Solid polymeric highly durable surfacing
US10927238B2 (en) * 2016-12-13 2021-02-23 Dupont Safety & Construction, Inc. Solid polymeric highly durable surfacing
EP3467052B1 (de) 2017-10-06 2022-04-13 Evonik Operations GmbH Wässrige dispersion enthaltend siliziumdioxid und trimethyl 1,6-hexamethylendiamin
US20220081309A1 (en) * 2018-12-26 2022-03-17 Sumitomo Chemical Company, Limited Alumina, alumina slurry, alumina film, laminate separator, nonaqueous electrolyte secondary battery and manufacturing method thereof
WO2020175160A1 (ja) * 2019-02-28 2020-09-03 株式会社トクヤマ シリカ粉末、樹脂組成物および分散体
CN111701702B (zh) * 2020-06-24 2021-09-17 宁波舜鑫新型建材有限公司 一种建筑固废垃圾水泥预制件回收再利用系统及其工艺
CN112354634A (zh) * 2020-10-13 2021-02-12 陈晓玲 一种蔬菜果皮去杂的分离装置
CN113333138B (zh) * 2021-05-29 2022-10-04 镇江市蓝火环保能源有限公司 一种煤粉研磨机

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DE3815670A1 (de) * 1988-05-07 1990-01-25 Degussa Feinteilige faellungskieselsaeure mit hoher struktur, verfahren zu seiner herstellung und verwendung
DE4041827A1 (de) 1990-12-24 1992-07-02 Degussa Faellungskieselsaeurepaste
DE4202023A1 (de) 1992-01-25 1993-07-29 Degussa Haftpromoter fuer kautschuk- und kunststoffmischungen
JP2935615B2 (ja) * 1992-12-15 1999-08-16 日本シリカ工業株式会社 微細沈殿ケイ酸及びその製造法
US5747003A (en) * 1995-03-22 1998-05-05 Ppg Industries, Inc. Amorphous precipitated silica abrasive
JPH0930810A (ja) * 1995-07-20 1997-02-04 Nippon Silica Ind Co Ltd 表面処理したシリカゲルの製造方法
DE19527278A1 (de) 1995-07-26 1997-01-30 Degussa Fällungskieselsäure
US6191122B1 (en) 1996-03-29 2001-02-20 DEGUSSA HüLS AKTIENGESELLSCHAFT Partially hydrophobic precipitated silicas
DE10058616A1 (de) 2000-11-25 2002-05-29 Degussa Fällungskieselsäuren mit hoher Struktur
DE10062449A1 (de) * 2000-12-14 2002-06-20 Degussa Dotierte Fällungskieselsäure
DE10138490A1 (de) 2001-08-04 2003-02-13 Degussa Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
DE10138492A1 (de) 2001-08-04 2003-02-13 Degussa Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad
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US20030114571A1 (en) * 2001-10-10 2003-06-19 Xiao-Dong Pan Wet traction in tire treads compounded with surface modified siliceous and oxidic fillers
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Also Published As

Publication number Publication date
US20090136672A1 (en) 2009-05-28
CN101873995B (zh) 2012-08-29
CN101873995A (zh) 2010-10-27
JP2011510891A (ja) 2011-04-07
MY148331A (en) 2013-03-29
BRPI0819910B1 (pt) 2019-10-22
BRPI0819910A2 (pt) 2017-06-13
EP2219996B1 (de) 2011-12-14
ES2378120T3 (es) 2012-04-09
MX2010005575A (es) 2010-06-02
KR20100108534A (ko) 2010-10-07
WO2009068379A1 (de) 2009-06-04
TW200938485A (en) 2009-09-16
EP2219996A1 (de) 2010-08-25
US7985292B2 (en) 2011-07-26
KR101498752B1 (ko) 2015-03-09
ATE537110T1 (de) 2011-12-15
JP5295261B2 (ja) 2013-09-18
TWI457280B (zh) 2014-10-21
PT2219996E (pt) 2012-03-05

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