PL2054539T3 - Sposób osadzania warstw chromowych jako twardych powłok chromowych, kąpiel galwanizacyjna oraz twarde powierzchnie chromowe - Google Patents
Sposób osadzania warstw chromowych jako twardych powłok chromowych, kąpiel galwanizacyjna oraz twarde powierzchnie chromoweInfo
- Publication number
- PL2054539T3 PL2054539T3 PL07786477T PL07786477T PL2054539T3 PL 2054539 T3 PL2054539 T3 PL 2054539T3 PL 07786477 T PL07786477 T PL 07786477T PL 07786477 T PL07786477 T PL 07786477T PL 2054539 T3 PL2054539 T3 PL 2054539T3
- Authority
- PL
- Poland
- Prior art keywords
- hard
- chrome
- deposition
- electroplating bath
- chromium layers
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
- Y10T428/12826—Group VIB metal-base component
- Y10T428/12847—Cr-base component
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006035871A DE102006035871B3 (de) | 2006-08-01 | 2006-08-01 | Verfahren zur Abscheidung von Chromschichten als Hartverchromung, Galvanisierungsbad sowie hartverchromte Oberflächen und deren Verwendung |
EP07786477A EP2054539B1 (en) | 2006-08-01 | 2007-07-31 | Method for deposition of chromium layers as hard- chrome plating, electroplating bath and hard- chrome surfaces |
PCT/EP2007/006783 WO2008014987A2 (en) | 2006-08-01 | 2007-07-31 | Method for deposition of chromium layers as hard- chrome plating, electroplating bath and hard- chrome surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
PL2054539T3 true PL2054539T3 (pl) | 2012-11-30 |
Family
ID=38800725
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL07786477T PL2054539T3 (pl) | 2006-08-01 | 2007-07-31 | Sposób osadzania warstw chromowych jako twardych powłok chromowych, kąpiel galwanizacyjna oraz twarde powierzchnie chromowe |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100075174A1 (pl) |
EP (1) | EP2054539B1 (pl) |
JP (1) | JP2009545669A (pl) |
CN (1) | CN101512047A (pl) |
DE (1) | DE102006035871B3 (pl) |
PL (1) | PL2054539T3 (pl) |
WO (1) | WO2008014987A2 (pl) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008050034B4 (de) * | 2008-10-01 | 2013-02-21 | Voestalpine Stahl Gmbh | Verfahren zum elektrolytischen Abscheiden von Chrom und Chromlegierungen |
IT1393140B1 (it) * | 2009-03-17 | 2012-04-11 | Nuovo Pignone Spa | Metodo di produzione di un rivestimento protettivo per un componente di una turbomacchina, il componente stesso e la relativa macchina |
KR101141723B1 (ko) | 2010-01-13 | 2012-05-04 | 신양에너지 주식회사 | 구리금속판에 저방사율 및 고흡수율의 친환경 블랙황산크롬 도금 연속 자동 전착방법 |
KR101102471B1 (ko) * | 2010-01-13 | 2012-01-05 | 한밭대학교 산학협력단 | 구리금속판에 저방사율 및 고흡수율의 친환경 블랙 황산크롬 도금액 |
KR101198353B1 (ko) * | 2010-07-29 | 2012-11-09 | 한국기계연구원 | 3가크롬도금액 및 이를 이용한 도금방법 |
CN103201411A (zh) * | 2010-08-23 | 2013-07-10 | 俄亥俄州立大学 | 通过电解尿素而进行的选择性催化还原 |
CN101967661A (zh) * | 2010-10-26 | 2011-02-09 | 广东多正化工科技有限公司 | 一种三价铬电镀液 |
WO2013064962A2 (en) | 2011-10-30 | 2013-05-10 | William Messner | Multiple port distribution manifold |
CN102443825B (zh) * | 2011-12-07 | 2014-03-26 | 湖北振华化学股份有限公司 | 一种高浓度硫酸铬——氟化铵三价铬电镀液及其制备方法 |
WO2015107256A1 (en) * | 2014-01-15 | 2015-07-23 | Savroc Ltd | Method for producing a chromium coating and a coated object |
EP3094764B1 (en) | 2014-01-15 | 2024-10-09 | Savroc Ltd | Method for producing chromium-containing multilayer coating and a coated object |
EP2899299A1 (en) | 2014-01-24 | 2015-07-29 | COVENTYA S.p.A. | Electroplating bath containing trivalent chromium and process for depositing chromium |
CN106661749B (zh) | 2014-07-11 | 2020-06-05 | 萨夫罗克有限公司 | 含铬涂层,其制备方法以及涂覆物体 |
DE102014116717A1 (de) | 2014-11-14 | 2016-05-19 | Maschinenfabrik Kaspar Walter Gmbh & Co Kg | Elektrolyt und Verfahren zur Herstellung von Chromschichten |
DE102015202910A1 (de) | 2015-02-18 | 2016-08-18 | Dr.-Ing. Max Schlötter GmbH & Co KG | Zinn-Nickel-Schicht mit hoher Härte |
CN107313078A (zh) * | 2016-04-27 | 2017-11-03 | 中国科学院金属研究所 | 一种三价铬电镀溶液及其制备方法 |
US11686005B1 (en) * | 2022-01-28 | 2023-06-27 | Applied Materials, Inc. | Electroplating systems and methods with increased metal ion concentrations |
DE102022121557A1 (de) | 2022-08-25 | 2024-03-07 | Maschinenfabrik Kaspar Walter Gmbh & Co Kg | Verfahren zur steuerung der chromzufuhr in einem elektrolyseverfahren zur herstellung von chromschichten sowie eine elektrolysezelle hierfür |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4161432A (en) * | 1975-12-03 | 1979-07-17 | International Business Machines Corporation | Electroplating chromium and its alloys |
GB1571193A (en) * | 1976-12-16 | 1980-07-09 | Ibm Uk | Electroplating chromium and its alloys |
GB1602404A (en) * | 1978-04-06 | 1981-11-11 | Ibm | Electroplating of chromium |
JPS5531119A (en) * | 1978-08-25 | 1980-03-05 | Toyo Soda Mfg Co Ltd | Chrome plating bath |
JPS56112493A (en) * | 1980-02-13 | 1981-09-04 | Agency Of Ind Science & Technol | Chrome plating method |
GB2109815B (en) * | 1981-11-18 | 1985-09-04 | Ibm | Electrodepositing chromium |
EP0088192B1 (en) * | 1982-03-05 | 1986-11-05 | M & T Chemicals, Inc. | Control of anode gas evolution in trivalent chromium plating bath |
JPS5976567U (ja) * | 1982-11-12 | 1984-05-24 | 富士通株式会社 | 循環式メツキ装置 |
JPS6123783A (ja) * | 1984-07-10 | 1986-02-01 | Toyo Soda Mfg Co Ltd | イオン交換膜を用いるクロムメツキ法 |
JPS6126797A (ja) * | 1984-07-13 | 1986-02-06 | Toyo Soda Mfg Co Ltd | イオン交換膜を用いるクロム合金メツキ法 |
JPS61288100A (ja) * | 1985-06-15 | 1986-12-18 | Kawasaki Steel Corp | 鋼板の電解処理におけるph制御方法 |
EP0285931B1 (en) * | 1987-03-31 | 1993-08-04 | Nippon Steel Corporation | Corrosion resistant plated steel strip and method for producing same |
US5196109A (en) * | 1991-08-01 | 1993-03-23 | Geoffrey Scott | Trivalent chromium electrolytes and plating processes employing same |
US5338433A (en) * | 1993-06-17 | 1994-08-16 | Mcdonnell Douglas Corporation | Chromium alloy electrodeposition and surface fixation of calcium phosphate ceramics |
JP3188361B2 (ja) | 1994-06-27 | 2001-07-16 | ペルメレック電極株式会社 | クロムめっき方法 |
JPH0995793A (ja) * | 1995-09-29 | 1997-04-08 | Shigeo Hoshino | 熱硬化性を有するクロムめっきを析出する3価クロムめっき浴 |
JP2002285375A (ja) * | 2001-03-28 | 2002-10-03 | Chunichi Craft Kk | 3価クロムめっき浴 |
US20050011753A1 (en) * | 2003-06-23 | 2005-01-20 | Jackson John R. | Low energy chlorate electrolytic cell and process |
US20050173255A1 (en) * | 2004-02-05 | 2005-08-11 | George Bokisa | Electroplated quaternary alloys |
US7442286B2 (en) * | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
BRPI0710028B1 (pt) * | 2006-03-31 | 2018-02-14 | Atotech Deutschland Gmbh | Depósito de cromo funcional cristalino, seu processo de eletrodeposição, e banho de eletrodeposição |
-
2006
- 2006-08-01 DE DE102006035871A patent/DE102006035871B3/de not_active Expired - Fee Related
-
2007
- 2007-07-31 CN CNA2007800331197A patent/CN101512047A/zh active Pending
- 2007-07-31 PL PL07786477T patent/PL2054539T3/pl unknown
- 2007-07-31 JP JP2009522168A patent/JP2009545669A/ja active Pending
- 2007-07-31 US US12/375,907 patent/US20100075174A1/en not_active Abandoned
- 2007-07-31 EP EP07786477A patent/EP2054539B1/en not_active Not-in-force
- 2007-07-31 WO PCT/EP2007/006783 patent/WO2008014987A2/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP2054539A2 (en) | 2009-05-06 |
EP2054539B1 (en) | 2012-05-30 |
WO2008014987A2 (en) | 2008-02-07 |
US20100075174A1 (en) | 2010-03-25 |
WO2008014987A3 (en) | 2008-07-10 |
JP2009545669A (ja) | 2009-12-24 |
DE102006035871B3 (de) | 2008-03-27 |
CN101512047A (zh) | 2009-08-19 |
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