NO874696L - Fotoinitiatorsammensetting. - Google Patents
Fotoinitiatorsammensetting.Info
- Publication number
- NO874696L NO874696L NO874696A NO874696A NO874696L NO 874696 L NO874696 L NO 874696L NO 874696 A NO874696 A NO 874696A NO 874696 A NO874696 A NO 874696A NO 874696 L NO874696 L NO 874696L
- Authority
- NO
- Norway
- Prior art keywords
- approx
- composition according
- photopolymerizable
- bis
- alkyl ester
- Prior art date
Links
- 239000000203 mixture Substances 0.000 claims description 78
- 150000001875 compounds Chemical class 0.000 claims description 31
- 239000002253 acid Substances 0.000 claims description 29
- 125000005907 alkyl ester group Chemical group 0.000 claims description 28
- -1 2,4,5-triphenylimidazolyl Chemical group 0.000 claims description 27
- 229930006711 bornane-2,3-dione Natural products 0.000 claims description 26
- 239000000539 dimer Substances 0.000 claims description 26
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 claims description 25
- SANIRTQDABNCHF-UHFFFAOYSA-N 7-(diethylamino)-3-[7-(diethylamino)-2-oxochromene-3-carbonyl]chromen-2-one Chemical compound C1=C(N(CC)CC)C=C2OC(=O)C(C(=O)C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=CC2=C1 SANIRTQDABNCHF-UHFFFAOYSA-N 0.000 claims description 25
- 230000000977 initiatory effect Effects 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 22
- 229920002120 photoresistant polymer Polymers 0.000 claims description 14
- 238000006116 polymerization reaction Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 9
- XPKFLEVLLPKCIW-UHFFFAOYSA-N ethyl 4-(diethylamino)benzoate Chemical compound CCOC(=O)C1=CC=C(N(CC)CC)C=C1 XPKFLEVLLPKCIW-UHFFFAOYSA-N 0.000 claims description 7
- 230000005855 radiation Effects 0.000 claims description 7
- 230000001235 sensitizing effect Effects 0.000 claims description 7
- 238000005406 washing Methods 0.000 claims description 5
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 claims description 4
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 claims description 3
- DVZGSAUNAZEWAI-UHFFFAOYSA-N 2-(2-methoxyphenyl)-2-[2-(2-methoxyphenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical group COC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)OC)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 DVZGSAUNAZEWAI-UHFFFAOYSA-N 0.000 claims description 2
- 235000001671 coumarin Nutrition 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 239000000178 monomer Substances 0.000 claims 4
- RNIPJYFZGXJSDD-UHFFFAOYSA-N 2,4,5-triphenyl-1h-imidazole Chemical class C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 RNIPJYFZGXJSDD-UHFFFAOYSA-N 0.000 claims 1
- 229960000956 coumarin Drugs 0.000 claims 1
- 150000004841 phenylimidazoles Chemical class 0.000 claims 1
- 239000012190 activator Substances 0.000 description 6
- 239000003999 initiator Substances 0.000 description 5
- 230000002195 synergetic effect Effects 0.000 description 5
- 239000003504 photosensitizing agent Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- CDSULTPOCMWJCM-UHFFFAOYSA-N 4h-chromene-2,3-dione Chemical compound C1=CC=C2OC(=O)C(=O)CC2=C1 CDSULTPOCMWJCM-UHFFFAOYSA-N 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- 150000001728 carbonyl compounds Chemical class 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VNQXSTWCDUXYEZ-LDWIPMOCSA-N (+/-)-Camphorquinone Chemical compound C1C[C@@]2(C)C(=O)C(=O)[C@@H]1C2(C)C VNQXSTWCDUXYEZ-LDWIPMOCSA-N 0.000 description 1
- MXWGELSDNRFWFD-UHFFFAOYSA-N 2,4,5,6-tetraphenyl-1h-benzimidazole Chemical compound C1=CC=CC=C1C(NC1=CC(=C2C=3C=CC=CC=3)C=3C=CC=CC=3)=NC1=C2C1=CC=CC=C1 MXWGELSDNRFWFD-UHFFFAOYSA-N 0.000 description 1
- WOSJKENLZHUUMC-UHFFFAOYSA-N 2-(1-methylindol-2-yl)acetic acid Chemical compound C1=CC=C2N(C)C(CC(O)=O)=CC2=C1 WOSJKENLZHUUMC-UHFFFAOYSA-N 0.000 description 1
- LXCJXYYYOPFEDH-UHFFFAOYSA-N 3-(2-oxochromene-3-carbonyl)chromen-2-one Chemical class C1=CC=C2OC(=O)C(C(C=3C(OC4=CC=CC=C4C=3)=O)=O)=CC2=C1 LXCJXYYYOPFEDH-UHFFFAOYSA-N 0.000 description 1
- HYORIVUCOQKMOC-UHFFFAOYSA-N 3-benzoyl-7-methoxychromen-2-one Chemical compound O=C1OC2=CC(OC)=CC=C2C=C1C(=O)C1=CC=CC=C1 HYORIVUCOQKMOC-UHFFFAOYSA-N 0.000 description 1
- LDUNNUKQPKEIJR-UHFFFAOYSA-N 4,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C.C1CC2(C)C(=O)C(=O)C1C2(C)C LDUNNUKQPKEIJR-UHFFFAOYSA-N 0.000 description 1
- YDIYEOMDOWUDTJ-UHFFFAOYSA-M 4-(dimethylamino)benzoate Chemical compound CN(C)C1=CC=C(C([O-])=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- WYWZRNAHINYAEF-UHFFFAOYSA-N Padimate O Chemical compound CCCCC(CC)COC(=O)C1=CC=C(N(C)C)C=C1 WYWZRNAHINYAEF-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical class [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- BPBOBPIKWGUSQG-UHFFFAOYSA-N bismuthane Chemical class [BiH3] BPBOBPIKWGUSQG-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 150000004775 coumarins Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 238000012682 free radical photopolymerization Methods 0.000 description 1
- 125000002883 imidazolyl group Chemical class 0.000 description 1
- 239000012457 nonaqueous media Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 230000002165 photosensitisation Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 125000005402 stannate group Chemical group 0.000 description 1
- OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical class [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
- 150000003453 sulfinic acid esters Chemical class 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K13/00—Use of mixtures of ingredients not covered by one single of the preceding main groups, each of these compounds being essential
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
Landscapes
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Photoreceptors In Electrophotography (AREA)
- Color Printing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US93068686A | 1986-11-12 | 1986-11-12 | |
| US4305487A | 1987-04-27 | 1987-04-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NO874696D0 NO874696D0 (no) | 1987-11-11 |
| NO874696L true NO874696L (no) | 1988-05-13 |
Family
ID=26719977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO874696A NO874696L (no) | 1986-11-12 | 1987-11-11 | Fotoinitiatorsammensetting. |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP0268429A3 (xx) |
| KR (1) | KR880006309A (xx) |
| AU (1) | AU602541B2 (xx) |
| BR (1) | BR8706083A (xx) |
| DK (1) | DK590487A (xx) |
| IL (1) | IL84254A (xx) |
| NO (1) | NO874696L (xx) |
| NZ (1) | NZ222372A (xx) |
| PH (1) | PH26210A (xx) |
| PT (1) | PT86087B (xx) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4416660A1 (de) * | 1993-05-14 | 1994-11-17 | Du Pont | Verfahren zum Abscheiden eines Metalls auf einem Substrat aus einem Galvanisierbad |
| US20040033317A1 (en) * | 2000-12-13 | 2004-02-19 | Gisele Baudin | Surface-active photoinitators |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4289844A (en) * | 1979-06-18 | 1981-09-15 | Eastman Kodak Company | Photopolymerizable compositions featuring novel co-initiators |
| US4459349A (en) * | 1981-03-27 | 1984-07-10 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US4525256A (en) * | 1983-07-01 | 1985-06-25 | Johnson & Johnson Dental Products Company | Photopolymerizable composition including catalyst comprising diketone plus 4-(N,N-dimethylamino)benzoic acid or ester thereof |
| US4548689A (en) * | 1983-09-28 | 1985-10-22 | Mitsui Petrochemical Industries, Ltd. | Photocurable resin composition |
| JPS61188533A (ja) * | 1985-02-18 | 1986-08-22 | Sekisui Chem Co Ltd | 感光性樹脂組成物 |
-
1987
- 1987-10-23 IL IL84254A patent/IL84254A/xx not_active IP Right Cessation
- 1987-10-30 NZ NZ222372A patent/NZ222372A/xx unknown
- 1987-11-06 PT PT86087A patent/PT86087B/pt not_active IP Right Cessation
- 1987-11-10 AU AU80968/87A patent/AU602541B2/en not_active Ceased
- 1987-11-11 DK DK590487A patent/DK590487A/da not_active Application Discontinuation
- 1987-11-11 NO NO874696A patent/NO874696L/no unknown
- 1987-11-11 BR BR8706083A patent/BR8706083A/pt unknown
- 1987-11-12 KR KR870012709A patent/KR880006309A/ko not_active Application Discontinuation
- 1987-11-12 EP EP87310009A patent/EP0268429A3/en not_active Withdrawn
-
1989
- 1989-10-10 PH PH36053A patent/PH26210A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AU602541B2 (en) | 1990-10-18 |
| EP0268429A2 (en) | 1988-05-25 |
| PT86087B (pt) | 1990-11-20 |
| IL84254A (en) | 1991-08-16 |
| NZ222372A (en) | 1989-10-27 |
| DK590487A (da) | 1988-05-13 |
| AU8096887A (en) | 1988-05-19 |
| PH26210A (en) | 1992-03-18 |
| DK590487D0 (da) | 1987-11-11 |
| NO874696D0 (no) | 1987-11-11 |
| EP0268429A3 (en) | 1988-12-14 |
| KR880006309A (ko) | 1988-07-22 |
| PT86087A (en) | 1987-12-01 |
| BR8706083A (pt) | 1988-06-21 |
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