NO315462B1 - Fremgangsmate for fremstilling av metallurgisk silisium inneholdende fosfor - Google Patents
Fremgangsmate for fremstilling av metallurgisk silisium inneholdende fosfor Download PDFInfo
- Publication number
- NO315462B1 NO315462B1 NO19954777A NO954777A NO315462B1 NO 315462 B1 NO315462 B1 NO 315462B1 NO 19954777 A NO19954777 A NO 19954777A NO 954777 A NO954777 A NO 954777A NO 315462 B1 NO315462 B1 NO 315462B1
- Authority
- NO
- Norway
- Prior art keywords
- silicon
- phosphorus
- ppm
- phase
- metallurgical
- Prior art date
Links
- 229910052710 silicon Inorganic materials 0.000 title claims description 137
- 239000010703 silicon Substances 0.000 title claims description 137
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 131
- 239000011574 phosphorus Substances 0.000 title claims description 81
- 229910052698 phosphorus Inorganic materials 0.000 title claims description 81
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 title claims description 80
- 238000000034 method Methods 0.000 title claims description 22
- 230000008569 process Effects 0.000 title claims description 10
- 239000011575 calcium Substances 0.000 claims description 42
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 41
- 229910052791 calcium Inorganic materials 0.000 claims description 25
- 238000006243 chemical reaction Methods 0.000 claims description 25
- 229910052782 aluminium Inorganic materials 0.000 claims description 24
- 238000004519 manufacturing process Methods 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 21
- 229910052802 copper Inorganic materials 0.000 claims description 21
- 239000010949 copper Substances 0.000 claims description 21
- 239000003054 catalyst Substances 0.000 claims description 20
- 239000012535 impurity Substances 0.000 claims description 18
- 229910052742 iron Inorganic materials 0.000 claims description 18
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 17
- 239000002994 raw material Substances 0.000 claims description 11
- 229910052725 zinc Inorganic materials 0.000 claims description 11
- 239000011701 zinc Substances 0.000 claims description 11
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 10
- 238000007711 solidification Methods 0.000 claims description 10
- 230000008023 solidification Effects 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 8
- 229910052718 tin Inorganic materials 0.000 claims description 8
- 229910052787 antimony Inorganic materials 0.000 claims description 7
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 150000001502 aryl halides Chemical class 0.000 claims description 4
- 239000012071 phase Substances 0.000 description 54
- 238000007670 refining Methods 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- 230000009257 reactivity Effects 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 239000011135 tin Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical class C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 150000003376 silicon Chemical class 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 150000004756 silanes Chemical class 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 239000004411 aluminium Substances 0.000 description 4
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 229910004709 CaSi Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910001018 Cast iron Inorganic materials 0.000 description 2
- 229910000676 Si alloy Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 150000001879 copper Chemical class 0.000 description 2
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 229940050176 methyl chloride Drugs 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000008092 positive effect Effects 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 229910001021 Ferroalloy Inorganic materials 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 235000008429 bread Nutrition 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 238000002089 carbo-reduction Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- WCCJDBZJUYKDBF-UHFFFAOYSA-N copper silicon Chemical compound [Si].[Cu] WCCJDBZJUYKDBF-UHFFFAOYSA-N 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001493 electron microscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009851 ferrous metallurgy Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- 238000009856 non-ferrous metallurgy Methods 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000011272 standard treatment Methods 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 229940078499 tricalcium phosphate Drugs 0.000 description 1
- 229910000391 tricalcium phosphate Inorganic materials 0.000 description 1
- 235000019731 tricalcium phosphate Nutrition 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- -1 zinc halides Chemical class 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/023—Preparation by reduction of silica or free silica-containing material
- C01B33/025—Preparation by reduction of silica or free silica-containing material with carbon or a solid carbonaceous material, i.e. carbo-thermal process
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9308303A FR2707619B1 (fr) | 1993-07-01 | 1993-07-01 | Silicium métallurgique contenant du phosphore et destiné à la préparation des alkyl ou aryl halogénosilanes. |
| PCT/FR1994/000799 WO1995001303A1 (fr) | 1993-07-01 | 1994-06-30 | Silicium metallurgique contenant du phosphore pour la preparation d'organohalogenosilanes |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| NO954777D0 NO954777D0 (no) | 1995-11-24 |
| NO954777L NO954777L (no) | 1995-11-24 |
| NO315462B1 true NO315462B1 (no) | 2003-09-08 |
Family
ID=9448988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO19954777A NO315462B1 (no) | 1993-07-01 | 1995-11-24 | Fremgangsmate for fremstilling av metallurgisk silisium inneholdende fosfor |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US5714131A (de) |
| EP (1) | EP0706496B2 (de) |
| JP (1) | JP3650621B2 (de) |
| AU (1) | AU680273B2 (de) |
| BR (1) | BR9406867A (de) |
| CA (1) | CA2166317C (de) |
| DE (1) | DE69402201T3 (de) |
| ES (1) | ES2100726T5 (de) |
| FR (1) | FR2707619B1 (de) |
| NO (1) | NO315462B1 (de) |
| WO (1) | WO1995001303A1 (de) |
| ZA (1) | ZA944718B (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2746785B1 (fr) * | 1996-04-02 | 1998-05-22 | Pechiney Electrometallurgie | Silicium metallurgique a structure controlee destine a la synthese des halogenosilanes |
| US6057469A (en) * | 1997-07-24 | 2000-05-02 | Pechiney Electrometallurgie | Process for manufacturing active silicon powder for the preparation of alkyl- or aryl-halosilanes |
| US6005130A (en) * | 1998-09-28 | 1999-12-21 | General Electric Company | Method for making alkylhalosilanes |
| US6258970B1 (en) | 1999-04-19 | 2001-07-10 | General Electric Company | Method for promoting dialkyldihalosilane formation during direct method alkylhalosilane production |
| US6423860B1 (en) | 2000-09-05 | 2002-07-23 | General Electric Company | Method for promoting dialkyldihalosilane formation during direct method alkylhalosilane production |
| US6407276B1 (en) * | 2001-03-29 | 2002-06-18 | General Electric Company | Method for improving selectivity for dialkyldichlorosilane |
| US7652164B2 (en) * | 2005-09-13 | 2010-01-26 | Momentive Performance Materials Inc. | Process for the direct synthesis of trialkoxysilane |
| US7429672B2 (en) | 2006-06-09 | 2008-09-30 | Momentive Performance Materials Inc. | Process for the direct synthesis of trialkoxysilane |
| WO2014113124A1 (en) * | 2013-01-21 | 2014-07-24 | Dow Corning Corporation | Process for selective production of halosilanes from silicon-containing ternary intermetallic compounds |
| JP6662882B2 (ja) * | 2014-12-18 | 2020-03-11 | ダウ シリコーンズ コーポレーション | ケイ素含有三元金属間化合物からハロシランを生成する方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR957542A (de) * | 1941-04-04 | 1950-02-23 | ||
| DE921566C (de) * | 1949-05-05 | 1954-12-20 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Alkyl- bzw. Arylhalogensilanen |
| DE1076131B (de) * | 1954-09-25 | 1960-02-25 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Organohalogensilanen |
| DE1165026B (de) * | 1959-09-14 | 1964-03-12 | Goldschmidt Ag Th | Verfahren zur Herstellung von Methylchlorsilanen |
| DE2933164A1 (de) * | 1979-08-16 | 1981-02-26 | Consortium Elektrochem Ind | Verfahren zum reinigen von rohsilicium |
| US4500724A (en) * | 1983-07-28 | 1985-02-19 | General Electric Company | Method for making alkylhalosilanes |
| DE3331046A1 (de) * | 1983-08-29 | 1985-03-14 | Wacker-Chemie GmbH, 8000 München | Verfahren zum behandeln von silicium und ferrosilicium mit schlacke |
| FR2556333A1 (fr) * | 1983-12-09 | 1985-06-14 | Hanna Mining Co | Procede pour purifier du silicium pour des applications necessitant une grande purete |
| US4602101A (en) * | 1985-11-12 | 1986-07-22 | Dow Corning Corporation | Method of manufacturing alkylhalosilanes |
| US4898960A (en) * | 1986-12-22 | 1990-02-06 | Dow Corning Corporation | Method of direct process performance improvement via control of silicon manufacture |
| US4946978A (en) * | 1986-12-22 | 1990-08-07 | Dow Corning Corporation | Method of direct process performance improvement via control of silicon manufacture |
| NO165288C (no) * | 1988-12-08 | 1991-01-23 | Elkem As | Silisiumpulver og fremgangsmaate for fremstilling av silisiumpulver. |
| DE4303766A1 (de) * | 1993-02-09 | 1994-08-11 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Methylchlorsilanen |
| FR2716675B1 (fr) * | 1994-02-25 | 1996-04-12 | Pechiney Electrometallurgie | Silicium métallurgique à microstructure contrôlée pour la préparation des halogénosilanes. |
-
1993
- 1993-07-01 FR FR9308303A patent/FR2707619B1/fr not_active Expired - Fee Related
-
1994
- 1994-06-30 ES ES94921001T patent/ES2100726T5/es not_active Expired - Lifetime
- 1994-06-30 CA CA002166317A patent/CA2166317C/fr not_active Expired - Lifetime
- 1994-06-30 BR BR9406867A patent/BR9406867A/pt not_active IP Right Cessation
- 1994-06-30 AU AU71887/94A patent/AU680273B2/en not_active Expired
- 1994-06-30 ZA ZA944718A patent/ZA944718B/xx unknown
- 1994-06-30 WO PCT/FR1994/000799 patent/WO1995001303A1/fr active IP Right Grant
- 1994-06-30 JP JP50332095A patent/JP3650621B2/ja not_active Expired - Lifetime
- 1994-06-30 US US08/553,548 patent/US5714131A/en not_active Expired - Lifetime
- 1994-06-30 EP EP94921001A patent/EP0706496B2/de not_active Expired - Lifetime
- 1994-06-30 DE DE69402201T patent/DE69402201T3/de not_active Expired - Lifetime
-
1995
- 1995-11-24 NO NO19954777A patent/NO315462B1/no not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| ES2100726T5 (es) | 2006-09-01 |
| WO1995001303A1 (fr) | 1995-01-12 |
| CA2166317A1 (fr) | 1995-01-12 |
| US5714131A (en) | 1998-02-03 |
| ES2100726T3 (es) | 1997-06-16 |
| BR9406867A (pt) | 1996-03-26 |
| FR2707619A1 (fr) | 1995-01-20 |
| AU680273B2 (en) | 1997-07-24 |
| NO954777D0 (no) | 1995-11-24 |
| AU7188794A (en) | 1995-01-24 |
| DE69402201D1 (de) | 1997-04-24 |
| EP0706496B2 (de) | 2006-03-08 |
| DE69402201T2 (de) | 1997-07-31 |
| NO954777L (no) | 1995-11-24 |
| EP0706496B1 (de) | 1997-03-19 |
| JPH08512017A (ja) | 1996-12-17 |
| ZA944718B (en) | 1996-04-04 |
| FR2707619B1 (fr) | 1995-09-01 |
| JP3650621B2 (ja) | 2005-05-25 |
| DE69402201T3 (de) | 2006-09-14 |
| CA2166317C (fr) | 2004-08-24 |
| EP0706496A1 (de) | 1996-04-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0692421B2 (ja) | アルキルハロシラン類の製造方法 | |
| EP1680357B1 (de) | Verfahren zur herstellung von trichlorsilan | |
| NO315462B1 (no) | Fremgangsmate for fremstilling av metallurgisk silisium inneholdende fosfor | |
| EP0273635B2 (de) | Verfahren zur Herstellung von Alkylhalosilanen | |
| US6528674B1 (en) | Method for preparing a contact mass | |
| US5596119A (en) | Method for controlling the direct process product distribution | |
| CA1310466C (en) | Method of direct process performance improvement via control of silicon manufacture | |
| JP4570731B2 (ja) | アルキルハロシランの製造方法 | |
| JPH03148287A (ja) | ジメチルジクロロシランとメチルジクロロシランの調製方法 | |
| US5500399A (en) | Silicon alloy containing aluminum, calcium and copper for the synthesis of alkyl or aryl halogenosilanes | |
| EP0937731B1 (de) | Verfahren zur Herstellung von Alkylhalogensilanen | |
| JP6239753B2 (ja) | トリクロロシランの製造 | |
| JP3760984B2 (ja) | オルガノハロシラン合成用助触媒及びオルガノハロシランの製造方法 | |
| US5160720A (en) | Metal catalyzed production of tetrachlorosilane | |
| US5176892A (en) | Supported metal catalyzed production of tetrachlorosilane | |
| US6391255B1 (en) | Metallurgical-grade silicon with a controlled structure for use in halosilane synthesis | |
| JP4326152B2 (ja) | アルキルハロゲノシラン類の製造方法 | |
| AU703621B2 (en) | Method of producing alkyl halogen silanes | |
| US3110721A (en) | Preparation of organo-halogenosilanes | |
| EP1148338A2 (de) | Verfahren zum Nachweis von Kupfer in Eta-Phase |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| CB | Opposition filed (par. 26,5 patents act) |
Effective date: 20040526 |
|
| MK1K | Patent expired |