NO20083560L - Stabiliserte, ikke-vandige rensesammensetninger for mikroelektronikksubstrater - Google Patents

Stabiliserte, ikke-vandige rensesammensetninger for mikroelektronikksubstrater

Info

Publication number
NO20083560L
NO20083560L NO20083560A NO20083560A NO20083560L NO 20083560 L NO20083560 L NO 20083560L NO 20083560 A NO20083560 A NO 20083560A NO 20083560 A NO20083560 A NO 20083560A NO 20083560 L NO20083560 L NO 20083560L
Authority
NO
Norway
Prior art keywords
stabilized
cleaning compositions
aqueous cleaning
microelectronics substrates
microelectronics
Prior art date
Application number
NO20083560A
Other languages
English (en)
Norwegian (no)
Inventor
Sean M Kane
Original Assignee
Mallinckrodt Baker Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mallinckrodt Baker Inc filed Critical Mallinckrodt Baker Inc
Publication of NO20083560L publication Critical patent/NO20083560L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
    • C11D2111/22—
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
NO20083560A 2006-02-15 2008-08-15 Stabiliserte, ikke-vandige rensesammensetninger for mikroelektronikksubstrater NO20083560L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77346306P 2006-02-15 2006-02-15
PCT/US2007/002911 WO2007097897A1 (en) 2006-02-15 2007-01-31 Stabilized, non-aqueous cleaning compositions for microelectronics substrates

Publications (1)

Publication Number Publication Date
NO20083560L true NO20083560L (no) 2008-09-10

Family

ID=38226411

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20083560A NO20083560L (no) 2006-02-15 2008-08-15 Stabiliserte, ikke-vandige rensesammensetninger for mikroelektronikksubstrater

Country Status (19)

Country Link
US (1) US7799749B2 (zh)
EP (1) EP1994134B1 (zh)
JP (1) JP4902898B2 (zh)
KR (1) KR101301809B1 (zh)
CN (1) CN101384694B (zh)
AT (1) ATE440940T1 (zh)
BR (1) BRPI0707851A2 (zh)
CA (1) CA2642445A1 (zh)
DE (1) DE602007002170D1 (zh)
DK (1) DK1994134T3 (zh)
ES (1) ES2330805T3 (zh)
IL (1) IL193237A (zh)
MY (1) MY144861A (zh)
NO (1) NO20083560L (zh)
PL (1) PL1994134T3 (zh)
PT (1) PT1994134E (zh)
TW (1) TWI417683B (zh)
WO (1) WO2007097897A1 (zh)
ZA (1) ZA200804625B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7129199B2 (en) * 2002-08-12 2006-10-31 Air Products And Chemicals, Inc. Process solutions containing surfactants
KR101359919B1 (ko) * 2007-11-01 2014-02-11 주식회사 동진쎄미켐 포토레지스트 박리 조성물, 이를 사용한 포토레지스트 박리방법 및 표시 장치의 제조 방법
JP5305803B2 (ja) * 2008-09-19 2013-10-02 株式会社カネカ ポリエーテル類の製造方法
JP2017026645A (ja) * 2013-12-03 2017-02-02 Jsr株式会社 レジスト除去剤およびレジスト除去方法
CN104195560A (zh) * 2014-09-10 2014-12-10 昆山欣谷微电子材料有限公司 四甲基氢氧化铵无水剥离液
US20160181087A1 (en) * 2014-12-19 2016-06-23 Intermolecular Inc. Particle removal with minimal etching of silicon-germanium
KR102384908B1 (ko) * 2015-11-25 2022-04-08 삼성전자주식회사 자성 패턴 세정 조성물, 자성 패턴 형성 방법 및 자기 메모리 장치의 제조 방법
KR101966808B1 (ko) * 2016-09-30 2019-04-08 세메스 주식회사 기판 세정 조성물, 기판 처리 방법 및 기판 처리 장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4778728A (en) 1987-10-08 1988-10-18 American Cyanamid Company Curable compositions and corrosion resistant coatings prepared therefrom
US5308745A (en) * 1992-11-06 1994-05-03 J. T. Baker Inc. Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins
CN100370360C (zh) * 1998-05-18 2008-02-20 马林克罗特有限公司 用于清洗微电子衬底的含硅酸盐碱性组合物
US6531436B1 (en) * 2000-02-25 2003-03-11 Shipley Company, L.L.C. Polymer removal
US6599370B2 (en) * 2000-10-16 2003-07-29 Mallinckrodt Inc. Stabilized alkaline compositions for cleaning microelectronic substrates
US6551973B1 (en) 2001-10-09 2003-04-22 General Chemical Corporation Stable metal-safe stripper for removing cured negative-tone novolak and acrylic photoresists and post-etch residue
WO2005043245A2 (en) * 2003-10-29 2005-05-12 Mallinckrodt Baker Inc. Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors
JP4440689B2 (ja) * 2004-03-31 2010-03-24 東友ファインケム株式会社 レジスト剥離剤組成物
JP2007536566A (ja) * 2004-05-07 2007-12-13 ドウジン セミケム カンパニー リミテッド （フォト）レジスト除去用組成物

Also Published As

Publication number Publication date
ZA200804625B (en) 2009-04-29
PL1994134T3 (pl) 2010-02-26
IL193237A0 (en) 2009-02-11
KR20080094920A (ko) 2008-10-27
KR101301809B1 (ko) 2013-08-29
PT1994134E (pt) 2009-11-05
DK1994134T3 (da) 2009-11-02
CN101384694A (zh) 2009-03-11
EP1994134B1 (en) 2009-08-26
JP4902898B2 (ja) 2012-03-21
MY144861A (en) 2011-11-30
US7799749B2 (en) 2010-09-21
TW200732865A (en) 2007-09-01
CA2642445A1 (en) 2007-08-30
DE602007002170D1 (de) 2009-10-08
TWI417683B (zh) 2013-12-01
WO2007097897A1 (en) 2007-08-30
IL193237A (en) 2012-08-30
BRPI0707851A2 (pt) 2011-05-10
ES2330805T3 (es) 2009-12-15
CN101384694B (zh) 2011-03-16
JP2009527126A (ja) 2009-07-23
US20090005283A1 (en) 2009-01-01
EP1994134A1 (en) 2008-11-26
ATE440940T1 (de) 2009-09-15

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