DK1994134T3 - Stabilierede, ikke-vandige rensningssammensætninger for mikroelektroniske substrater - Google Patents
Stabilierede, ikke-vandige rensningssammensætninger for mikroelektroniske substraterInfo
- Publication number
- DK1994134T3 DK1994134T3 DK07717183T DK07717183T DK1994134T3 DK 1994134 T3 DK1994134 T3 DK 1994134T3 DK 07717183 T DK07717183 T DK 07717183T DK 07717183 T DK07717183 T DK 07717183T DK 1994134 T3 DK1994134 T3 DK 1994134T3
- Authority
- DK
- Denmark
- Prior art keywords
- cleaning compositions
- stabilized
- aqueous cleaning
- microelectronic substrates
- stripping
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 3
- 239000000203 mixture Substances 0.000 title abstract 3
- 238000004377 microelectronic Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000001627 detrimental effect Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 abstract 1
- 125000001741 organic sulfur group Chemical group 0.000 abstract 1
- UBQKCCHYAOITMY-UHFFFAOYSA-N pyridin-2-ol Chemical compound OC1=CC=CC=N1 UBQKCCHYAOITMY-UHFFFAOYSA-N 0.000 abstract 1
- 238000007086 side reaction Methods 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 239000003381 stabilizer Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/06—Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
-
- C11D2111/22—
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US77346306P | 2006-02-15 | 2006-02-15 | |
| PCT/US2007/002911 WO2007097897A1 (en) | 2006-02-15 | 2007-01-31 | Stabilized, non-aqueous cleaning compositions for microelectronics substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK1994134T3 true DK1994134T3 (da) | 2009-11-02 |
Family
ID=38226411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK07717183T DK1994134T3 (da) | 2006-02-15 | 2007-01-31 | Stabilierede, ikke-vandige rensningssammensætninger for mikroelektroniske substrater |
Country Status (19)
| Country | Link |
|---|---|
| US (1) | US7799749B2 (da) |
| EP (1) | EP1994134B1 (da) |
| JP (1) | JP4902898B2 (da) |
| KR (1) | KR101301809B1 (da) |
| CN (1) | CN101384694B (da) |
| AT (1) | ATE440940T1 (da) |
| BR (1) | BRPI0707851A2 (da) |
| CA (1) | CA2642445A1 (da) |
| DE (1) | DE602007002170D1 (da) |
| DK (1) | DK1994134T3 (da) |
| ES (1) | ES2330805T3 (da) |
| IL (1) | IL193237A (da) |
| MY (1) | MY144861A (da) |
| NO (1) | NO20083560L (da) |
| PL (1) | PL1994134T3 (da) |
| PT (1) | PT1994134E (da) |
| TW (1) | TWI417683B (da) |
| WO (1) | WO2007097897A1 (da) |
| ZA (1) | ZA200804625B (da) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7129199B2 (en) * | 2002-08-12 | 2006-10-31 | Air Products And Chemicals, Inc. | Process solutions containing surfactants |
| KR101359919B1 (ko) * | 2007-11-01 | 2014-02-11 | 주식회사 동진쎄미켐 | 포토레지스트 박리 조성물, 이를 사용한 포토레지스트 박리방법 및 표시 장치의 제조 방법 |
| JP5305803B2 (ja) * | 2008-09-19 | 2013-10-02 | 株式会社カネカ | ポリエーテル類の製造方法 |
| JP2017026645A (ja) * | 2013-12-03 | 2017-02-02 | Jsr株式会社 | レジスト除去剤およびレジスト除去方法 |
| CN104195560A (zh) * | 2014-09-10 | 2014-12-10 | 昆山欣谷微电子材料有限公司 | 四甲基氢氧化铵无水剥离液 |
| US20160181087A1 (en) * | 2014-12-19 | 2016-06-23 | Intermolecular Inc. | Particle removal with minimal etching of silicon-germanium |
| KR102384908B1 (ko) * | 2015-11-25 | 2022-04-08 | 삼성전자주식회사 | 자성 패턴 세정 조성물, 자성 패턴 형성 방법 및 자기 메모리 장치의 제조 방법 |
| KR101966808B1 (ko) * | 2016-09-30 | 2019-04-08 | 세메스 주식회사 | 기판 세정 조성물, 기판 처리 방법 및 기판 처리 장치 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4778728A (en) | 1987-10-08 | 1988-10-18 | American Cyanamid Company | Curable compositions and corrosion resistant coatings prepared therefrom |
| US5308745A (en) * | 1992-11-06 | 1994-05-03 | J. T. Baker Inc. | Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins |
| CN100370360C (zh) * | 1998-05-18 | 2008-02-20 | 马林克罗特有限公司 | 用于清洗微电子衬底的含硅酸盐碱性组合物 |
| US6531436B1 (en) * | 2000-02-25 | 2003-03-11 | Shipley Company, L.L.C. | Polymer removal |
| US6599370B2 (en) * | 2000-10-16 | 2003-07-29 | Mallinckrodt Inc. | Stabilized alkaline compositions for cleaning microelectronic substrates |
| US6551973B1 (en) | 2001-10-09 | 2003-04-22 | General Chemical Corporation | Stable metal-safe stripper for removing cured negative-tone novolak and acrylic photoresists and post-etch residue |
| WO2005043245A2 (en) * | 2003-10-29 | 2005-05-12 | Mallinckrodt Baker Inc. | Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
| JP4440689B2 (ja) * | 2004-03-31 | 2010-03-24 | 東友ファインケム株式会社 | レジスト剥離剤組成物 |
| JP2007536566A (ja) * | 2004-05-07 | 2007-12-13 | ドウジン セミケム カンパニー リミテッド | （フォト）レジスト除去用組成物 |
-
2007
- 2007-01-02 TW TW096100064A patent/TWI417683B/zh active
- 2007-01-31 KR KR1020087020083A patent/KR101301809B1/ko active IP Right Grant
- 2007-01-31 DE DE602007002170T patent/DE602007002170D1/de active Active
- 2007-01-31 MY MYPI20083101A patent/MY144861A/en unknown
- 2007-01-31 CN CN2007800056626A patent/CN101384694B/zh not_active Expired - Fee Related
- 2007-01-31 WO PCT/US2007/002911 patent/WO2007097897A1/en active Application Filing
- 2007-01-31 CA CA002642445A patent/CA2642445A1/en not_active Abandoned
- 2007-01-31 EP EP07717183A patent/EP1994134B1/en not_active Not-in-force
- 2007-01-31 AT AT07717183T patent/ATE440940T1/de active
- 2007-01-31 JP JP2008555261A patent/JP4902898B2/ja not_active Expired - Fee Related
- 2007-01-31 BR BRPI0707851-0A patent/BRPI0707851A2/pt not_active IP Right Cessation
- 2007-01-31 ES ES07717183T patent/ES2330805T3/es active Active
- 2007-01-31 US US12/161,886 patent/US7799749B2/en not_active Expired - Fee Related
- 2007-01-31 PL PL07717183T patent/PL1994134T3/pl unknown
- 2007-01-31 PT PT07717183T patent/PT1994134E/pt unknown
- 2007-01-31 DK DK07717183T patent/DK1994134T3/da active
-
2008
- 2008-05-28 ZA ZA200804625A patent/ZA200804625B/xx unknown
- 2008-08-04 IL IL193237A patent/IL193237A/en active IP Right Grant
- 2008-08-15 NO NO20083560A patent/NO20083560L/no not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| ZA200804625B (en) | 2009-04-29 |
| PL1994134T3 (pl) | 2010-02-26 |
| IL193237A0 (en) | 2009-02-11 |
| KR20080094920A (ko) | 2008-10-27 |
| NO20083560L (no) | 2008-09-10 |
| KR101301809B1 (ko) | 2013-08-29 |
| PT1994134E (pt) | 2009-11-05 |
| CN101384694A (zh) | 2009-03-11 |
| EP1994134B1 (en) | 2009-08-26 |
| JP4902898B2 (ja) | 2012-03-21 |
| MY144861A (en) | 2011-11-30 |
| US7799749B2 (en) | 2010-09-21 |
| TW200732865A (en) | 2007-09-01 |
| CA2642445A1 (en) | 2007-08-30 |
| DE602007002170D1 (de) | 2009-10-08 |
| TWI417683B (zh) | 2013-12-01 |
| WO2007097897A1 (en) | 2007-08-30 |
| IL193237A (en) | 2012-08-30 |
| BRPI0707851A2 (pt) | 2011-05-10 |
| ES2330805T3 (es) | 2009-12-15 |
| CN101384694B (zh) | 2011-03-16 |
| JP2009527126A (ja) | 2009-07-23 |
| US20090005283A1 (en) | 2009-01-01 |
| EP1994134A1 (en) | 2008-11-26 |
| ATE440940T1 (de) | 2009-09-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DK1994134T3 (da) | Stabilierede, ikke-vandige rensningssammensætninger for mikroelektroniske substrater | |
| DK2049491T3 (da) | Heteroaryl-sammensætninger anvendelige som inhibitorer af enzymer, der aktiverer E1 | |
| BRPI0803374A2 (pt) | compostos polihidróxi como agentes de extinção de polimerização | |
| MY173184A (en) | Tin hard mask and etch residue removal | |
| WO2008083252A3 (en) | Methods of use for cyclopamine analogs | |
| WO2010094019A3 (en) | Novel alkyl perfluoroalkene ethers and uses thereof | |
| WO2010129500A3 (en) | Nematocidal sulfonamides | |
| WO2009125222A3 (en) | Antimicrobial system | |
| UA94833C2 (en) | Substituted bicyclolactams | |
| DK3461872T3 (da) | Kølemiddeladditivsammensætninger indeholdende perfluorpolyethere patentkrav | |
| WO2009156462A3 (en) | Organic compounds | |
| MX2013004242A (es) | Sulfonamidas nematocidas. | |
| CO6341581A2 (es) | Derivados de heteroarilo como inhibidores de dgat1 | |
| EA200970605A1 (ru) | Ингибиторы mapk/erk-киназ | |
| WO2007016115A3 (en) | 6,13-bis(thienyl)pentacene compounds | |
| WO2010151479A3 (en) | Polyhydroxy-diamines as low odor, low voc multi-functional additives for paints and coatings | |
| DE602006006709D1 (de) | Nichtwässrige flüssige beschichtungszusammensetzungen | |
| DK1787168T3 (da) | Ikke-vandige mikroelektroniske rengøringssammensætninger indeholdende fruktose | |
| ATE524480T1 (de) | Zusammensetzungen mit c4-schluckenden schwanzsilanen | |
| EP2157113A3 (en) | Alkylated aminopropylated ethylenediamines and uses thereof | |
| WO2011008051A3 (ko) | 구리 또는 구리합금용 레지스트 제거용 조성물 | |
| ATE543887T1 (de) | Beschichtungszusammensetzungen | |
| TW200621843A (en) | Solvent composition | |
| MX2018000080A (es) | Composiciones aditivas secuestrantes de sulfuro de hidrogeno y medio que comprende las mismas. | |
| WO2007014273A3 (en) | Sulfonamides as selective estrogen receptor modulators |