NO118985B - - Google Patents
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- Publication number
- NO118985B NO118985B NO168092A NO16809267A NO118985B NO 118985 B NO118985 B NO 118985B NO 168092 A NO168092 A NO 168092A NO 16809267 A NO16809267 A NO 16809267A NO 118985 B NO118985 B NO 118985B
- Authority
- NO
- Norway
- Prior art keywords
- film
- mask
- silicon
- semiconductor body
- anodic treatment
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
- H10P14/662—Laminate layers, e.g. stacks of alternating high-k metal oxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6324—Formation by anodic treatments, e.g. anodic oxidation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/043—Dual dielectric
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/114—Nitrides of silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
Landscapes
- Formation Of Insulating Films (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US54933866A | 1966-05-11 | 1966-05-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO118985B true NO118985B (da) | 1970-03-09 |
Family
ID=24192584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO168092A NO118985B (da) | 1966-05-11 | 1967-05-10 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3438873A (da) |
| BE (1) | BE696330A (da) |
| ES (1) | ES341094A1 (da) |
| GB (1) | GB1188507A (da) |
| IL (1) | IL27728A (da) |
| NL (1) | NL6706537A (da) |
| NO (1) | NO118985B (da) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3979768A (en) * | 1966-03-23 | 1976-09-07 | Hitachi, Ltd. | Semiconductor element having surface coating comprising silicon nitride and silicon oxide films |
| US3645807A (en) * | 1966-12-26 | 1972-02-29 | Hitachi Ltd | Method for manufacturing a semiconductor device |
| US3767463A (en) * | 1967-01-13 | 1973-10-23 | Ibm | Method for controlling semiconductor surface potential |
| USRE28402E (en) * | 1967-01-13 | 1975-04-29 | Method for controlling semiconductor surface potential | |
| US3887407A (en) * | 1967-02-03 | 1975-06-03 | Hitachi Ltd | Method of manufacturing semiconductor device with nitride oxide double layer film |
| DE1614435B2 (de) * | 1967-02-23 | 1979-05-23 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Herstellen von aus Germanium bestehenden, doppeldiffundierten Halbleiteranordnungen |
| US3537921A (en) * | 1967-02-28 | 1970-11-03 | Motorola Inc | Selective hydrofluoric acid etching and subsequent processing |
| US3541676A (en) * | 1967-12-18 | 1970-11-24 | Gen Electric | Method of forming field-effect transistors utilizing doped insulators as activator source |
| US3807038A (en) * | 1969-05-22 | 1974-04-30 | Mitsubishi Electric Corp | Process of producing semiconductor devices |
| US3663279A (en) * | 1969-11-19 | 1972-05-16 | Bell Telephone Labor Inc | Passivated semiconductor devices |
| DE2047998A1 (de) * | 1970-09-30 | 1972-04-06 | Licentia Gmbh | Verfahren zum Herstellen einer Planaranordnung |
| US3924321A (en) * | 1970-11-23 | 1975-12-09 | Harris Corp | Radiation hardened mis devices |
| US3707656A (en) * | 1971-02-19 | 1972-12-26 | Ibm | Transistor comprising layers of silicon dioxide and silicon nitride |
| US4058887A (en) * | 1971-02-19 | 1977-11-22 | Ibm Corporation | Method for forming a transistor comprising layers of silicon dioxide and silicon nitride |
| US3760242A (en) * | 1972-03-06 | 1973-09-18 | Ibm | Coated semiconductor structures and methods of forming protective coverings on such structures |
| FR2466101A1 (fr) * | 1979-09-18 | 1981-03-27 | Thomson Csf | Procede de formation de couches de silicium polycristallin localisees sur des zones recouvertes de silice d'une plaquette de silicium et application a la fabrication d'un transistor mos non plan autoaligne |
| US4596627A (en) * | 1983-02-28 | 1986-06-24 | Hewlett-Packard Company | Etching a layer over a semiconductor |
| US6006763A (en) * | 1995-01-11 | 1999-12-28 | Seiko Epson Corporation | Surface treatment method |
| JPH11510666A (ja) | 1996-05-24 | 1999-09-14 | シーメンス マツシタ コンポーネンツ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング ウント コンパニコマンデイート ゲゼルシヤフト | 電子デバイス、特に表面音波で作動するデバイス―ｓａｗデバイス |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2974075A (en) * | 1957-10-28 | 1961-03-07 | Bell Telephone Labor Inc | Treatment of semiconductive devices |
| US3160539A (en) * | 1958-09-08 | 1964-12-08 | Trw Semiconductors Inc | Surface treatment of silicon |
| US3088888A (en) * | 1959-03-31 | 1963-05-07 | Ibm | Methods of etching a semiconductor device |
-
1966
- 1966-05-11 US US549338A patent/US3438873A/en not_active Expired - Lifetime
-
1967
- 1967-03-30 BE BE696330D patent/BE696330A/xx unknown
- 1967-04-03 IL IL27728A patent/IL27728A/xx unknown
- 1967-04-18 GB GB07721/67A patent/GB1188507A/en not_active Expired
- 1967-05-10 ES ES341094A patent/ES341094A1/es not_active Expired
- 1967-05-10 NL NL6706537A patent/NL6706537A/xx unknown
- 1967-05-10 NO NO168092A patent/NO118985B/no unknown
Also Published As
| Publication number | Publication date |
|---|---|
| BE696330A (da) | 1967-09-01 |
| NL6706537A (da) | 1967-11-13 |
| ES341094A1 (es) | 1968-06-16 |
| GB1188507A (en) | 1970-04-15 |
| US3438873A (en) | 1969-04-15 |
| IL27728A (en) | 1970-09-17 |
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