NO116568B - - Google Patents
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- Publication number
- NO116568B NO116568B NO164352A NO16435266A NO116568B NO 116568 B NO116568 B NO 116568B NO 164352 A NO164352 A NO 164352A NO 16435266 A NO16435266 A NO 16435266A NO 116568 B NO116568 B NO 116568B
- Authority
- NO
- Norway
- Prior art keywords
- gas
- frequency
- winding
- pressure
- windings
- Prior art date
Links
- 239000007789 gas Substances 0.000 claims description 57
- 238000000576 coating method Methods 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 26
- 238000004804 winding Methods 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 22
- 238000000151 deposition Methods 0.000 claims description 13
- 239000000919 ceramic Substances 0.000 claims description 11
- 238000002844 melting Methods 0.000 claims description 9
- 230000008018 melting Effects 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 230000005672 electromagnetic field Effects 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 230000005684 electric field Effects 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 239000012530 fluid Substances 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 claims 1
- 239000011819 refractory material Substances 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 230000008021 deposition Effects 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 229910052758 niobium Inorganic materials 0.000 description 5
- 239000010955 niobium Substances 0.000 description 5
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000000889 atomisation Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000011253 protective coating Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910001093 Zr alloy Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
- C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Closures For Containers (AREA)
- Electrostatic Spraying Apparatus (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NO468968A NO119659B (es) | 1965-12-17 | 1968-11-25 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE21744 | 1965-12-17 | ||
| CH1750265A CH456294A (de) | 1965-12-17 | 1965-12-18 | Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung |
| DE19742459030 DE2459030B2 (de) | 1965-12-17 | 1974-12-13 | Sicherheitsverschluss fuer behaelter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO116568B true NO116568B (es) | 1969-04-14 |
Family
ID=27158372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO164352A NO116568B (es) | 1965-12-17 | 1966-08-18 |
Country Status (17)
| Country | Link |
|---|---|
| US (3) | US3540993A (es) |
| JP (1) | JPS5184381A (es) |
| AR (1) | AR207605A1 (es) |
| BE (2) | BE673939A (es) |
| CH (3) | CH456294A (es) |
| DD (1) | DD122355A5 (es) |
| DE (3) | DE1515296A1 (es) |
| DK (2) | DK129950B (es) |
| ES (1) | ES330812A1 (es) |
| FR (3) | FR1505170A (es) |
| GB (3) | GB1162832A (es) |
| IT (1) | IT1051344B (es) |
| LU (1) | LU51389A1 (es) |
| NL (3) | NL6600953A (es) |
| NO (1) | NO116568B (es) |
| SE (3) | SE320247B (es) |
| SU (1) | SU569277A3 (es) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1765850A1 (de) * | 1967-11-10 | 1971-10-28 | Euratom | Verfahren und Vorrichtung zum Aufbringen von duennen Schichten |
| US3669871A (en) * | 1969-09-10 | 1972-06-13 | Ibm | Sputtering apparatus having a concave source cathode |
| BE766345A (fr) * | 1971-04-27 | 1971-09-16 | Universitaire De L Etat A Mons | Dispositif pour fabriquer des couches minces de substances minerales. |
| US3856654A (en) * | 1971-08-26 | 1974-12-24 | Western Electric Co | Apparatus for feeding and coating masses of workpieces in a controlled atmosphere |
| CH551497A (de) * | 1971-10-06 | 1974-07-15 | Balzers Patent Beteilig Ag | Anordnung zur zerstaeubung von stoffen mittels einer elektrischen niederspannungsentladung. |
| AU507748B2 (en) * | 1976-06-10 | 1980-02-28 | University Of Sydney, The | Reactive sputtering |
| DE2735525A1 (de) * | 1977-08-06 | 1979-02-22 | Leybold Heraeus Gmbh & Co Kg | Katodenanordnung mit target fuer zerstaeubungsanlagen zum aufstaeuben dielektrischer oder amagnetischer schichten auf substrate |
| JPS57174467A (en) * | 1981-04-20 | 1982-10-27 | Inoue Japax Res Inc | Ion working device |
| DE3206421A1 (de) * | 1982-02-23 | 1983-09-01 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von schichten aus hochschmelzenden metallen bzw. metallverbindungen durch abscheidung aus der dampfphase |
| GB2138410B (en) * | 1983-04-22 | 1986-07-16 | Metal Closures Group Plc | Safety closure with click mechanism |
| US4559121A (en) * | 1983-09-12 | 1985-12-17 | Vac-Tec Systems, Inc. | Method and apparatus for evaporation arc stabilization for permeable targets |
| US4559125A (en) * | 1983-09-12 | 1985-12-17 | Vac-Tec Systems, Inc. | Apparatus for evaporation arc stabilization during the initial clean-up of an arc target |
| US4491509A (en) * | 1984-03-09 | 1985-01-01 | At&T Technologies, Inc. | Methods of and apparatus for sputtering material onto a substrate |
| US4489834A (en) * | 1984-07-02 | 1984-12-25 | Thackrey James D | Counting cap for medicine bottles |
| IT1181798B (it) * | 1984-12-13 | 1987-09-30 | Taplast Di Evans Santagiuliana | Tappo per bottiglie con sigillo e apertura di sicurezza realizzato preferibilmente in materia plastica |
| DE3503398A1 (de) * | 1985-02-01 | 1986-08-07 | W.C. Heraeus Gmbh, 6450 Hanau | Sputteranlage zum reaktiven beschichten eines substrates mit hartstoffen |
| US5020681A (en) * | 1990-02-01 | 1991-06-04 | Owens-Illinois Closure Inc. | Child resistant closure |
| EP0528561B1 (en) * | 1991-07-30 | 1996-02-28 | The Wellcome Foundation Limited | Cap for a container |
| CH687111A5 (de) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens. |
| JPH07257425A (ja) * | 1994-03-18 | 1995-10-09 | Honda Motor Co Ltd | 自動車用車体のサブフレーム取付け構造 |
| DE19625577A1 (de) * | 1996-06-27 | 1998-01-02 | Vaw Motor Gmbh | Aluminium-Gußteil und Verfahren zu seiner Herstellung |
| US5917285A (en) * | 1996-07-24 | 1999-06-29 | Georgia Tech Research Corporation | Apparatus and method for reducing operating voltage in gas discharge devices |
| US6217715B1 (en) * | 1997-02-06 | 2001-04-17 | Applied Materials, Inc. | Coating of vacuum chambers to reduce pump down time and base pressure |
| IT1291620B1 (it) * | 1997-04-18 | 1999-01-11 | Phaba Srl | Chiusura antibambino per flaconi in genere ad azionamento facilitato e a sicurezza incrementata |
| US6382444B1 (en) * | 1999-03-17 | 2002-05-07 | Sentinel Packaging Systems, Inc. | Tamper-evident plastic closure system with snap-on band |
| US6551471B1 (en) * | 1999-11-30 | 2003-04-22 | Canon Kabushiki Kaisha | Ionization film-forming method and apparatus |
| FR2814724B1 (fr) * | 2000-10-04 | 2003-04-04 | Airsec Sa | Dispositif de fermeture de securite a l'epreuve d'enfants par vissage d'un conteneur muni d'une embouchure a filet de vis |
| US7141145B2 (en) * | 2003-10-02 | 2006-11-28 | Seagate Technology Llc | Gas injection for uniform composition reactively sputter-deposited thin films |
| US20050145086A1 (en) * | 2004-01-05 | 2005-07-07 | Mohr Monte D. | Combination pencil sharpener bottle cap |
| IT1394229B1 (it) * | 2009-04-16 | 2012-06-01 | Tapi S R L | Tappo a vite per contenitori per liquidi |
| CN109661353B (zh) * | 2016-06-22 | 2020-12-29 | 科莱恩保健品包装简易股份有限公司 | 显窃启封闭件、具有这种封闭件的容器及其用途 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2069835A (en) * | 1935-04-25 | 1937-02-09 | Bell Telephone Labor Inc | Coating apparatus |
| NL46111C (es) * | 1935-10-12 | |||
| NL50072C (es) * | 1935-12-28 | |||
| DE672664C (de) * | 1936-06-17 | 1939-03-08 | Bernhard Berghaus | Verfahren zur Kathodenzerstaeubung mittels zusaetzlich geheizter Kathode |
| US2920002A (en) * | 1952-06-25 | 1960-01-05 | Auwarter Max | Process for the manufacture of thin films |
| US3021271A (en) * | 1959-04-27 | 1962-02-13 | Gen Mills Inc | Growth of solid layers on substrates which are kept under ion bombardment before and during deposition |
| US3250694A (en) * | 1962-10-17 | 1966-05-10 | Ibm | Apparatus for coating articles by cathode sputtering |
| US3305473A (en) * | 1964-08-20 | 1967-02-21 | Cons Vacuum Corp | Triode sputtering apparatus for depositing uniform coatings |
| US3386909A (en) * | 1964-12-08 | 1968-06-04 | Air Force Usa | Apparatus for depositing material on a filament from ionized coating material |
| US3369990A (en) * | 1964-12-31 | 1968-02-20 | Ibm | Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency |
| US3287243A (en) * | 1965-03-29 | 1966-11-22 | Bell Telephone Labor Inc | Deposition of insulating films by cathode sputtering in an rf-supported discharge |
| US3394829A (en) * | 1967-04-10 | 1968-07-30 | Harris M. Peterson | Safety cap |
| US3857505A (en) * | 1973-10-01 | 1974-12-31 | Owens Illinois Inc | Safety closure |
-
0
- NL NL130959D patent/NL130959C/xx active
- FR FR1502647D patent/FR1502647A/fr not_active Expired
-
1965
- 1965-12-17 BE BE673939A patent/BE673939A/xx not_active Expired
- 1965-12-18 CH CH1750265A patent/CH456294A/de unknown
-
1966
- 1966-01-25 NL NL6600953A patent/NL6600953A/xx unknown
- 1966-06-22 LU LU51389A patent/LU51389A1/xx unknown
- 1966-07-20 SE SE9930/66A patent/SE320247B/xx unknown
- 1966-08-01 NL NL666610803A patent/NL149234B/xx not_active IP Right Cessation
- 1966-08-18 NO NO164352A patent/NO116568B/no unknown
- 1966-09-01 GB GB39140/66A patent/GB1162832A/en not_active Expired
- 1966-09-01 ES ES330812A patent/ES330812A1/es not_active Expired
- 1966-09-09 DE DE19661515296 patent/DE1515296A1/de active Pending
- 1966-09-16 US US579917A patent/US3540993A/en not_active Expired - Lifetime
- 1966-11-03 CH CH1587966A patent/CH478255A/fr not_active IP Right Cessation
- 1966-11-16 DE DE1515294A patent/DE1515294C3/de not_active Expired
- 1966-11-30 GB GB53527/66A patent/GB1113579A/en not_active Expired
- 1966-12-12 BE BE691083D patent/BE691083A/xx unknown
- 1966-12-12 DK DK643766AA patent/DK129950B/da unknown
- 1966-12-14 SE SE17139/66A patent/SE324684B/xx unknown
- 1966-12-16 US US602398A patent/US3516919A/en not_active Expired - Lifetime
- 1966-12-19 FR FR87909A patent/FR1505170A/fr not_active Expired
-
1974
- 1974-12-13 DE DE19742459030 patent/DE2459030B2/de active Granted
-
1975
- 1975-01-01 AR AR261531A patent/AR207605A1/es active
- 1975-11-12 CH CH1469375A patent/CH593836A5/xx not_active IP Right Cessation
- 1975-11-28 GB GB48979/75A patent/GB1505170A/en not_active Expired
- 1975-12-02 US US05/637,082 patent/US3972436A/en not_active Expired - Lifetime
- 1975-12-05 IT IT69999/75A patent/IT1051344B/it active
- 1975-12-08 SU SU7502197001A patent/SU569277A3/ru active
- 1975-12-11 SE SE7513992A patent/SE423520B/xx unknown
- 1975-12-12 DD DD190105A patent/DD122355A5/xx unknown
- 1975-12-12 JP JP50147478A patent/JPS5184381A/ja active Pending
- 1975-12-12 FR FR7538102A patent/FR2294100A1/fr active Granted
- 1975-12-12 DK DK565675A patent/DK136767C/da active
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