CH456294A - Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung - Google Patents

Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung

Info

Publication number
CH456294A
CH456294A CH1750265A CH1750265A CH456294A CH 456294 A CH456294 A CH 456294A CH 1750265 A CH1750265 A CH 1750265A CH 1750265 A CH1750265 A CH 1750265A CH 456294 A CH456294 A CH 456294A
Authority
CH
Switzerland
Prior art keywords
arrangement
voltage discharge
electrical low
atomizing
substances
Prior art date
Application number
CH1750265A
Other languages
English (en)
Inventor
Francois Dr Gaydou
Jenne Rudolf
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1502647D priority Critical patent/FR1502647A/fr
Priority to NL130959D priority patent/NL130959C/xx
Priority to BE673939A priority patent/BE673939A/xx
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH1750265A priority patent/CH456294A/de
Priority to NL6600953A priority patent/NL6600953A/xx
Priority to LU51389A priority patent/LU51389A1/xx
Priority to SE9930/66A priority patent/SE320247B/xx
Priority to NL666610803A priority patent/NL149234B/xx
Priority to NO164352A priority patent/NO116568B/no
Priority to GB39140/66A priority patent/GB1162832A/en
Priority to ES330812A priority patent/ES330812A1/es
Priority to DE19661515296 priority patent/DE1515296A1/de
Priority to US579917A priority patent/US3540993A/en
Priority to CH1587966A priority patent/CH478255A/fr
Priority to DE1515294A priority patent/DE1515294C3/de
Priority to GB53527/66A priority patent/GB1113579A/en
Priority to AT1110766A priority patent/AT271132B/de
Priority to DK643766AA priority patent/DK129950B/da
Priority to BE691083D priority patent/BE691083A/xx
Priority to SE17139/66A priority patent/SE324684B/xx
Priority to US602398A priority patent/US3516919A/en
Priority to FR87909A priority patent/FR1505170A/fr
Publication of CH456294A publication Critical patent/CH456294A/de
Priority to NL6815865A priority patent/NL6815865A/xx
Priority to CH1673668A priority patent/CH497544A/fr
Priority to NO468968A priority patent/NO119659B/no
Priority to US842051*A priority patent/US3595773A/en
Priority to CH1501070A priority patent/CH527917A/de
Priority to DE19742459030 priority patent/DE2459030B2/de
Priority to AR261531A priority patent/AR207605A1/es
Priority to CH1469375A priority patent/CH593836A5/xx
Priority to GB48979/75A priority patent/GB1505170A/en
Priority to US05/637,082 priority patent/US3972436A/en
Priority to IT69999/75A priority patent/IT1051344B/it
Priority to SU7502197001A priority patent/SU569277A3/ru
Priority to SE7513992A priority patent/SE423520B/xx
Priority to FR7538102A priority patent/FR2294100A1/fr
Priority to JP50147478A priority patent/JPS5184381A/ja
Priority to DK565675A priority patent/DK136767C/da
Priority to DD190105A priority patent/DD122355A5/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Closures For Containers (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
CH1750265A 1965-12-17 1965-12-18 Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung CH456294A (de)

Priority Applications (39)

Application Number Priority Date Filing Date Title
FR1502647D FR1502647A (de) 1965-12-17
NL130959D NL130959C (de) 1965-12-17
BE673939A BE673939A (de) 1965-12-17 1965-12-17
CH1750265A CH456294A (de) 1965-12-17 1965-12-18 Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung
NL6600953A NL6600953A (de) 1965-12-17 1966-01-25
LU51389A LU51389A1 (de) 1965-12-17 1966-06-22
SE9930/66A SE320247B (de) 1965-12-17 1966-07-20
NL666610803A NL149234B (nl) 1965-12-17 1966-08-01 Werkwijze en inrichting voor het afzetten van dunne lagen geleidend of halfgeleidend materiaal op het oppervlak van een lichaam.
NO164352A NO116568B (de) 1965-12-17 1966-08-18
GB39140/66A GB1162832A (en) 1965-12-17 1966-09-01 A Process and Device for Coating Surfaces
ES330812A ES330812A1 (es) 1965-12-17 1966-09-01 Un procedimiento, con el dispositivo correspondiente, que permite el deposito de capas delgadas de material conductor o semi-conductor sobre la superficie de cuerpos cualesquie- ra.
DE19661515296 DE1515296A1 (de) 1965-12-17 1966-09-09 Verfahren und Vorrichtung zum Aufbringen von duennen Schichten
US579917A US3540993A (en) 1965-12-17 1966-09-16 Sputtering apparatus
CH1587966A CH478255A (fr) 1965-12-17 1966-11-03 Procédé et dispositif pour le dépôt de couches minces de matériau conducteur ou semi-conducteur
DE1515294A DE1515294C3 (de) 1965-12-17 1966-11-16 Trioden-Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung
GB53527/66A GB1113579A (en) 1965-12-17 1966-11-30 Improvements in and relating to the sputtering of substances by means of electric arc discharges
AT1110766A AT271132B (de) 1965-12-18 1966-12-01 Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung
DK643766AA DK129950B (da) 1965-12-17 1966-12-12 Fremgangsmåde og apparat til vakuumovertrækning af genstande af f.eks. metal, keramik, plastmateriale ved forstøvning med tynde lag af ledende eller halvledende materiale.
BE691083D BE691083A (de) 1965-12-17 1966-12-12
SE17139/66A SE324684B (de) 1965-12-17 1966-12-14
US602398A US3516919A (en) 1965-12-17 1966-12-16 Apparatus for the sputtering of materials
FR87909A FR1505170A (fr) 1965-12-17 1966-12-19 Installation pour pulvérisation de matières par une décharge électrique à basse tension
NL6815865A NL6815865A (de) 1965-12-17 1968-11-07
CH1673668A CH497544A (fr) 1965-12-17 1968-11-08 Procédé et dispositif pour le recouvrement de surface
NO468968A NO119659B (de) 1965-12-17 1968-11-25
US842051*A US3595773A (en) 1965-12-17 1969-05-08 Process for depositing on surfaces
CH1501070A CH527917A (de) 1965-12-17 1970-10-07 Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung
DE19742459030 DE2459030B2 (de) 1965-12-17 1974-12-13 Sicherheitsverschluss fuer behaelter
AR261531A AR207605A1 (es) 1965-12-17 1975-01-01 Cierre de seguridad para recipientes
CH1469375A CH593836A5 (de) 1965-12-17 1975-11-12
GB48979/75A GB1505170A (en) 1965-12-17 1975-11-28 Safety closures for containers
US05/637,082 US3972436A (en) 1965-12-17 1975-12-02 Safety closure cap
IT69999/75A IT1051344B (it) 1965-12-17 1975-12-05 Chiusura di sicurezza per conteni tori
SU7502197001A SU569277A3 (ru) 1965-12-17 1975-12-08 Затвор дл сосудов, имеющих резьбу на горлышке
SE7513992A SE423520B (sv) 1965-12-17 1975-12-11 Sekerhetstillslutning for behallare
FR7538102A FR2294100A1 (fr) 1965-12-17 1975-12-12 Fermeture de securite pour recipient
JP50147478A JPS5184381A (de) 1965-12-17 1975-12-12
DK565675A DK136767C (da) 1965-12-17 1975-12-12 Sikkerhedslukke for beholdere,isaer for kemikalie og medicinflasker
DD190105A DD122355A5 (de) 1965-12-17 1975-12-12

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
BE21744 1965-12-17
CH1750265A CH456294A (de) 1965-12-17 1965-12-18 Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung
DE19742459030 DE2459030B2 (de) 1965-12-17 1974-12-13 Sicherheitsverschluss fuer behaelter

Publications (1)

Publication Number Publication Date
CH456294A true CH456294A (de) 1968-05-15

Family

ID=27158372

Family Applications (3)

Application Number Title Priority Date Filing Date
CH1750265A CH456294A (de) 1965-12-17 1965-12-18 Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung
CH1587966A CH478255A (fr) 1965-12-17 1966-11-03 Procédé et dispositif pour le dépôt de couches minces de matériau conducteur ou semi-conducteur
CH1469375A CH593836A5 (de) 1965-12-17 1975-11-12

Family Applications After (2)

Application Number Title Priority Date Filing Date
CH1587966A CH478255A (fr) 1965-12-17 1966-11-03 Procédé et dispositif pour le dépôt de couches minces de matériau conducteur ou semi-conducteur
CH1469375A CH593836A5 (de) 1965-12-17 1975-11-12

Country Status (17)

Country Link
US (3) US3540993A (de)
JP (1) JPS5184381A (de)
AR (1) AR207605A1 (de)
BE (2) BE673939A (de)
CH (3) CH456294A (de)
DD (1) DD122355A5 (de)
DE (3) DE1515296A1 (de)
DK (2) DK129950B (de)
ES (1) ES330812A1 (de)
FR (3) FR1505170A (de)
GB (3) GB1162832A (de)
IT (1) IT1051344B (de)
LU (1) LU51389A1 (de)
NL (3) NL6600953A (de)
NO (1) NO116568B (de)
SE (3) SE320247B (de)
SU (1) SU569277A3 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4310941B4 (de) * 1992-05-26 2005-12-01 Unaxis Balzers Ag Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfür sowie Verwendung des Verfahrens

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1765850A1 (de) * 1967-11-10 1971-10-28 Euratom Verfahren und Vorrichtung zum Aufbringen von duennen Schichten
US3669871A (en) * 1969-09-10 1972-06-13 Ibm Sputtering apparatus having a concave source cathode
BE766345A (fr) * 1971-04-27 1971-09-16 Universitaire De L Etat A Mons Dispositif pour fabriquer des couches minces de substances minerales.
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere
CH551497A (de) * 1971-10-06 1974-07-15 Balzers Patent Beteilig Ag Anordnung zur zerstaeubung von stoffen mittels einer elektrischen niederspannungsentladung.
AU507748B2 (en) * 1976-06-10 1980-02-28 University Of Sydney, The Reactive sputtering
DE2735525A1 (de) * 1977-08-06 1979-02-22 Leybold Heraeus Gmbh & Co Kg Katodenanordnung mit target fuer zerstaeubungsanlagen zum aufstaeuben dielektrischer oder amagnetischer schichten auf substrate
JPS57174467A (en) * 1981-04-20 1982-10-27 Inoue Japax Res Inc Ion working device
DE3206421A1 (de) * 1982-02-23 1983-09-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von schichten aus hochschmelzenden metallen bzw. metallverbindungen durch abscheidung aus der dampfphase
GB2138410B (en) * 1983-04-22 1986-07-16 Metal Closures Group Plc Safety closure with click mechanism
US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
US4559125A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Apparatus for evaporation arc stabilization during the initial clean-up of an arc target
US4491509A (en) * 1984-03-09 1985-01-01 At&T Technologies, Inc. Methods of and apparatus for sputtering material onto a substrate
US4489834A (en) * 1984-07-02 1984-12-25 Thackrey James D Counting cap for medicine bottles
IT1181798B (it) * 1984-12-13 1987-09-30 Taplast Di Evans Santagiuliana Tappo per bottiglie con sigillo e apertura di sicurezza realizzato preferibilmente in materia plastica
DE3503398A1 (de) * 1985-02-01 1986-08-07 W.C. Heraeus Gmbh, 6450 Hanau Sputteranlage zum reaktiven beschichten eines substrates mit hartstoffen
US5020681A (en) * 1990-02-01 1991-06-04 Owens-Illinois Closure Inc. Child resistant closure
AU662349B2 (en) * 1991-07-30 1995-08-31 Warner-Lambert Company Tamper-evident cap for a container
JPH07257425A (ja) * 1994-03-18 1995-10-09 Honda Motor Co Ltd 自動車用車体のサブフレーム取付け構造
DE19625577A1 (de) * 1996-06-27 1998-01-02 Vaw Motor Gmbh Aluminium-Gußteil und Verfahren zu seiner Herstellung
US5917285A (en) * 1996-07-24 1999-06-29 Georgia Tech Research Corporation Apparatus and method for reducing operating voltage in gas discharge devices
US6217715B1 (en) * 1997-02-06 2001-04-17 Applied Materials, Inc. Coating of vacuum chambers to reduce pump down time and base pressure
IT1291620B1 (it) * 1997-04-18 1999-01-11 Phaba Srl Chiusura antibambino per flaconi in genere ad azionamento facilitato e a sicurezza incrementata
US6382444B1 (en) * 1999-03-17 2002-05-07 Sentinel Packaging Systems, Inc. Tamper-evident plastic closure system with snap-on band
US6551471B1 (en) 1999-11-30 2003-04-22 Canon Kabushiki Kaisha Ionization film-forming method and apparatus
FR2814724B1 (fr) * 2000-10-04 2003-04-04 Airsec Sa Dispositif de fermeture de securite a l'epreuve d'enfants par vissage d'un conteneur muni d'une embouchure a filet de vis
US7141145B2 (en) * 2003-10-02 2006-11-28 Seagate Technology Llc Gas injection for uniform composition reactively sputter-deposited thin films
US20050145086A1 (en) * 2004-01-05 2005-07-07 Mohr Monte D. Combination pencil sharpener bottle cap
IT1394229B1 (it) * 2009-04-16 2012-06-01 Tapi S R L Tappo a vite per contenitori per liquidi
PT3260390T (pt) * 2016-06-22 2020-03-06 Clariant Healthcare Packaging France Sas Tampa externa para encerramento resistente a crianças, encerramento resistente a crianças, recipiente com tal encerramento e sua utilização

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US2069835A (en) * 1935-04-25 1937-02-09 Bell Telephone Labor Inc Coating apparatus
BE417869A (de) * 1935-10-12
NL50072C (de) * 1935-12-28
DE672664C (de) * 1936-06-17 1939-03-08 Bernhard Berghaus Verfahren zur Kathodenzerstaeubung mittels zusaetzlich geheizter Kathode
US2920002A (en) * 1952-06-25 1960-01-05 Auwarter Max Process for the manufacture of thin films
US3021271A (en) * 1959-04-27 1962-02-13 Gen Mills Inc Growth of solid layers on substrates which are kept under ion bombardment before and during deposition
US3250694A (en) * 1962-10-17 1966-05-10 Ibm Apparatus for coating articles by cathode sputtering
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3386909A (en) * 1964-12-08 1968-06-04 Air Force Usa Apparatus for depositing material on a filament from ionized coating material
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3287243A (en) * 1965-03-29 1966-11-22 Bell Telephone Labor Inc Deposition of insulating films by cathode sputtering in an rf-supported discharge
US3394829A (en) * 1967-04-10 1968-07-30 Harris M. Peterson Safety cap
US3857505A (en) * 1973-10-01 1974-12-31 Owens Illinois Inc Safety closure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4310941B4 (de) * 1992-05-26 2005-12-01 Unaxis Balzers Ag Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfür sowie Verwendung des Verfahrens
DE4345602B4 (de) * 1992-05-26 2010-11-25 Oc Oerlikon Balzers Ag Verfahren zum Zünden und Betreiben einer Niederspannungs-Bogenentladung, Vakuumbehandlungsanlage und Kathodenkammer hierfür sowie Verwendung des Verfahrens

Also Published As

Publication number Publication date
GB1505170A (en) 1978-03-30
ES330812A1 (es) 1969-08-16
DE1515296A1 (de) 1969-08-14
US3516919A (en) 1970-06-23
SE324684B (de) 1970-06-08
SE320247B (de) 1970-02-02
NL6610803A (de) 1967-06-19
SE423520B (sv) 1982-05-10
DE1515294B2 (de) 1972-06-08
FR1505170A (fr) 1967-12-08
GB1113579A (en) 1968-05-15
DE1515294C3 (de) 1973-01-04
FR2294100B1 (de) 1982-03-19
NO116568B (de) 1969-04-14
NL130959C (de)
DK136767B (da) 1977-11-21
DE2459030B2 (de) 1976-11-11
DE1515294A1 (de) 1969-08-14
US3540993A (en) 1970-11-17
DK129950C (de) 1975-05-20
NL6600953A (de) 1967-06-19
CH478255A (fr) 1969-09-15
LU51389A1 (de) 1966-08-22
CH593836A5 (de) 1977-12-15
BE691083A (de) 1967-05-16
NL149234B (nl) 1976-04-15
GB1162832A (en) 1969-08-27
US3972436A (en) 1976-08-03
DK129950B (da) 1974-12-02
DK565675A (da) 1976-06-14
DD122355A5 (de) 1976-10-05
SU569277A3 (ru) 1977-08-15
SE7513992L (sv) 1976-06-14
FR1502647A (de) 1968-02-07
JPS5184381A (de) 1976-07-23
DE2459030A1 (de) 1976-06-24
FR2294100A1 (fr) 1976-07-09
DK136767C (da) 1978-05-08
IT1051344B (it) 1981-04-21
AR207605A1 (es) 1976-10-15
BE673939A (de) 1966-06-17

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