NL9100215A - Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat. - Google Patents

Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat. Download PDF

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Publication number
NL9100215A
NL9100215A NL9100215A NL9100215A NL9100215A NL 9100215 A NL9100215 A NL 9100215A NL 9100215 A NL9100215 A NL 9100215A NL 9100215 A NL9100215 A NL 9100215A NL 9100215 A NL9100215 A NL 9100215A
Authority
NL
Netherlands
Prior art keywords
substrate
interferometer
measuring
axis
mirror
Prior art date
Application number
NL9100215A
Other languages
English (en)
Dutch (nl)
Original Assignee
Asm Lithography Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19858843&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NL9100215(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asm Lithography Bv filed Critical Asm Lithography Bv
Priority to NL9100215A priority Critical patent/NL9100215A/nl
Priority to DE69221340T priority patent/DE69221340T2/de
Priority to EP92200258A priority patent/EP0498499B1/fr
Priority to KR1019920001591A priority patent/KR100262992B1/ko
Priority to JP2279092A priority patent/JP3034115B2/ja
Publication of NL9100215A publication Critical patent/NL9100215A/nl
Priority to US08/437,490 priority patent/US5801832A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
NL9100215A 1991-02-07 1991-02-07 Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat. NL9100215A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL9100215A NL9100215A (nl) 1991-02-07 1991-02-07 Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
DE69221340T DE69221340T2 (de) 1991-02-07 1992-01-30 Verfahren und Vorrichtung zur wiederholten Abbildung eines Maskermusters auf einem Substrat
EP92200258A EP0498499B1 (fr) 1991-02-07 1992-01-30 Méthode et dispositif pour former de façon répétitive des images d'un motif de masque sur un substrat
KR1019920001591A KR100262992B1 (ko) 1991-02-07 1992-02-01 마스크 패턴을 반복적으로 영상화하는 방법 및 그 장치
JP2279092A JP3034115B2 (ja) 1991-02-07 1992-02-07 結像方法及び装置並びに物体を正確に変位及び位置決めする装置
US08/437,490 US5801832A (en) 1991-02-07 1995-05-09 Method of and device for repetitively imaging a mask pattern on a substrate using five measuring axes

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL9100215A NL9100215A (nl) 1991-02-07 1991-02-07 Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
NL9100215 1991-02-07

Publications (1)

Publication Number Publication Date
NL9100215A true NL9100215A (nl) 1992-09-01

Family

ID=19858843

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9100215A NL9100215A (nl) 1991-02-07 1991-02-07 Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.

Country Status (6)

Country Link
US (1) US5801832A (fr)
EP (1) EP0498499B1 (fr)
JP (1) JP3034115B2 (fr)
KR (1) KR100262992B1 (fr)
DE (1) DE69221340T2 (fr)
NL (1) NL9100215A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502583A1 (fr) 1991-03-07 1992-09-09 Koninklijke Philips Electronics N.V. Appareil de formation d'images muni d'un dispositif pour détecter une erreur de focalisation et/ou une inclinaison

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* Cited by examiner, † Cited by third party
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KR920016864A (ko) 1992-09-25
JP3034115B2 (ja) 2000-04-17
EP0498499A1 (fr) 1992-08-12
DE69221340D1 (de) 1997-09-11
DE69221340T2 (de) 1998-02-12
KR100262992B1 (ko) 2000-08-01
US5801832A (en) 1998-09-01
JPH04316312A (ja) 1992-11-06
EP0498499B1 (fr) 1997-08-06

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