NL8901630A - Vacuuem systeem. - Google Patents

Vacuuem systeem. Download PDF

Info

Publication number
NL8901630A
NL8901630A NL8901630A NL8901630A NL8901630A NL 8901630 A NL8901630 A NL 8901630A NL 8901630 A NL8901630 A NL 8901630A NL 8901630 A NL8901630 A NL 8901630A NL 8901630 A NL8901630 A NL 8901630A
Authority
NL
Netherlands
Prior art keywords
vacuum system
vacuum
gas
porous plate
chamber
Prior art date
Application number
NL8901630A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19854916&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NL8901630(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8901630A priority Critical patent/NL8901630A/nl
Priority to US07/542,454 priority patent/US5013384A/en
Priority to KR1019900009375A priority patent/KR910001367A/ko
Priority to EP90201644A priority patent/EP0405668B1/de
Priority to DE69017284T priority patent/DE69017284T2/de
Priority to JP2164340A priority patent/JPH03116713A/ja
Publication of NL8901630A publication Critical patent/NL8901630A/nl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Measuring Fluid Pressure (AREA)
NL8901630A 1989-06-28 1989-06-28 Vacuuem systeem. NL8901630A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL8901630A NL8901630A (nl) 1989-06-28 1989-06-28 Vacuuem systeem.
US07/542,454 US5013384A (en) 1989-06-28 1990-06-22 Vacuum system
KR1019900009375A KR910001367A (ko) 1989-06-28 1990-06-25 진공계
EP90201644A EP0405668B1 (de) 1989-06-28 1990-06-25 Vakuumsystem
DE69017284T DE69017284T2 (de) 1989-06-28 1990-06-25 Vakuumsystem.
JP2164340A JPH03116713A (ja) 1989-06-28 1990-06-25 真空装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8901630A NL8901630A (nl) 1989-06-28 1989-06-28 Vacuuem systeem.
NL8901630 1989-06-28

Publications (1)

Publication Number Publication Date
NL8901630A true NL8901630A (nl) 1991-01-16

Family

ID=19854916

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8901630A NL8901630A (nl) 1989-06-28 1989-06-28 Vacuuem systeem.

Country Status (6)

Country Link
US (1) US5013384A (de)
EP (1) EP0405668B1 (de)
JP (1) JPH03116713A (de)
KR (1) KR910001367A (de)
DE (1) DE69017284T2 (de)
NL (1) NL8901630A (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2661455B2 (ja) * 1992-03-27 1997-10-08 株式会社日立製作所 真空処理装置
US5308989A (en) * 1992-12-22 1994-05-03 Eaton Corporation Fluid flow control method and apparatus for an ion implanter
US5718029A (en) * 1996-11-06 1998-02-17 Vanguard International Semiconductor Corporation Pre-installation of pumping line for efficient fab expansion
US6105435A (en) 1997-10-24 2000-08-22 Cypress Semiconductor Corp. Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same
KR100379475B1 (ko) * 2000-08-18 2003-04-10 엘지전자 주식회사 탄소나노튜브의 무촉매 성장방법
KR100550342B1 (ko) * 2004-02-24 2006-02-08 삼성전자주식회사 가스 산포 방법, 및 샤워 헤드, 및 샤워 헤드를 구비하는반도체 기판 가공 장치
WO2006023595A2 (en) 2004-08-18 2006-03-02 New Way Machine Components, Inc. Moving vacuum chamber stage with air bearing and differentially pumped grooves
US7927423B1 (en) * 2005-05-25 2011-04-19 Abbott Kenneth A Vapor deposition of anti-stiction layer for micromechanical devices
CN102464278B (zh) * 2010-10-29 2014-09-24 北京北方微电子基地设备工艺研究中心有限责任公司 一种直线驱动装置及应用该装置的半导体处理设备
KR101267150B1 (ko) * 2011-04-11 2013-05-24 (주)엘지하우시스 다단식 진공단열재의 진공도 측정 장치 및 이를 이용한 측정방법
CN103424303B (zh) * 2012-05-22 2015-12-02 中国科学院物理研究所 一种真空精密位移装置
KR102662055B1 (ko) * 2021-12-20 2024-04-29 세메스 주식회사 기판 반송 모듈 및 이를 포함하는 반도체 제조 설비

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4622918A (en) * 1983-01-31 1986-11-18 Integrated Automation Limited Module for high vacuum processing
EP0555891B1 (de) * 1985-10-24 1999-01-20 Texas Instruments Incorporated System und Methode für Vakuum-Behandlung
US4687542A (en) * 1985-10-24 1987-08-18 Texas Instruments Incorporated Vacuum processing system
US4718957A (en) * 1986-07-24 1988-01-12 Sensenbrenner Kenneth C Process of creating an artificial fingernail
US4718975A (en) * 1986-10-06 1988-01-12 Texas Instruments Incorporated Particle shield
FR2621887B1 (fr) * 1987-10-20 1990-03-30 Sgn Soc Gen Tech Nouvelle Confinement dynamique et accostage sans contact

Also Published As

Publication number Publication date
EP0405668B1 (de) 1995-03-01
DE69017284T2 (de) 1995-09-14
EP0405668A1 (de) 1991-01-02
JPH03116713A (ja) 1991-05-17
KR910001367A (ko) 1991-01-30
DE69017284D1 (de) 1995-04-06
US5013384A (en) 1991-05-07

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A1B A search report has been drawn up
BV The patent application has lapsed