DE69017284D1 - Vakuumsystem. - Google Patents

Vakuumsystem.

Info

Publication number
DE69017284D1
DE69017284D1 DE69017284T DE69017284T DE69017284D1 DE 69017284 D1 DE69017284 D1 DE 69017284D1 DE 69017284 T DE69017284 T DE 69017284T DE 69017284 T DE69017284 T DE 69017284T DE 69017284 D1 DE69017284 D1 DE 69017284D1
Authority
DE
Germany
Prior art keywords
vacuum system
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69017284T
Other languages
English (en)
Other versions
DE69017284T2 (de
Inventor
Willem Fredrik Mellink
Peter Johannes Gertrud Janssen
Jan Zwier
Harm Lotterman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19854916&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69017284(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Philips Electronics NV filed Critical Philips Electronics NV
Publication of DE69017284D1 publication Critical patent/DE69017284D1/de
Application granted granted Critical
Publication of DE69017284T2 publication Critical patent/DE69017284T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Measuring Fluid Pressure (AREA)
DE69017284T 1989-06-28 1990-06-25 Vakuumsystem. Expired - Fee Related DE69017284T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8901630A NL8901630A (nl) 1989-06-28 1989-06-28 Vacuuem systeem.

Publications (2)

Publication Number Publication Date
DE69017284D1 true DE69017284D1 (de) 1995-04-06
DE69017284T2 DE69017284T2 (de) 1995-09-14

Family

ID=19854916

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69017284T Expired - Fee Related DE69017284T2 (de) 1989-06-28 1990-06-25 Vakuumsystem.

Country Status (6)

Country Link
US (1) US5013384A (de)
EP (1) EP0405668B1 (de)
JP (1) JPH03116713A (de)
KR (1) KR910001367A (de)
DE (1) DE69017284T2 (de)
NL (1) NL8901630A (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2661455B2 (ja) * 1992-03-27 1997-10-08 株式会社日立製作所 真空処理装置
US5308989A (en) * 1992-12-22 1994-05-03 Eaton Corporation Fluid flow control method and apparatus for an ion implanter
US5718029A (en) * 1996-11-06 1998-02-17 Vanguard International Semiconductor Corporation Pre-installation of pumping line for efficient fab expansion
US6105435A (en) 1997-10-24 2000-08-22 Cypress Semiconductor Corp. Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same
KR100379475B1 (ko) * 2000-08-18 2003-04-10 엘지전자 주식회사 탄소나노튜브의 무촉매 성장방법
KR100550342B1 (ko) * 2004-02-24 2006-02-08 삼성전자주식회사 가스 산포 방법, 및 샤워 헤드, 및 샤워 헤드를 구비하는반도체 기판 가공 장치
JP2008511138A (ja) 2004-08-18 2008-04-10 ニュー ウエイ マシーン コンポーネント インコーポレイティッド 空気軸受と段差ポンプ溝を備えた移動真空チャンバステージ
US7927423B1 (en) * 2005-05-25 2011-04-19 Abbott Kenneth A Vapor deposition of anti-stiction layer for micromechanical devices
CN102464278B (zh) * 2010-10-29 2014-09-24 北京北方微电子基地设备工艺研究中心有限责任公司 一种直线驱动装置及应用该装置的半导体处理设备
KR101267150B1 (ko) 2011-04-11 2013-05-24 (주)엘지하우시스 다단식 진공단열재의 진공도 측정 장치 및 이를 이용한 측정방법
CN103424303B (zh) * 2012-05-22 2015-12-02 中国科学院物理研究所 一种真空精密位移装置
KR102662055B1 (ko) * 2021-12-20 2024-04-29 세메스 주식회사 기판 반송 모듈 및 이를 포함하는 반도체 제조 설비

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4622918A (en) * 1983-01-31 1986-11-18 Integrated Automation Limited Module for high vacuum processing
US4687542A (en) * 1985-10-24 1987-08-18 Texas Instruments Incorporated Vacuum processing system
DE3650057T2 (de) * 1985-10-24 1995-02-16 Texas Instruments Inc System für Vakuumbehandlung.
US4718957A (en) * 1986-07-24 1988-01-12 Sensenbrenner Kenneth C Process of creating an artificial fingernail
US4718975A (en) * 1986-10-06 1988-01-12 Texas Instruments Incorporated Particle shield
FR2621887B1 (fr) * 1987-10-20 1990-03-30 Sgn Soc Gen Tech Nouvelle Confinement dynamique et accostage sans contact

Also Published As

Publication number Publication date
US5013384A (en) 1991-05-07
JPH03116713A (ja) 1991-05-17
EP0405668B1 (de) 1995-03-01
NL8901630A (nl) 1991-01-16
KR910001367A (ko) 1991-01-30
EP0405668A1 (de) 1991-01-02
DE69017284T2 (de) 1995-09-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee