NL8703054A - Geetst glas en werkwijze voor het vervaardigen ervan. - Google Patents

Geetst glas en werkwijze voor het vervaardigen ervan. Download PDF

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Publication number
NL8703054A
NL8703054A NL8703054A NL8703054A NL8703054A NL 8703054 A NL8703054 A NL 8703054A NL 8703054 A NL8703054 A NL 8703054A NL 8703054 A NL8703054 A NL 8703054A NL 8703054 A NL8703054 A NL 8703054A
Authority
NL
Netherlands
Prior art keywords
etched
pattern
glass
layer
less
Prior art date
Application number
NL8703054A
Other languages
English (en)
Dutch (nl)
Original Assignee
Glaverbel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel filed Critical Glaverbel
Publication of NL8703054A publication Critical patent/NL8703054A/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G11B11/10584—Record carriers characterised by the selection of the material or by the structure or form characterised by the form, e.g. comprising mechanical protection elements
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24595—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness and varying density

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
NL8703054A 1986-12-23 1987-12-17 Geetst glas en werkwijze voor het vervaardigen ervan. NL8703054A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
LU86722A LU86722A1 (fr) 1986-12-23 1986-12-23 Feuille en matiere vitreuse portant un dessin grave et procede pour graver un dessin sur un substrat en matiere vitreuse
LU86722 1986-12-23

Publications (1)

Publication Number Publication Date
NL8703054A true NL8703054A (nl) 1988-07-18

Family

ID=19730844

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8703054A NL8703054A (nl) 1986-12-23 1987-12-17 Geetst glas en werkwijze voor het vervaardigen ervan.

Country Status (18)

Country Link
US (1) US4797316A (fr)
JP (1) JPS63170249A (fr)
KR (1) KR880007389A (fr)
CN (1) CN1024182C (fr)
AU (1) AU590187B2 (fr)
BE (1) BE1003081A3 (fr)
CA (1) CA1329507C (fr)
CH (1) CH674201A5 (fr)
DE (1) DE3742374A1 (fr)
DK (1) DK685887A (fr)
ES (1) ES2005764A6 (fr)
FR (1) FR2608589B1 (fr)
GB (1) GB2200595B (fr)
IE (1) IE60072B1 (fr)
IT (1) IT1211588B (fr)
LU (1) LU86722A1 (fr)
NL (1) NL8703054A (fr)
SE (1) SE467477B (fr)

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CA1313792C (fr) * 1986-02-28 1993-02-23 Junji Hirokane Methode de fabrication de photomasques et photomasque fabrique selon cette methode
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JPH0770094B2 (ja) * 1987-12-04 1995-07-31 シャープ株式会社 ディスク状光記録媒体の製造方法および製造用フォトマスク
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US5357991A (en) * 1989-03-27 1994-10-25 Semitool, Inc. Gas phase semiconductor processor with liquid phase mixing
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FR2654864B1 (fr) * 1989-11-21 1995-08-04 Digipress Sa Procede pour la fabrication d'un disque a lecture optique et disques obtenus par ce procede.
US6375741B2 (en) * 1991-03-06 2002-04-23 Timothy J. Reardon Semiconductor processing spray coating apparatus
FR2663439A1 (fr) * 1990-06-15 1991-12-20 Digipress Sa Procede pour le traitement et en particulier la gravure d'un substrat et substrat obtenu par ce procede.
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US5374291A (en) * 1991-12-10 1994-12-20 Director-General Of Agency Of Industrial Science And Technology Method of processing photosensitive glass
DE4141869B4 (de) * 1991-12-18 2005-11-10 Director General Of Agency Of Industrial Science And Technology Verfahren zur Bearbeitung von lichtempfindlichem Glas
US5246540A (en) * 1992-04-01 1993-09-21 Tru Vue, Inc. Apparatus and method for etching glass
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US5417799A (en) * 1993-09-20 1995-05-23 Hughes Aircraft Company Reactive ion etching of gratings and cross gratings structures
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US5954911A (en) * 1995-10-12 1999-09-21 Semitool, Inc. Semiconductor processing using vapor mixtures
US6023318A (en) * 1996-04-15 2000-02-08 Canon Kabushiki Kaisha Electrode plate, process for producing the plate, liquid crystal device including the plate and process for producing the device
DE19713014C2 (de) * 1997-03-27 1999-01-21 Heraeus Quarzglas Bauteil aus Quarzglas für die Verwendung bei der Halbleiterherstellung
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JP3938253B2 (ja) * 1997-12-26 2007-06-27 日本板硝子株式会社 樹脂正立等倍レンズアレイおよびその製造方法
US6687197B1 (en) * 1999-09-20 2004-02-03 Fujitsu Limited High density information recording medium and slider having rare earth metals
JP4380004B2 (ja) * 2000-02-28 2009-12-09 ソニー株式会社 記録媒体の製造方法、および記録媒体製造用原盤の製造方法
WO2001084242A1 (fr) 2000-05-03 2001-11-08 Caliper Technologies Corp. Procede de fabrication d'un substrat a multiples profondeurs
US6872511B2 (en) * 2001-02-16 2005-03-29 Sharp Kabushiki Kaisha Method for forming micropatterns
JP4610770B2 (ja) * 2001-03-30 2011-01-12 キヤノン株式会社 光ディスク原盤の製造方法
US7666579B1 (en) * 2001-09-17 2010-02-23 Serenity Technologies, Inc. Method and apparatus for high density storage of analog data in a durable medium
JP2004051393A (ja) * 2002-07-17 2004-02-19 Nippon Sheet Glass Co Ltd 強化ガラスの製造方法、及びこれに用いるガラス板の強制冷却設備
JP4994576B2 (ja) * 2004-03-23 2012-08-08 コバレントマテリアル株式会社 シリカガラスルツボ
CN1297504C (zh) * 2005-05-10 2007-01-31 李守进 能随视角变换图案的深度刻蚀玻璃的生产方法
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JP4757339B2 (ja) * 2009-09-18 2011-08-24 長瀬産業株式会社 表面に凹凸が形成されたガラス、及び、その製造方法
CN102736294A (zh) * 2011-04-13 2012-10-17 京东方科技集团股份有限公司 一种基板、液晶显示面板及其制造方法
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JP5877705B2 (ja) * 2011-12-27 2016-03-08 旭化成イーマテリアルズ株式会社 微細パターン構造体の製造方法
KR20170011979A (ko) * 2015-07-24 2017-02-02 (주)도 은 패턴을 갖는 투명 유리
CN105712637A (zh) * 2016-04-11 2016-06-29 广东欧珀移动通信有限公司 透明片材、制备方法以及电子设备
KR101749598B1 (ko) * 2016-04-19 2017-06-22 (주)유티아이 노출패턴이 구현된 카메라 윈도우의 제조방법 및 그에 의해 제조된 노출패턴이 구현된 카메라 윈도우
TWI821234B (zh) 2018-01-09 2023-11-11 美商康寧公司 具光改變特徵之塗覆製品及用於製造彼等之方法
CA3118348A1 (fr) * 2018-11-14 2020-05-22 Saint-Gobain Glass France Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier
CA3147927C (fr) 2019-08-14 2023-01-24 Ceramic Data Solutions GmbH Procede de stockage a long terme d'informations et support de stockage associe
AU2020456046B2 (en) 2020-07-03 2024-01-25 Ceramic Data Solutions GmbH Increased storage capacity for a method for long-term storage of information and storage medium therefor
KR20230034237A (ko) 2020-07-03 2023-03-09 세라믹 데이터 솔루션즈 게엠베하 멀티-비트 코딩에 의해 저장 밀도가 증가된 정보 저장 방법 및 정보 저장 매체
US20220009824A1 (en) 2020-07-09 2022-01-13 Corning Incorporated Anti-glare substrate for a display article including a textured region with primary surface features and secondary surface features imparting a surface roughness that increases surface scattering
EP3955248A1 (fr) 2020-08-11 2022-02-16 Christian Pflaum Enregistrement de données sur un matériau céramique
EP4044182A1 (fr) * 2021-02-12 2022-08-17 Ceramic Data Solutions GmbH Support de données ultramince
KR20230144543A (ko) * 2021-02-12 2023-10-16 세라믹 데이터 솔루션즈 게엠베하 초박형 데이터 캐리어 및 판독 방법
WO2022194354A1 (fr) 2021-03-16 2022-09-22 Ceramic Data Solutions GmbH Support de données, système et procédé de lecture faisant appel à des techniques de super-résolution
CN113087404A (zh) * 2021-04-07 2021-07-09 惠州市清洋实业有限公司 一种钢化玻璃大r角深度刻蚀液及其刻蚀方法
CN113087405A (zh) * 2021-04-07 2021-07-09 惠州市清洋实业有限公司 一种钢化玻璃小r角深度刻蚀液及其刻蚀方法
CN114057411A (zh) * 2021-11-05 2022-02-18 北京理工大学 一种降低石英表面粗糙度至亚纳米量级的方法

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Also Published As

Publication number Publication date
JPS63170249A (ja) 1988-07-14
AU8207687A (en) 1988-06-23
ES2005764A6 (es) 1989-03-16
IE873217L (en) 1988-06-23
SE467477B (sv) 1992-07-20
SE8705040L (sv) 1988-06-24
BE1003081A3 (fr) 1991-11-19
AU590187B2 (en) 1989-10-26
CH674201A5 (fr) 1990-05-15
DK685887D0 (da) 1987-12-23
CN1024182C (zh) 1994-04-13
FR2608589B1 (fr) 1992-06-19
SE8705040D0 (sv) 1987-12-17
DE3742374A1 (de) 1988-07-07
FR2608589A1 (fr) 1988-06-24
CA1329507C (fr) 1994-05-17
KR880007389A (ko) 1988-08-27
IT8768055A0 (it) 1987-12-10
US4797316A (en) 1989-01-10
DK685887A (da) 1988-06-24
LU86722A1 (fr) 1988-07-14
CN87108379A (zh) 1988-07-13
GB2200595B (en) 1990-10-24
IT1211588B (it) 1989-11-03
IE60072B1 (en) 1994-06-01
GB2200595A (en) 1988-08-10
GB8729912D0 (en) 1988-02-03

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