NL8401841A - Elektrolyt-samenstelling alsmede werkwijze voor het elektrolytisch neerslaan van koper. - Google Patents

Elektrolyt-samenstelling alsmede werkwijze voor het elektrolytisch neerslaan van koper. Download PDF

Info

Publication number
NL8401841A
NL8401841A NL8401841A NL8401841A NL8401841A NL 8401841 A NL8401841 A NL 8401841A NL 8401841 A NL8401841 A NL 8401841A NL 8401841 A NL8401841 A NL 8401841A NL 8401841 A NL8401841 A NL 8401841A
Authority
NL
Netherlands
Prior art keywords
electrolyte
copper
brightener
present
brighteners
Prior art date
Application number
NL8401841A
Other languages
English (en)
Dutch (nl)
Original Assignee
Omi Int Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omi Int Corp filed Critical Omi Int Corp
Publication of NL8401841A publication Critical patent/NL8401841A/nl
Priority to GB08514625A priority Critical patent/GB2162681B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Chemically Coating (AREA)
NL8401841A 1983-06-10 1984-06-08 Elektrolyt-samenstelling alsmede werkwijze voor het elektrolytisch neerslaan van koper. NL8401841A (nl)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08514625A GB2162681B (en) 1984-06-08 1985-06-10 Devices involving electron emission and methods of forming a layer of material reducing the electron work function

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50121183A 1983-06-10 1983-06-10
US50121183 1983-06-10

Publications (1)

Publication Number Publication Date
NL8401841A true NL8401841A (nl) 1985-01-02

Family

ID=23992559

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8401841A NL8401841A (nl) 1983-06-10 1984-06-08 Elektrolyt-samenstelling alsmede werkwijze voor het elektrolytisch neerslaan van koper.

Country Status (10)

Country Link
JP (1) JPS6013090A (pt)
AU (1) AU554236B2 (pt)
BR (1) BR8402811A (pt)
CA (1) CA1255621A (pt)
DE (1) DE3420999A1 (pt)
ES (1) ES8601336A1 (pt)
FR (1) FR2547318B1 (pt)
GB (1) GB2141140B (pt)
IT (1) IT1177785B (pt)
NL (1) NL8401841A (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4126502C1 (pt) * 1991-08-07 1993-02-11 Schering Ag Berlin Und Bergkamen, 1000 Berlin, De
JPH10330983A (ja) * 1997-05-30 1998-12-15 Fukuda Metal Foil & Powder Co Ltd 電解銅箔及びその製造方法
DE19758121C2 (de) * 1997-12-17 2000-04-06 Atotech Deutschland Gmbh Wäßriges Bad und Verfahren zum elektrolytischen Abscheiden von Kupferschichten
DE10261852B3 (de) 2002-12-20 2004-06-03 Atotech Deutschland Gmbh Gemisch oligomerer Phenaziniumverbindungen und dessen Herstellungsverfahren, saures Bad zur elektrolytischen Abscheidung eines Kupferniederschlages, enthaltend die oligomeren Phenaziniumverbindungen, sowie Verfahren zum elektrolytischen Abscheiden eines Kupferniederschlages mit einem das Gemisch enthaltenden Bad
DE10337669B4 (de) * 2003-08-08 2006-04-27 Atotech Deutschland Gmbh Wässrige, saure Lösung und Verfahren zum galvanischen Abscheiden von Kupferüberzügen sowie Verwendung der Lösung
JP4644447B2 (ja) * 2004-06-25 2011-03-02 株式会社日立製作所 プリント配線板の製造方法
GB0520793D0 (en) * 2005-10-13 2005-11-23 Avecia Inkjet Ltd Phthalocyanine inks and their use in ink-jet printing

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL174178B (nl) * 1952-05-26 Chevron Res Werkwijze voor het winnen van koolwaterstoffen uit een permeabele koolwaterstofhoudende formatie door injectie met stoom.
BE520209A (pt) * 1952-05-26
US2738318A (en) * 1954-12-28 1956-03-13 Udylite Res Corp Electrodeposition of copper from an acid bath
US2882209A (en) * 1957-05-20 1959-04-14 Udylite Res Corp Electrodeposition of copper from an acid bath
NL291575A (pt) * 1962-04-16
US3328273A (en) * 1966-08-15 1967-06-27 Udylite Corp Electro-deposition of copper from acidic baths
US3770598A (en) * 1972-01-21 1973-11-06 Oxy Metal Finishing Corp Electrodeposition of copper from acid baths
AU496780B2 (en) * 1975-03-11 1978-10-26 Oxy Metal Industries Corporation Additives in baths forthe electrodeposition of copper
DE2746938A1 (de) * 1977-10-17 1979-04-19 Schering Ag Saures galvanisches kupferbad
US4272335A (en) * 1980-02-19 1981-06-09 Oxy Metal Industries Corporation Composition and method for electrodeposition of copper
US4336114A (en) * 1981-03-26 1982-06-22 Hooker Chemicals & Plastics Corp. Electrodeposition of bright copper

Also Published As

Publication number Publication date
IT1177785B (it) 1987-08-26
ES533252A0 (es) 1985-10-16
AU2903384A (en) 1984-12-13
DE3420999C2 (pt) 1987-10-15
JPS6013090A (ja) 1985-01-23
CA1255621A (en) 1989-06-13
FR2547318A1 (fr) 1984-12-14
IT8448351A0 (it) 1984-06-08
DE3420999A1 (de) 1984-12-13
AU554236B2 (en) 1986-08-14
JPS6112036B2 (pt) 1986-04-05
GB8414862D0 (en) 1984-07-18
GB2141140B (en) 1986-12-10
ES8601336A1 (es) 1985-10-16
FR2547318B1 (fr) 1990-05-04
BR8402811A (pt) 1985-05-21
GB2141140A (en) 1984-12-12

Similar Documents

Publication Publication Date Title
US4336114A (en) Electrodeposition of bright copper
US4272335A (en) Composition and method for electrodeposition of copper
CA1078323A (en) Acid copper plating baths
CA1050924A (en) Electrodeposition of copper
US20100155257A1 (en) Aqueous, alkaline, cyanide-free bath for the galvanic deposition of zinc alloy coatings
BR112013027921B1 (pt) Banho de galvanização e método eletrodeposição de uma camada de cromo escuro em uma peça de trabalho
US4473448A (en) Electrodeposition of chromium
JPS6141787A (ja) 酸性一銅メッキ浴および方法
GB2062009A (en) Electroplacting Bath and Process
JPS5930797B2 (ja) バナジウム還元剤を用いる3価クロム電解液およびその方法
US4515663A (en) Acid zinc and zinc alloy electroplating solution and process
TWI402381B (zh) 使用離子液體電沈積金屬之方法
JP2006508238A (ja) 酸めっき浴およびサテンニッケル皮膜の電解析出法
NL8401841A (nl) Elektrolyt-samenstelling alsmede werkwijze voor het elektrolytisch neerslaan van koper.
US4207150A (en) Electroplating bath and process
JPH07157890A (ja) 酸性銅めっき浴及びこれを使用するめっき方法
CA1149324A (en) Silver electrodeposition composition and process
CA1134775A (en) Acid zinc electroplating process and composition
CA1255622A (en) Process for electrodepositing copper
US3772167A (en) Electrodeposition of metals
JP4319702B2 (ja) アミンアルカンスルフォン酸及び複素環式の塩基のような抑制剤と共にアルカンジスルフォン酸−アルカンスルフォン酸化合物により活性化されたメッキ浴からのクロムメッキ法
NO784051L (no) Fremgangsmaate til fremstilling av blanke til skinnende, galvaniske zinkutfellinger og sur vandig pletteringsopploesning til utfoerelse av fremgangsmaaten
JP3723864B2 (ja) スルファミン酸亜鉛めっき浴
US20230015534A1 (en) Electroplating composition and method for depositing a chromium coating on a substrate
WO2023213866A1 (en) Method for depositing a zinc-nickel alloy on a substrate, an aqueous zinc-nickel deposition bath, a brightening agent and use thereof

Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BV The patent application has lapsed