NL7906040A - Werkwijze en inrichting voor het regelen van de verdampingssnelheid van oxydeerbare stoffen bij het reactief vacuum opdampen. - Google Patents

Werkwijze en inrichting voor het regelen van de verdampingssnelheid van oxydeerbare stoffen bij het reactief vacuum opdampen. Download PDF

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Publication number
NL7906040A
NL7906040A NL7906040A NL7906040A NL7906040A NL 7906040 A NL7906040 A NL 7906040A NL 7906040 A NL7906040 A NL 7906040A NL 7906040 A NL7906040 A NL 7906040A NL 7906040 A NL7906040 A NL 7906040A
Authority
NL
Netherlands
Prior art keywords
pressure
evaporation
oxygen
vacuum
chamber
Prior art date
Application number
NL7906040A
Other languages
English (en)
Dutch (nl)
Original Assignee
Leybold Heraeus Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Gmbh & Co Kg filed Critical Leybold Heraeus Gmbh & Co Kg
Publication of NL7906040A publication Critical patent/NL7906040A/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
NL7906040A 1978-08-09 1979-08-07 Werkwijze en inrichting voor het regelen van de verdampingssnelheid van oxydeerbare stoffen bij het reactief vacuum opdampen. NL7906040A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2834813A DE2834813C2 (de) 1978-08-09 1978-08-09 Verfahren und Vorrichtung zur Regelung der Verdampfungsrate oxidierbarer Stoffe beim reaktiven Vakuumaufdampfen
DE2834813 1978-08-09

Publications (1)

Publication Number Publication Date
NL7906040A true NL7906040A (nl) 1980-02-12

Family

ID=6046549

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7906040A NL7906040A (nl) 1978-08-09 1979-08-07 Werkwijze en inrichting voor het regelen van de verdampingssnelheid van oxydeerbare stoffen bij het reactief vacuum opdampen.

Country Status (7)

Country Link
US (2) US4287224A (fr)
BE (1) BE878143A (fr)
CH (1) CH641498A5 (fr)
DE (1) DE2834813C2 (fr)
FR (1) FR2433055A1 (fr)
GB (1) GB2028380B (fr)
NL (1) NL7906040A (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
HU180339B (en) * 1980-03-28 1983-02-28 Egyesuelt Izzolampa Spectacle lens coated by interference filter layer for industrial flame adjusting purposes
US4382421A (en) * 1980-04-11 1983-05-10 Vetco, Inc. Tube coating apparatus
JPS58167767A (ja) * 1982-03-26 1983-10-04 Clarion Co Ltd 薄膜形成方法
US4518623A (en) * 1982-11-24 1985-05-21 Riley Thomas J Polymeric film coating method with continuous deposition pressure control
US4495889A (en) * 1982-11-24 1985-01-29 Riley Thomas J Polymeric film coating apparatus
US4526802A (en) * 1983-03-31 1985-07-02 Clarion Co., Ltd. Film deposition equipment
US4517220A (en) * 1983-08-15 1985-05-14 Motorola, Inc. Deposition and diffusion source control means and method
EP0158479B1 (fr) * 1984-03-26 1989-04-26 Kuraray Co., Ltd. Procédé pour la fabrication d'un support d'enregistrement optique par un sous-oxyde de chalcogénure
US4609562A (en) * 1984-12-20 1986-09-02 Westinghouse Electric Corp. Apparatus and method for depositing coating onto porous substrate
DE3523286A1 (de) * 1985-06-28 1987-01-08 Kaltenbach & Voigt Stabfoermiger lichtleiter fuer medizinische zwecke
US4719120A (en) * 1986-09-29 1988-01-12 The United States Of America As Represented By The Secretary Of The Navy Detection of oxygen in thin films
US5601652A (en) * 1989-08-03 1997-02-11 United Technologies Corporation Apparatus for applying ceramic coatings
US5087477A (en) * 1990-02-05 1992-02-11 United Technologies Corporation Eb-pvd method for applying ceramic coatings
CH686253A5 (de) * 1992-08-28 1996-02-15 Balzers Hochvakuum Verfahren zur Regelung des Reaktionsgrades sowie Beschichtungsanlage.
US5405108A (en) * 1992-09-03 1995-04-11 The United States Of America As Represented By The Secretary Of The Air Force Space debris clearing device
DE4427581A1 (de) * 1994-08-04 1996-02-08 Leybold Ag Verfahren zum Aufbringen einer transparenten Metalloxidschicht auf eine Folie
US6428848B1 (en) * 1998-08-06 2002-08-06 Toray Industries, Inc. Method for producing a metal evaporated article
EP1580822A1 (fr) * 2004-03-24 2005-09-28 Samsung SDI Co., Ltd. Transistor à effet de champ et methode de sa production
DE102004018435A1 (de) * 2004-04-06 2005-10-27 Carl Zeiss Vorrichtung zum beidseitigen Beschichten von Substraten mit einer hydrophoben Schicht
DE202005008165U1 (de) * 2005-05-20 2005-10-06 Leybold Optics Gmbh Vorrichtung zum beidseitigen Beschichten von Substraten
US20130142942A1 (en) * 2011-11-17 2013-06-06 Abbott Diabetes Care Inc. Methods of Making a Reference Electrode for an Electrochemical Sensor

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1104283B (de) * 1952-06-25 1961-04-06 Alois Vogt Dr Verfahren zum Herstellen von duennen Schichten auf Unterlagen durch Verdampfen von Metallverbindungen
GB1010456A (en) * 1962-10-02 1965-11-17 G V Planer Ltd Means for measuring and/or controlling the evaporation rate in vacuum evaporation processes
US3316386A (en) * 1964-05-20 1967-04-25 Bendix Corp Multiple evaporation rate monitor and control
US3982049A (en) * 1969-06-16 1976-09-21 Rockwell International Corporation Method for producing single crystal films
BE817066R (fr) * 1973-11-29 1974-10-16 Enceinte de reaction pour le depot de matiere semi-concuctrice sur des corps de support chauffes
US3962488A (en) * 1974-08-09 1976-06-08 Ppg Industries, Inc. Electrically conductive coating
JPS5315273A (en) * 1976-07-29 1978-02-10 Toshiba Corp Forming method for transparent thin film of oxide
FR2371009A1 (fr) * 1976-11-15 1978-06-09 Commissariat Energie Atomique Procede de controle du depot de couches par pulverisation reactive et dispositif de mise en oeuvre

Also Published As

Publication number Publication date
US4408563A (en) 1983-10-11
GB2028380B (en) 1982-11-03
DE2834813A1 (de) 1980-03-13
FR2433055B1 (fr) 1983-12-16
DE2834813C2 (de) 1983-01-20
US4287224A (en) 1981-09-01
BE878143A (fr) 1979-12-03
GB2028380A (en) 1980-03-05
CH641498A5 (de) 1984-02-29
FR2433055A1 (fr) 1980-03-07

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Date Code Title Description
A85 Still pending on 85-01-01
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
CNR Transfer of rights (patent application after its laying open for public inspection)

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