NL7706870A - Voor mikrograveren bestemde voor straling ge- voelige film. - Google Patents

Voor mikrograveren bestemde voor straling ge- voelige film.

Info

Publication number
NL7706870A
NL7706870A NL7706870A NL7706870A NL7706870A NL 7706870 A NL7706870 A NL 7706870A NL 7706870 A NL7706870 A NL 7706870A NL 7706870 A NL7706870 A NL 7706870A NL 7706870 A NL7706870 A NL 7706870A
Authority
NL
Netherlands
Prior art keywords
microgramming
radiation
film sensitive
sensitive
film
Prior art date
Application number
NL7706870A
Other languages
English (en)
Other versions
NL165851C (nl
NL165851B (nl
Original Assignee
Commissariat A L En Atgmique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat A L En Atgmique filed Critical Commissariat A L En Atgmique
Publication of NL7706870A publication Critical patent/NL7706870A/nl
Publication of NL165851B publication Critical patent/NL165851B/nl
Application granted granted Critical
Publication of NL165851C publication Critical patent/NL165851C/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
NL7706870A 1976-06-23 1977-06-21 Voor straling gevoelige afdeklaag. NL165851C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7619105A FR2375623A1 (fr) 1976-06-23 1976-06-23 Nouveaux films photosensibles utilisables en microgravure

Publications (3)

Publication Number Publication Date
NL7706870A true NL7706870A (nl) 1977-12-28
NL165851B NL165851B (nl) 1980-12-15
NL165851C NL165851C (nl) 1981-05-15

Family

ID=9174777

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7706870A NL165851C (nl) 1976-06-23 1977-06-21 Voor straling gevoelige afdeklaag.

Country Status (6)

Country Link
US (1) US4235958A (nl)
JP (1) JPS6059583B2 (nl)
DE (1) DE2728352A1 (nl)
FR (1) FR2375623A1 (nl)
GB (1) GB1579671A (nl)
NL (1) NL165851C (nl)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4396704A (en) * 1981-04-22 1983-08-02 Bell Telephone Laboratories, Incorporated Solid state devices produced by organometallic plasma developed resists
US4500628A (en) * 1981-04-22 1985-02-19 At&T Bell Laboratories Process of making solid state devices using silicon containing organometallic plasma developed resists
FR2553531B1 (fr) * 1983-10-14 1995-12-29 Canon Kk Monomere photopolymerisable pour milieu d'enregistrement optique et milieu le contenant
JPS60120361A (ja) * 1983-12-05 1985-06-27 Canon Inc 感光体
JPS60121442A (ja) * 1983-12-06 1985-06-28 Canon Inc 感光性記録メモリ−媒体および記録再生方法
FR2564092B1 (fr) * 1984-05-10 1988-06-10 Commissariat Energie Atomique Complexes organiques amphiphiles a transfert de charge, conducteurs de l'electricite ou precurseurs de conducteurs de l'electricite
US5173365A (en) * 1985-03-25 1992-12-22 Nanofilm Corporation Ultra-thin molecular film
JPS6254494A (ja) * 1985-09-02 1987-03-10 日本電気株式会社 回路部品実装方法
JPS62133423U (nl) * 1986-02-12 1987-08-22
JPS62280837A (ja) * 1986-05-30 1987-12-05 Matsushita Electric Ind Co Ltd エネルギ−感応性単分子累積膜及びそれを用いたパタ−ン形成方法
JPS6358439A (ja) * 1986-08-29 1988-03-14 Hiroyoshi Shirai レジスト
US5258263A (en) * 1991-09-10 1993-11-02 Polaroid Corporation Printing plate and methods of making and use same
US5474813A (en) * 1992-04-10 1995-12-12 Walker; Dana A. Systems and methods for applying grid lines to a shaft and sensing movement thereof
US5734108A (en) * 1992-04-10 1998-03-31 Walker; Dana A. System for sensing shaft displacement and strain
US5253531A (en) * 1992-04-10 1993-10-19 Walker Dana A System and method for monitoring torsional vibrations and operating parameters of rotating shafts
JPH0619317U (ja) * 1992-07-31 1994-03-11 日本電波工業株式会社 表面実装型の圧電共振子
JPH0634329U (ja) * 1992-07-31 1994-05-06 日本電波工業株式会社 表面実装型の圧電共振子
JPH0626317U (ja) * 1992-08-31 1994-04-08 日本電波工業株式会社 表面実装型の圧電共振子
DE4234423C2 (de) * 1992-10-13 1996-10-10 Inst Mikrotechnik Mainz Gmbh Mit einem Resist beschichtete Metall- oder Halbleitersubstrate und Verfahren zur Erzielung einer stabilen Resist-Substrat-Haftung
WO2007117698A2 (en) * 2006-04-07 2007-10-18 Qd Vision, Inc. Composition including material, methods of depositing material, articles including same and systems for depositing material
WO2008111947A1 (en) 2006-06-24 2008-09-18 Qd Vision, Inc. Methods and articles including nanomaterial

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3923761A (en) * 1972-07-18 1975-12-02 Western Litho Plate & Supply Photopolymers

Also Published As

Publication number Publication date
NL165851C (nl) 1981-05-15
NL165851B (nl) 1980-12-15
US4235958A (en) 1980-11-25
FR2375623A1 (fr) 1978-07-21
GB1579671A (en) 1980-11-19
DE2728352C2 (nl) 1987-12-23
FR2375623B1 (nl) 1981-08-07
DE2728352A1 (de) 1977-12-29
JPS6059583B2 (ja) 1985-12-25
JPS534602A (en) 1978-01-17

Similar Documents

Publication Publication Date Title
NL7804304A (nl) Voor straling gevoelige kopieermassa.
NL7804303A (nl) Voor straling gevoelige kopieermassa.
NL7709936A (nl) Lichtgevoelige kopieermassa.
NL7706870A (nl) Voor mikrograveren bestemde voor straling ge- voelige film.
NL7803035A (nl) Lichtgevoelige film en werkwijze voor de vervaardiging ervan.
NL7611732A (nl) Lichtgevoelig kopieermateriaal.
NL7702320A (nl) Roentgenfotografische inrichting.
NL7703473A (nl) Toestel voor inbraakbeveiliging.
NL7709517A (nl) Roentgenfotografische inrichting.
NL7701132A (nl) Georienteerde polyalkeenfilm.
NL7709935A (nl) Lichtgevoelige kopieermassa.
NL7711027A (nl) Ijkstelsel voor gammateller.
NL7605253A (nl) Inrichting voor tomografie.
NL7709672A (nl) Stralingsdetector.
NL7712151A (nl) Fotodetector.
BE838632A (nl) Werkwijze voor het ontwikkelen van fotografische, zilverhalogenide-materialen
NL7605687A (nl) Inrichting voor tomografie.
NL168421C (nl) Stelsel voor inwendige bestraling.
BE861189A (nl) Belichtingssysteem voor kopieerapparaten
NL7711723A (nl) Voorstraling gevoelig element.
NL7710456A (nl) Roentgenfotografische inrichting.
NO774182L (no) Detektor.
NL7706033A (nl) Roentgenfotografische inrichting.
NL7709117A (nl) Roentgenfotografische inrichting.
NL7702322A (nl) Roentgenfotografische inrichting.

Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee