NL7609889A - Werkwijze voor de vervaardiging van eenkris- talsiliciumstaven. - Google Patents

Werkwijze voor de vervaardiging van eenkris- talsiliciumstaven.

Info

Publication number
NL7609889A
NL7609889A NL7609889A NL7609889A NL7609889A NL 7609889 A NL7609889 A NL 7609889A NL 7609889 A NL7609889 A NL 7609889A NL 7609889 A NL7609889 A NL 7609889A NL 7609889 A NL7609889 A NL 7609889A
Authority
NL
Netherlands
Prior art keywords
manufacture
silicon bars
single crisp
crisp silicon
bars
Prior art date
Application number
NL7609889A
Other languages
English (en)
Dutch (nl)
Original Assignee
Wacker Chemitronic
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Chemitronic filed Critical Wacker Chemitronic
Publication of NL7609889A publication Critical patent/NL7609889A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/20—Controlling or regulating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/906—Special atmosphere other than vacuum or inert
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y10T117/106—Seed pulling including sealing means details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
NL7609889A 1975-10-27 1976-09-06 Werkwijze voor de vervaardiging van eenkris- talsiliciumstaven. NL7609889A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2548046A DE2548046C3 (de) 1975-10-27 1975-10-27 Verfahren zum Ziehen einkristalliner Siliciumstäbe

Publications (1)

Publication Number Publication Date
NL7609889A true NL7609889A (nl) 1977-04-29

Family

ID=5960201

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7609889A NL7609889A (nl) 1975-10-27 1976-09-06 Werkwijze voor de vervaardiging van eenkris- talsiliciumstaven.

Country Status (9)

Country Link
US (1) US4097329A (fr)
JP (1) JPS5253777A (fr)
BE (1) BE847618A (fr)
DE (1) DE2548046C3 (fr)
DK (1) DK403776A (fr)
FR (1) FR2329343A1 (fr)
GB (1) GB1524604A (fr)
IT (1) IT1066265B (fr)
NL (1) NL7609889A (fr)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4353408A (en) * 1980-04-11 1982-10-12 Olin Corporation Electromagnetic thin strip casting apparatus
US4406731A (en) * 1981-06-09 1983-09-27 Ferrofluidics Corporation Apparatus for and method of sealing shafts in crystal-growing furnace systems
US4400232A (en) * 1981-11-09 1983-08-23 Eagle-Picher Industries, Inc. Control of oxygen- and carbon-related crystal defects in silicon processing
DE3577405D1 (de) * 1984-12-28 1990-06-07 Sumitomo Electric Industries Verfahren zur herstellung von polykristallen von halbleiterverbindungen und vorrichtung zu dessen durchfuehrung.
JP2575360B2 (ja) * 1986-06-09 1997-01-22 三菱マテリアル株式会社 アンチモンド−プ単結晶の製造方法
US5173270A (en) * 1987-04-09 1992-12-22 Mitsubishi Materials Corporation Monocrystal rod pulled from a melt
US5196086A (en) * 1987-04-09 1993-03-23 Mitsubishi Materials Corporation Monocrystal rod pulled from a melt
JP2640683B2 (ja) * 1988-12-12 1997-08-13 信越半導体株式会社 単結晶棒の引上げ装置
US5269875A (en) * 1989-10-05 1993-12-14 Shin-Etsu Handotai Company, Limited Method of adjusting concentration of oxygen in silicon single crystal and apparatus for use in the method
JPH0774116B2 (ja) * 1989-10-05 1995-08-09 信越半導体株式会社 Ｓｉ単結晶中の酸素濃度調整方法およびその装置
JPH0777999B2 (ja) * 1989-11-24 1995-08-23 信越半導体株式会社 アンチモンドープ単結晶シリコンの育成方法
JP2807609B2 (ja) * 1993-01-28 1998-10-08 三菱マテリアルシリコン株式会社 単結晶の引上装置
SG49058A1 (en) * 1993-07-21 1998-05-18 Memc Electronic Materials Improved method for growing silicon crystal
JP2686223B2 (ja) * 1993-11-30 1997-12-08 住友シチックス株式会社 単結晶製造装置
US5683505A (en) * 1994-11-08 1997-11-04 Sumitomo Sitix Corporation Process for producing single crystals
US8664093B2 (en) 2012-05-21 2014-03-04 Globalfoundries Inc. Methods of forming a silicon seed layer and layers of silicon and silicon-containing material therefrom
CN105879656B (zh) * 2015-11-24 2020-01-07 上海超硅半导体有限公司 单晶硅生长尾气固相处理技术

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL88324C (fr) * 1950-06-15
US2962363A (en) * 1957-07-09 1960-11-29 Pacific Semiconductors Inc Crystal pulling apparatus and method
US2981687A (en) * 1958-04-03 1961-04-25 British Thomson Houston Co Ltd Production of mono-crystal semiconductor bodies
US3194637A (en) * 1960-06-22 1965-07-13 Westinghouse Electric Corp Apparatus for the continuous dendritic growth of crystalline material
DE1233828B (de) * 1964-07-03 1967-02-09 Wacker Chemie Gmbh Verfahren zur Herstellung, Reinigung und/oder Dotierung von ein- oder polykristallinen Halbleiterverbindungen

Also Published As

Publication number Publication date
DE2548046C3 (de) 1982-12-02
GB1524604A (en) 1978-09-13
JPS5253777A (en) 1977-04-30
JPS546511B2 (fr) 1979-03-29
FR2329343A1 (fr) 1977-05-27
IT1066265B (it) 1985-03-04
BE847618A (fr) 1977-04-25
US4097329A (en) 1978-06-27
DE2548046A1 (de) 1977-04-28
FR2329343B1 (fr) 1981-12-18
DE2548046B2 (de) 1978-11-16
DK403776A (da) 1977-04-28

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Legal Events

Date Code Title Description
BV The patent application has lapsed