NL7401645A - - Google Patents

Info

Publication number
NL7401645A
NL7401645A NL7401645A NL7401645A NL7401645A NL 7401645 A NL7401645 A NL 7401645A NL 7401645 A NL7401645 A NL 7401645A NL 7401645 A NL7401645 A NL 7401645A NL 7401645 A NL7401645 A NL 7401645A
Authority
NL
Netherlands
Application number
NL7401645A
Other versions
NL179247B (nl
NL179247C (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7401645A publication Critical patent/NL7401645A/xx
Publication of NL179247B publication Critical patent/NL179247B/xx
Application granted granted Critical
Publication of NL179247C publication Critical patent/NL179247C/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/14Lenses magnetic
    • H01J37/141Electromagnetic lenses
    • H01J37/1416Electromagnetic lenses with superconducting coils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/825Apparatus per se, device per se, or process of making or operating same
    • Y10S505/871Magnetic lens

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Magnetic Resonance Imaging Apparatus (AREA)
  • Electron Beam Exposure (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
NLAANVRAGE7401645,A 1973-02-16 1974-02-06 Lenzensysteem voor deeltjesstraling. NL179247C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2307822A DE2307822C3 (de) 1973-02-16 1973-02-16 Supraleitendes Linsensystem für Korpuskularstrahlung

Publications (3)

Publication Number Publication Date
NL7401645A true NL7401645A (enrdf_load_stackoverflow) 1974-08-20
NL179247B NL179247B (nl) 1986-03-03
NL179247C NL179247C (nl) 1986-08-01

Family

ID=5872194

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7401645,A NL179247C (nl) 1973-02-16 1974-02-06 Lenzensysteem voor deeltjesstraling.

Country Status (6)

Country Link
US (1) US3916201A (enrdf_load_stackoverflow)
JP (1) JPS49115264A (enrdf_load_stackoverflow)
DE (1) DE2307822C3 (enrdf_load_stackoverflow)
FR (1) FR2218651B1 (enrdf_load_stackoverflow)
GB (1) GB1459281A (enrdf_load_stackoverflow)
NL (1) NL179247C (enrdf_load_stackoverflow)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2541915A1 (de) * 1975-09-19 1977-03-31 Max Planck Gesellschaft Korpuskularstrahlenmikroskop mit ringzonensegmentabbildung
DE2726195C3 (de) * 1977-06-10 1980-02-21 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetische Objektivlinse für unter Vakuum arbeitende Korpuskularstrahlgeräte, insbesondere Objektivlinse für Elektronenmikroskope
JPS5748274Y2 (enrdf_load_stackoverflow) * 1977-07-11 1982-10-22
JPS6338523Y2 (enrdf_load_stackoverflow) * 1981-06-15 1988-10-11
JPH0537397Y2 (enrdf_load_stackoverflow) * 1985-12-10 1993-09-21
JP2611995B2 (ja) * 1987-07-29 1997-05-21 秀典 松沢 荷電粒子収束用超電導体レンズ
NL8800344A (nl) * 1988-02-12 1989-09-01 Philips Nv Geladen deeltjes bundel apparaat.
JPH0760661B2 (ja) * 1988-07-22 1995-06-28 株式会社日立製作所 電子顕微鏡
US5012104A (en) * 1990-05-17 1991-04-30 Etec Systems, Inc. Thermally stable magnetic deflection assembly and method of making same
US5264706A (en) * 1991-04-26 1993-11-23 Fujitsu Limited Electron beam exposure system having an electromagnetic deflector configured for efficient cooling
DE69227442T2 (de) * 1991-08-30 1999-07-01 Hitachi, Ltd., Tokio/Tokyo Magnetische elektronenlinse und Elektronenmikroskop unter Verwendung derselbe.
US5376792A (en) * 1993-04-26 1994-12-27 Rj Lee Group, Inc. Scanning electron microscope
US5563415A (en) * 1995-06-07 1996-10-08 Arch Development Corporation Magnetic lens apparatus for a low-voltage high-resolution electron microscope
US6051839A (en) * 1996-06-07 2000-04-18 Arch Development Corporation Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes
US6046457A (en) * 1998-01-09 2000-04-04 International Business Machines Corporation Charged particle beam apparatus having anticontamination means
US7345287B2 (en) * 2005-09-30 2008-03-18 Applied Materials, Inc. Cooling module for charged particle beam column elements
CN105874560B (zh) * 2013-11-14 2018-07-20 迈普尔平版印刷Ip有限公司 电极堆栈布置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB615257A (en) * 1946-05-13 1949-01-04 Gerhard Liebmann Improvements in or relating to electron microscopes and other electronic apparatus employing electron lenses
US3008044A (en) * 1960-02-25 1961-11-07 Gen Electric Application of superconductivity in guiding charged particles
DE1209224B (de) * 1963-08-16 1966-01-20 Siemens Ag Magnetische Linsenanordnung fuer an der Pumpe arbeitende Korpuskularstrahlgeraete
DE1564714C3 (de) * 1966-09-21 1975-04-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetische Linsenanordnung für unter Vakuum arbeitende Korpuskularstrahlgeräte, insbesondere Objektivlinsenanordnung für Elektronenmikroskope
GB1234509A (enrdf_load_stackoverflow) * 1968-05-31 1971-06-03

Also Published As

Publication number Publication date
GB1459281A (en) 1976-12-22
NL179247B (nl) 1986-03-03
DE2307822C3 (de) 1982-03-18
DE2307822B2 (de) 1981-07-02
US3916201A (en) 1975-10-28
NL179247C (nl) 1986-08-01
FR2218651B1 (enrdf_load_stackoverflow) 1977-03-04
FR2218651A1 (enrdf_load_stackoverflow) 1974-09-13
JPS49115264A (enrdf_load_stackoverflow) 1974-11-02
DE2307822A1 (de) 1974-08-22

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
V1 Lapsed because of non-payment of the annual fee