JPS49115264A - - Google Patents

Info

Publication number
JPS49115264A
JPS49115264A JP49017732A JP1773274A JPS49115264A JP S49115264 A JPS49115264 A JP S49115264A JP 49017732 A JP49017732 A JP 49017732A JP 1773274 A JP1773274 A JP 1773274A JP S49115264 A JPS49115264 A JP S49115264A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49017732A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49115264A publication Critical patent/JPS49115264A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/14Lenses magnetic
    • H01J37/141Electromagnetic lenses
    • H01J37/1416Electromagnetic lenses with superconducting coils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/825Apparatus per se, device per se, or process of making or operating same
    • Y10S505/871Magnetic lens

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Magnetic Resonance Imaging Apparatus (AREA)
  • Electron Beam Exposure (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
JP49017732A 1973-02-16 1974-02-15 Pending JPS49115264A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2307822A DE2307822C3 (de) 1973-02-16 1973-02-16 Supraleitendes Linsensystem für Korpuskularstrahlung

Publications (1)

Publication Number Publication Date
JPS49115264A true JPS49115264A (ja) 1974-11-02

Family

ID=5872194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49017732A Pending JPS49115264A (ja) 1973-02-16 1974-02-15

Country Status (6)

Country Link
US (1) US3916201A (ja)
JP (1) JPS49115264A (ja)
DE (1) DE2307822C3 (ja)
FR (1) FR2218651B1 (ja)
GB (1) GB1459281A (ja)
NL (1) NL179247C (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57199945U (ja) * 1981-06-15 1982-12-18
JPS6298147U (ja) * 1985-12-10 1987-06-23
JPS6433836A (en) * 1987-07-29 1989-02-03 Shusuke Matsuzawa Superconductor lens for focusing charged particle

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2541915A1 (de) * 1975-09-19 1977-03-31 Max Planck Gesellschaft Korpuskularstrahlenmikroskop mit ringzonensegmentabbildung
DE2726195C3 (de) * 1977-06-10 1980-02-21 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetische Objektivlinse für unter Vakuum arbeitende Korpuskularstrahlgeräte, insbesondere Objektivlinse für Elektronenmikroskope
JPS5748274Y2 (ja) * 1977-07-11 1982-10-22
NL8800344A (nl) * 1988-02-12 1989-09-01 Philips Nv Geladen deeltjes bundel apparaat.
JPH0760661B2 (ja) * 1988-07-22 1995-06-28 株式会社日立製作所 電子顕微鏡
US5012104A (en) * 1990-05-17 1991-04-30 Etec Systems, Inc. Thermally stable magnetic deflection assembly and method of making same
US5264706A (en) * 1991-04-26 1993-11-23 Fujitsu Limited Electron beam exposure system having an electromagnetic deflector configured for efficient cooling
WO1993005529A1 (en) * 1991-08-30 1993-03-18 Hitachi, Ltd. Magnetic electron lens and electron microscope using same
US5376792A (en) * 1993-04-26 1994-12-27 Rj Lee Group, Inc. Scanning electron microscope
US5563415A (en) * 1995-06-07 1996-10-08 Arch Development Corporation Magnetic lens apparatus for a low-voltage high-resolution electron microscope
US6051839A (en) 1996-06-07 2000-04-18 Arch Development Corporation Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes
US6046457A (en) * 1998-01-09 2000-04-04 International Business Machines Corporation Charged particle beam apparatus having anticontamination means
US7345287B2 (en) * 2005-09-30 2008-03-18 Applied Materials, Inc. Cooling module for charged particle beam column elements
NL2013817C2 (en) * 2013-11-14 2015-07-21 Mapper Lithography Ip Bv Multi-electrode electron optics.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB615257A (en) * 1946-05-13 1949-01-04 Gerhard Liebmann Improvements in or relating to electron microscopes and other electronic apparatus employing electron lenses
US3008044A (en) * 1960-02-25 1961-11-07 Gen Electric Application of superconductivity in guiding charged particles
DE1209224B (de) * 1963-08-16 1966-01-20 Siemens Ag Magnetische Linsenanordnung fuer an der Pumpe arbeitende Korpuskularstrahlgeraete
DE1564714C3 (de) * 1966-09-21 1975-04-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetische Linsenanordnung für unter Vakuum arbeitende Korpuskularstrahlgeräte, insbesondere Objektivlinsenanordnung für Elektronenmikroskope
GB1234509A (ja) * 1968-05-31 1971-06-03

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57199945U (ja) * 1981-06-15 1982-12-18
JPS6338523Y2 (ja) * 1981-06-15 1988-10-11
JPS6298147U (ja) * 1985-12-10 1987-06-23
JPH0537397Y2 (ja) * 1985-12-10 1993-09-21
JPS6433836A (en) * 1987-07-29 1989-02-03 Shusuke Matsuzawa Superconductor lens for focusing charged particle

Also Published As

Publication number Publication date
NL179247B (nl) 1986-03-03
FR2218651A1 (ja) 1974-09-13
NL7401645A (ja) 1974-08-20
NL179247C (nl) 1986-08-01
GB1459281A (en) 1976-12-22
DE2307822B2 (de) 1981-07-02
FR2218651B1 (ja) 1977-03-04
DE2307822C3 (de) 1982-03-18
US3916201A (en) 1975-10-28
DE2307822A1 (de) 1974-08-22

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