NL179247B - Lenzensysteem voor deeltjesstraling. - Google Patents

Lenzensysteem voor deeltjesstraling.

Info

Publication number
NL179247B
NL179247B NLAANVRAGE7401645,A NL7401645A NL179247B NL 179247 B NL179247 B NL 179247B NL 7401645 A NL7401645 A NL 7401645A NL 179247 B NL179247 B NL 179247B
Authority
NL
Netherlands
Prior art keywords
lens system
particulate radiation
particulate
radiation
lens
Prior art date
Application number
NLAANVRAGE7401645,A
Other languages
English (en)
Other versions
NL179247C (nl
NL7401645A (nl
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of NL7401645A publication Critical patent/NL7401645A/xx
Publication of NL179247B publication Critical patent/NL179247B/nl
Application granted granted Critical
Publication of NL179247C publication Critical patent/NL179247C/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H01J37/1416—Electromagnetic lenses with superconducting coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/871—Magnetic lens
NLAANVRAGE7401645,A 1973-02-16 1974-02-06 Lenzensysteem voor deeltjesstraling. NL179247C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2307822A DE2307822C3 (de) 1973-02-16 1973-02-16 Supraleitendes Linsensystem für Korpuskularstrahlung

Publications (3)

Publication Number Publication Date
NL7401645A NL7401645A (nl) 1974-08-20
NL179247B true NL179247B (nl) 1986-03-03
NL179247C NL179247C (nl) 1986-08-01

Family

ID=5872194

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7401645,A NL179247C (nl) 1973-02-16 1974-02-06 Lenzensysteem voor deeltjesstraling.

Country Status (6)

Country Link
US (1) US3916201A (nl)
JP (1) JPS49115264A (nl)
DE (1) DE2307822C3 (nl)
FR (1) FR2218651B1 (nl)
GB (1) GB1459281A (nl)
NL (1) NL179247C (nl)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2541915A1 (de) * 1975-09-19 1977-03-31 Max Planck Gesellschaft Korpuskularstrahlenmikroskop mit ringzonensegmentabbildung
DE2726195C3 (de) * 1977-06-10 1980-02-21 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetische Objektivlinse für unter Vakuum arbeitende Korpuskularstrahlgeräte, insbesondere Objektivlinse für Elektronenmikroskope
JPS5748274Y2 (nl) * 1977-07-11 1982-10-22
JPS6338523Y2 (nl) * 1981-06-15 1988-10-11
JPH0537397Y2 (nl) * 1985-12-10 1993-09-21
JP2611995B2 (ja) * 1987-07-29 1997-05-21 秀典 松沢 荷電粒子収束用超電導体レンズ
NL8800344A (nl) * 1988-02-12 1989-09-01 Philips Nv Geladen deeltjes bundel apparaat.
JPH0760661B2 (ja) * 1988-07-22 1995-06-28 株式会社日立製作所 電子顕微鏡
US5012104A (en) * 1990-05-17 1991-04-30 Etec Systems, Inc. Thermally stable magnetic deflection assembly and method of making same
US5264706A (en) * 1991-04-26 1993-11-23 Fujitsu Limited Electron beam exposure system having an electromagnetic deflector configured for efficient cooling
EP0555492B1 (en) * 1991-08-30 1998-10-28 Hitachi, Ltd. Magnetic electron lens and electron microscope using same
US5376792A (en) * 1993-04-26 1994-12-27 Rj Lee Group, Inc. Scanning electron microscope
US5563415A (en) * 1995-06-07 1996-10-08 Arch Development Corporation Magnetic lens apparatus for a low-voltage high-resolution electron microscope
US6051839A (en) 1996-06-07 2000-04-18 Arch Development Corporation Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes
US6046457A (en) * 1998-01-09 2000-04-04 International Business Machines Corporation Charged particle beam apparatus having anticontamination means
US7345287B2 (en) * 2005-09-30 2008-03-18 Applied Materials, Inc. Cooling module for charged particle beam column elements
KR102368876B1 (ko) * 2013-11-14 2022-03-03 에이에스엠엘 네델란즈 비.브이. 멀티-전극 전자 광학

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB615257A (en) * 1946-05-13 1949-01-04 Gerhard Liebmann Improvements in or relating to electron microscopes and other electronic apparatus employing electron lenses
US3008044A (en) * 1960-02-25 1961-11-07 Gen Electric Application of superconductivity in guiding charged particles
DE1209224B (de) * 1963-08-16 1966-01-20 Siemens Ag Magnetische Linsenanordnung fuer an der Pumpe arbeitende Korpuskularstrahlgeraete
DE1564714C3 (de) * 1966-09-21 1975-04-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Magnetische Linsenanordnung für unter Vakuum arbeitende Korpuskularstrahlgeräte, insbesondere Objektivlinsenanordnung für Elektronenmikroskope
GB1234509A (nl) * 1968-05-31 1971-06-03

Also Published As

Publication number Publication date
US3916201A (en) 1975-10-28
DE2307822A1 (de) 1974-08-22
NL179247C (nl) 1986-08-01
JPS49115264A (nl) 1974-11-02
NL7401645A (nl) 1974-08-20
DE2307822C3 (de) 1982-03-18
FR2218651A1 (nl) 1974-09-13
GB1459281A (en) 1976-12-22
FR2218651B1 (nl) 1977-03-04
DE2307822B2 (de) 1981-07-02

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
V1 Lapsed because of non-payment of the annual fee