NL7414518A - Werkwijze voor het bereiden van fotogevoelige materialen. - Google Patents
Werkwijze voor het bereiden van fotogevoelige materialen.Info
- Publication number
- NL7414518A NL7414518A NL7414518A NL7414518A NL7414518A NL 7414518 A NL7414518 A NL 7414518A NL 7414518 A NL7414518 A NL 7414518A NL 7414518 A NL7414518 A NL 7414518A NL 7414518 A NL7414518 A NL 7414518A
- Authority
- NL
- Netherlands
- Prior art keywords
- photosensitive materials
- preparing photosensitive
- preparing
- materials
- photosensitive
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB5194173A GB1463816A (en) | 1973-11-08 | 1973-11-08 | Photosensitive lithographic materials and polymers useful therein |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7414518A true NL7414518A (nl) | 1975-05-12 |
Family
ID=10462052
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7414518A NL7414518A (nl) | 1973-11-08 | 1974-11-07 | Werkwijze voor het bereiden van fotogevoelige materialen. |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS5078402A (nl) |
| BE (1) | BE821970A (nl) |
| CA (1) | CA1041698A (nl) |
| DE (1) | DE2452761A1 (nl) |
| FR (1) | FR2251031B1 (nl) |
| GB (1) | GB1463816A (nl) |
| IT (1) | IT1025479B (nl) |
| NL (1) | NL7414518A (nl) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4097281A (en) * | 1977-10-17 | 1978-06-27 | Eastman Kodak Company | Heat developable photographic material and process comprising transition metal carbonyl compounds |
| GB1603908A (en) * | 1978-05-31 | 1981-12-02 | Kodak Ltd | Radiationsensitive materials |
| US4503140A (en) * | 1982-05-18 | 1985-03-05 | Minnesota Mining And Manufacturing Company | Radiation-sensitive compositions of polymers containing a π-metal carbonyl complex of conjugated polyolefin |
| JPH0767868B2 (ja) * | 1984-10-23 | 1995-07-26 | 三菱化学株式会社 | 感光性平版印刷版 |
| JPS62290705A (ja) * | 1986-06-10 | 1987-12-17 | Mitsubishi Chem Ind Ltd | 光重合性組成物 |
| EP0641460A1 (en) | 1992-05-21 | 1995-03-08 | Minnesota Mining And Manufacturing Company | Organometallic monomers and polymers with improved adhesion |
| CA2134334A1 (en) * | 1992-05-21 | 1993-11-25 | Wesley J. Bruxvoort | Organometallic monomers and polymers with improved adhesion |
| GB2287707B (en) * | 1994-03-25 | 1998-02-25 | Erba Carlo Spa | Intermediates for biologically active products |
-
1973
- 1973-11-08 GB GB5194173A patent/GB1463816A/en not_active Expired
-
1974
- 1974-10-29 CA CA212,535A patent/CA1041698A/en not_active Expired
- 1974-11-06 FR FR7436756A patent/FR2251031B1/fr not_active Expired
- 1974-11-06 IT IT2917474A patent/IT1025479B/it active
- 1974-11-07 NL NL7414518A patent/NL7414518A/nl not_active Application Discontinuation
- 1974-11-07 DE DE19742452761 patent/DE2452761A1/de active Pending
- 1974-11-07 BE BE150315A patent/BE821970A/xx unknown
- 1974-11-08 JP JP12885074A patent/JPS5078402A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| AU7517574A (en) | 1976-05-13 |
| FR2251031A1 (nl) | 1975-06-06 |
| FR2251031B1 (nl) | 1976-10-22 |
| GB1463816A (en) | 1977-02-09 |
| IT1025479B (it) | 1978-08-10 |
| BE821970A (fr) | 1975-05-07 |
| CA1041698A (en) | 1978-10-31 |
| DE2452761A1 (de) | 1975-05-15 |
| JPS5078402A (nl) | 1975-06-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BV | The patent application has lapsed |