NL7302066A - - Google Patents
Info
- Publication number
- NL7302066A NL7302066A NL7302066A NL7302066A NL7302066A NL 7302066 A NL7302066 A NL 7302066A NL 7302066 A NL7302066 A NL 7302066A NL 7302066 A NL7302066 A NL 7302066A NL 7302066 A NL7302066 A NL 7302066A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F3/00—Colour separation; Correction of tonal value
- G03F3/10—Checking the colour or tonal value of separation negatives or positives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2208639A DE2208639C3 (de) | 1972-02-24 | 1972-02-24 | Verfahren zum Herstellen der Offsetdruckformen für einen Mehrfarbendruck aus mit einer o-Chinon-diazidverbindung vorsensibilisierten Offsetdruckplatten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7302066A true NL7302066A (en:Method) | 1973-08-28 |
Family
ID=5836895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7302066A NL7302066A (en:Method) | 1972-02-24 | 1973-02-14 |
Country Status (10)
| Country | Link |
|---|---|
| AT (1) | AT321958B (en:Method) |
| BE (1) | BE795755A (en:Method) |
| CH (1) | CH569310A5 (en:Method) |
| DE (1) | DE2208639C3 (en:Method) |
| FR (1) | FR2173603A5 (en:Method) |
| GB (1) | GB1407123A (en:Method) |
| IT (1) | IT977451B (en:Method) |
| NL (1) | NL7302066A (en:Method) |
| SE (1) | SE383785B (en:Method) |
| ZA (1) | ZA731287B (en:Method) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3110632A1 (de) * | 1981-03-19 | 1982-09-30 | Hoechst Ag, 6000 Frankfurt | Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen |
| JPS61189636A (ja) * | 1985-02-19 | 1986-08-23 | Ushio Inc | キセノン・水銀放電灯による半導体ウエハ−の露光方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE938233C (de) * | 1953-03-11 | 1956-01-26 | Kalle & Co Ag | Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen |
| NL129161C (en:Method) * | 1959-01-14 | |||
| NL130027C (en:Method) * | 1959-01-15 | |||
| NL129162C (en:Method) * | 1959-01-17 | |||
| NL247588A (en:Method) * | 1959-01-21 | |||
| DE1114705C2 (de) * | 1959-04-16 | 1962-04-12 | Kalle Ag | Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen |
| GB1116737A (en) * | 1966-02-28 | 1968-06-12 | Agfa Gevaert Nv | Bis-(o-quinone diazide) modified bisphenols |
-
0
- BE BE795755D patent/BE795755A/xx not_active IP Right Cessation
-
1972
- 1972-02-24 DE DE2208639A patent/DE2208639C3/de not_active Expired
-
1973
- 1973-02-14 NL NL7302066A patent/NL7302066A/xx not_active Application Discontinuation
- 1973-02-19 SE SE7302290A patent/SE383785B/xx unknown
- 1973-02-21 CH CH248773A patent/CH569310A5/xx not_active IP Right Cessation
- 1973-02-21 GB GB853273A patent/GB1407123A/en not_active Expired
- 1973-02-21 AT AT152473A patent/AT321958B/de not_active IP Right Cessation
- 1973-02-22 IT IT48387/73A patent/IT977451B/it active
- 1973-02-23 FR FR7306462A patent/FR2173603A5/fr not_active Expired
- 1973-02-23 ZA ZA731287A patent/ZA731287B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AT321958B (de) | 1975-04-25 |
| ZA731287B (en) | 1973-11-28 |
| SE383785B (sv) | 1976-03-29 |
| DE2208639A1 (de) | 1973-09-13 |
| FR2173603A5 (en:Method) | 1973-10-05 |
| DE2208639B2 (de) | 1977-06-16 |
| CH569310A5 (en:Method) | 1975-11-14 |
| IT977451B (it) | 1974-09-10 |
| GB1407123A (en) | 1975-09-24 |
| BE795755A (fr) | 1973-08-21 |
| DE2208639C3 (de) | 1982-10-21 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BA | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| BC | A request for examination has been filed | ||
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |