NL130027C - - Google Patents
Info
- Publication number
- NL130027C NL130027C NL130027DA NL130027C NL 130027 C NL130027 C NL 130027C NL 130027D A NL130027D A NL 130027DA NL 130027 C NL130027 C NL 130027C
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/76—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK36733A DE1109521B (de) | 1959-01-15 | 1959-01-15 | Lichtempfindliche Schichten fuer die Herstellung von Druckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL130027C true NL130027C (en:Method) |
Family
ID=7220781
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL130027D NL130027C (en:Method) | 1959-01-15 | ||
| NL247405D NL247405A (en:Method) | 1959-01-15 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL247405D NL247405A (en:Method) | 1959-01-15 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3130047A (en:Method) |
| AT (1) | AT216539B (en:Method) |
| BE (1) | BE586560A (en:Method) |
| CH (1) | CH383774A (en:Method) |
| DE (1) | DE1109521B (en:Method) |
| FR (1) | FR1245318A (en:Method) |
| GB (1) | GB937123A (en:Method) |
| NL (2) | NL247405A (en:Method) |
| SE (1) | SE302886B (en:Method) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL130926C (en:Method) * | 1959-09-04 | |||
| NL138044C (en:Method) * | 1961-07-28 | |||
| GB1052699A (en:Method) * | 1963-12-03 | |||
| GB1143679A (en:Method) * | 1965-05-22 | 1900-01-01 | ||
| US3635709A (en) * | 1966-12-15 | 1972-01-18 | Polychrome Corp | Light-sensitive lithographic plate |
| US3920455A (en) * | 1971-05-28 | 1975-11-18 | Polychrome Corp | Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters |
| BE795755A (fr) * | 1972-02-24 | 1973-08-21 | Kalle Ag | Procede de fabrication de formes d'impression offset |
| US4174222A (en) * | 1975-05-24 | 1979-11-13 | Tokyo Ohka Kogyo Kabushiki Kaisha | Positive-type O-quinone diazide containing photoresist compositions |
| DE2742631A1 (de) * | 1977-09-22 | 1979-04-05 | Hoechst Ag | Lichtempfindliche kopiermasse |
| DE3040157A1 (de) * | 1980-10-24 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
| IT1169682B (it) * | 1983-11-08 | 1987-06-03 | I M G Ind Materiali Grafici Sp | Composizione per fotoriproduzioni |
| US4684597A (en) * | 1985-10-25 | 1987-08-04 | Eastman Kodak Company | Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor |
| DE3686032T2 (de) * | 1985-12-27 | 1993-02-18 | Japan Synthetic Rubber Co Ltd | Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung. |
| DE3635303A1 (de) | 1986-10-17 | 1988-04-28 | Hoechst Ag | Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten |
| JPS63178228A (ja) * | 1987-01-20 | 1988-07-22 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| DE3718416A1 (de) * | 1987-06-02 | 1988-12-15 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung |
| US4797345A (en) * | 1987-07-01 | 1989-01-10 | Olin Hunt Specialty Products, Inc. | Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures |
| DE3729035A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial |
| US5219701A (en) * | 1988-03-31 | 1993-06-15 | Ciba-Geigy Corporation | Positive photoresist containing 1,2-naphthoquinone-diazide-5-sulfonyl tris ester of 1,3,5-trihydroxybenzene and aromatic hydroxy compound sensitizer |
| DE3811040A1 (de) * | 1988-03-31 | 1989-10-19 | Ciba Geigy Ag | Im nahen uv hochaufloesende positiv-fotoresists |
| DE4134526A1 (de) * | 1990-10-18 | 1992-05-14 | Toyo Gosei Kogyo Kk | Positive photoresist-zusammensetzung und mustererzeugungsverfahren unter verwendung dieser zusammensetzung |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
| GB9326150D0 (en) * | 1993-12-22 | 1994-02-23 | Alcan Int Ltd | Electrochemical roughening method |
| US5552256A (en) * | 1994-09-29 | 1996-09-03 | International Business Machines Corporation | Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring |
| JP3278306B2 (ja) | 1994-10-31 | 2002-04-30 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| US5853947A (en) * | 1995-12-21 | 1998-12-29 | Clariant Finance (Bvi) Limited | Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate |
| US6852465B2 (en) * | 2003-03-21 | 2005-02-08 | Clariant International Ltd. | Photoresist composition for imaging thick films |
| US7255970B2 (en) * | 2005-07-12 | 2007-08-14 | Az Electronic Materials Usa Corp. | Photoresist composition for imaging thick films |
| US20070105040A1 (en) * | 2005-11-10 | 2007-05-10 | Toukhy Medhat A | Developable undercoating composition for thick photoresist layers |
| US20130108956A1 (en) | 2011-11-01 | 2013-05-02 | Az Electronic Materials Usa Corp. | Nanocomposite positive photosensitive composition and use thereof |
| WO2024223739A1 (en) | 2023-04-27 | 2024-10-31 | Merck Patent Gmbh | Photoactive compounds |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2138809A (en) * | 1936-03-12 | 1938-11-29 | Socony Vacuum Oil Co Inc | Acylated condensation products and method of making them |
| BE510151A (en:Method) * | 1949-07-23 | |||
| NL77540C (en:Method) * | 1950-12-23 | |||
| NL185407B (nl) * | 1953-03-11 | Mitsui Petrochemical Ind | Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze. |
-
0
- NL NL130027D patent/NL130027C/xx active
- NL NL247405D patent/NL247405A/xx unknown
-
1959
- 1959-01-15 DE DEK36733A patent/DE1109521B/de active Pending
-
1960
- 1960-01-08 GB GB793/60A patent/GB937123A/en not_active Expired
- 1960-01-11 US US1420A patent/US3130047A/en not_active Expired - Lifetime
- 1960-01-12 CH CH27860A patent/CH383774A/de unknown
- 1960-01-13 AT AT22060A patent/AT216539B/de active
- 1960-01-13 SE SE298/60A patent/SE302886B/xx unknown
- 1960-01-14 BE BE586560A patent/BE586560A/fr unknown
- 1960-01-15 FR FR815734A patent/FR1245318A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE302886B (en:Method) | 1968-08-05 |
| CH383774A (de) | 1964-10-31 |
| AT216539B (de) | 1961-08-10 |
| BE586560A (fr) | 1960-07-14 |
| US3130047A (en) | 1964-04-21 |
| NL247405A (en:Method) | |
| DE1109521B (de) | 1961-06-22 |
| FR1245318A (fr) | 1960-11-04 |
| GB937123A (en) | 1963-09-18 |