ZA731287B - Process for the manufacture of offset printing plates - Google Patents

Process for the manufacture of offset printing plates

Info

Publication number
ZA731287B
ZA731287B ZA731287A ZA731287A ZA731287B ZA 731287 B ZA731287 B ZA 731287B ZA 731287 A ZA731287 A ZA 731287A ZA 731287 A ZA731287 A ZA 731287A ZA 731287 B ZA731287 B ZA 731287B
Authority
ZA
South Africa
Prior art keywords
manufacture
offset printing
printing plates
plates
offset
Prior art date
Application number
ZA731287A
Inventor
G Strauber
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of ZA731287B publication Critical patent/ZA731287B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00Colour separation; Correction of tonal value
    • G03F3/10Checking the colour or tonal value of separation negatives or positives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
ZA731287A 1972-02-24 1973-02-23 Process for the manufacture of offset printing plates ZA731287B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2208639A DE2208639C3 (en) 1972-02-24 1972-02-24 Process for producing offset printing plates for multicolor printing from offset printing plates presensitized with an o-quinone diazide compound

Publications (1)

Publication Number Publication Date
ZA731287B true ZA731287B (en) 1973-11-28

Family

ID=5836895

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA731287A ZA731287B (en) 1972-02-24 1973-02-23 Process for the manufacture of offset printing plates

Country Status (10)

Country Link
AT (1) AT321958B (en)
BE (1) BE795755A (en)
CH (1) CH569310A5 (en)
DE (1) DE2208639C3 (en)
FR (1) FR2173603A5 (en)
GB (1) GB1407123A (en)
IT (1) IT977451B (en)
NL (1) NL7302066A (en)
SE (1) SE383785B (en)
ZA (1) ZA731287B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3110632A1 (en) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt METHOD FOR BURNING IN LIGHT-SENSITIVE LAYERS IN THE PRODUCTION OF PRINTING FORMS
JPS61189636A (en) * 1985-02-19 1986-08-23 Ushio Inc Exposure method for semiconductor wafer with xenon-mercury vapor discharge lamp

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE938233C (en) * 1953-03-11 1956-01-26 Kalle & Co Ag Photosensitive material for the photomechanical production of printing forms
GB1116737A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Bis-(o-quinone diazide) modified bisphenols

Also Published As

Publication number Publication date
DE2208639B2 (en) 1977-06-16
NL7302066A (en) 1973-08-28
CH569310A5 (en) 1975-11-14
AT321958B (en) 1975-04-25
DE2208639A1 (en) 1973-09-13
BE795755A (en) 1973-08-21
GB1407123A (en) 1975-09-24
FR2173603A5 (en) 1973-10-05
SE383785B (en) 1976-03-29
IT977451B (en) 1974-09-10
DE2208639C3 (en) 1982-10-21

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