ZA731287B - Process for the manufacture of offset printing plates - Google Patents
Process for the manufacture of offset printing platesInfo
- Publication number
- ZA731287B ZA731287B ZA731287A ZA731287A ZA731287B ZA 731287 B ZA731287 B ZA 731287B ZA 731287 A ZA731287 A ZA 731287A ZA 731287 A ZA731287 A ZA 731287A ZA 731287 B ZA731287 B ZA 731287B
- Authority
- ZA
- South Africa
- Prior art keywords
- manufacture
- offset printing
- printing plates
- plates
- offset
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F3/00—Colour separation; Correction of tonal value
- G03F3/10—Checking the colour or tonal value of separation negatives or positives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2208639A DE2208639C3 (en) | 1972-02-24 | 1972-02-24 | Process for producing offset printing plates for multicolor printing from offset printing plates presensitized with an o-quinone diazide compound |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA731287B true ZA731287B (en) | 1973-11-28 |
Family
ID=5836895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA731287A ZA731287B (en) | 1972-02-24 | 1973-02-23 | Process for the manufacture of offset printing plates |
Country Status (10)
Country | Link |
---|---|
AT (1) | AT321958B (en) |
BE (1) | BE795755A (en) |
CH (1) | CH569310A5 (en) |
DE (1) | DE2208639C3 (en) |
FR (1) | FR2173603A5 (en) |
GB (1) | GB1407123A (en) |
IT (1) | IT977451B (en) |
NL (1) | NL7302066A (en) |
SE (1) | SE383785B (en) |
ZA (1) | ZA731287B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3110632A1 (en) * | 1981-03-19 | 1982-09-30 | Hoechst Ag, 6000 Frankfurt | METHOD FOR BURNING IN LIGHT-SENSITIVE LAYERS IN THE PRODUCTION OF PRINTING FORMS |
JPS61189636A (en) * | 1985-02-19 | 1986-08-23 | Ushio Inc | Exposure method for semiconductor wafer with xenon-mercury vapor discharge lamp |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE938233C (en) * | 1953-03-11 | 1956-01-26 | Kalle & Co Ag | Photosensitive material for the photomechanical production of printing forms |
GB1116737A (en) * | 1966-02-28 | 1968-06-12 | Agfa Gevaert Nv | Bis-(o-quinone diazide) modified bisphenols |
-
0
- BE BE795755D patent/BE795755A/en not_active IP Right Cessation
-
1972
- 1972-02-24 DE DE2208639A patent/DE2208639C3/en not_active Expired
-
1973
- 1973-02-14 NL NL7302066A patent/NL7302066A/xx not_active Application Discontinuation
- 1973-02-19 SE SE7302290A patent/SE383785B/en unknown
- 1973-02-21 GB GB853273A patent/GB1407123A/en not_active Expired
- 1973-02-21 AT AT152473A patent/AT321958B/en not_active IP Right Cessation
- 1973-02-21 CH CH248773A patent/CH569310A5/xx not_active IP Right Cessation
- 1973-02-22 IT IT48387/73A patent/IT977451B/en active
- 1973-02-23 ZA ZA731287A patent/ZA731287B/en unknown
- 1973-02-23 FR FR7306462A patent/FR2173603A5/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CH569310A5 (en) | 1975-11-14 |
GB1407123A (en) | 1975-09-24 |
SE383785B (en) | 1976-03-29 |
DE2208639C3 (en) | 1982-10-21 |
DE2208639B2 (en) | 1977-06-16 |
DE2208639A1 (en) | 1973-09-13 |
BE795755A (en) | 1973-08-21 |
NL7302066A (en) | 1973-08-28 |
FR2173603A5 (en) | 1973-10-05 |
IT977451B (en) | 1974-09-10 |
AT321958B (en) | 1975-04-25 |
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