SE383785B - PROCEDURE FOR MAKING OFFSET PRINTING FORMS FOR A MULTIPLE-PRESSURE PRINT - Google Patents

PROCEDURE FOR MAKING OFFSET PRINTING FORMS FOR A MULTIPLE-PRESSURE PRINT

Info

Publication number
SE383785B
SE383785B SE7302290A SE7302290A SE383785B SE 383785 B SE383785 B SE 383785B SE 7302290 A SE7302290 A SE 7302290A SE 7302290 A SE7302290 A SE 7302290A SE 383785 B SE383785 B SE 383785B
Authority
SE
Sweden
Prior art keywords
procedure
offset printing
printing forms
pressure print
making offset
Prior art date
Application number
SE7302290A
Other languages
Swedish (sv)
Inventor
G Strauber
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of SE383785B publication Critical patent/SE383785B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
SE7302290A 1972-02-24 1973-02-19 PROCEDURE FOR MAKING OFFSET PRINTING FORMS FOR A MULTIPLE-PRESSURE PRINT SE383785B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2208639A DE2208639C3 (en) 1972-02-24 1972-02-24 Process for producing offset printing plates for multicolor printing from offset printing plates presensitized with an o-quinone diazide compound

Publications (1)

Publication Number Publication Date
SE383785B true SE383785B (en) 1976-03-29

Family

ID=5836895

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7302290A SE383785B (en) 1972-02-24 1973-02-19 PROCEDURE FOR MAKING OFFSET PRINTING FORMS FOR A MULTIPLE-PRESSURE PRINT

Country Status (10)

Country Link
AT (1) AT321958B (en)
BE (1) BE795755A (en)
CH (1) CH569310A5 (en)
DE (1) DE2208639C3 (en)
FR (1) FR2173603A5 (en)
GB (1) GB1407123A (en)
IT (1) IT977451B (en)
NL (1) NL7302066A (en)
SE (1) SE383785B (en)
ZA (1) ZA731287B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3110632A1 (en) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt METHOD FOR BURNING IN LIGHT-SENSITIVE LAYERS IN THE PRODUCTION OF PRINTING FORMS
JPS61189636A (en) * 1985-02-19 1986-08-23 Ushio Inc Exposure method for semiconductor wafer with xenon-mercury vapor discharge lamp

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE938233C (en) * 1953-03-11 1956-01-26 Kalle & Co Ag Photosensitive material for the photomechanical production of printing forms
GB1116737A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Bis-(o-quinone diazide) modified bisphenols

Also Published As

Publication number Publication date
DE2208639A1 (en) 1973-09-13
DE2208639C3 (en) 1982-10-21
IT977451B (en) 1974-09-10
NL7302066A (en) 1973-08-28
AT321958B (en) 1975-04-25
DE2208639B2 (en) 1977-06-16
ZA731287B (en) 1973-11-28
CH569310A5 (en) 1975-11-14
GB1407123A (en) 1975-09-24
FR2173603A5 (en) 1973-10-05
BE795755A (en) 1973-08-21

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