FR2173603A5 - - Google Patents

Info

Publication number
FR2173603A5
FR2173603A5 FR7306462A FR7306462A FR2173603A5 FR 2173603 A5 FR2173603 A5 FR 2173603A5 FR 7306462 A FR7306462 A FR 7306462A FR 7306462 A FR7306462 A FR 7306462A FR 2173603 A5 FR2173603 A5 FR 2173603A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7306462A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Application granted granted Critical
Publication of FR2173603A5 publication Critical patent/FR2173603A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7306462A 1972-02-24 1973-02-23 Expired FR2173603A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2208639A DE2208639C3 (de) 1972-02-24 1972-02-24 Verfahren zum Herstellen der Offsetdruckformen für einen Mehrfarbendruck aus mit einer o-Chinon-diazidverbindung vorsensibilisierten Offsetdruckplatten

Publications (1)

Publication Number Publication Date
FR2173603A5 true FR2173603A5 (fr) 1973-10-05

Family

ID=5836895

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7306462A Expired FR2173603A5 (fr) 1972-02-24 1973-02-23

Country Status (10)

Country Link
AT (1) AT321958B (fr)
BE (1) BE795755A (fr)
CH (1) CH569310A5 (fr)
DE (1) DE2208639C3 (fr)
FR (1) FR2173603A5 (fr)
GB (1) GB1407123A (fr)
IT (1) IT977451B (fr)
NL (1) NL7302066A (fr)
SE (1) SE383785B (fr)
ZA (1) ZA731287B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2577695A1 (fr) * 1985-02-19 1986-08-22 Ushio Electric Inc Procede d'exposition d'une pastille a semi-conducteur au moyen d'une lampe a luminescence a gaz rare-mercure

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3110632A1 (de) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
GB1116737A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Bis-(o-quinone diazide) modified bisphenols

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2577695A1 (fr) * 1985-02-19 1986-08-22 Ushio Electric Inc Procede d'exposition d'une pastille a semi-conducteur au moyen d'une lampe a luminescence a gaz rare-mercure

Also Published As

Publication number Publication date
DE2208639B2 (de) 1977-06-16
NL7302066A (fr) 1973-08-28
CH569310A5 (fr) 1975-11-14
AT321958B (de) 1975-04-25
DE2208639A1 (de) 1973-09-13
BE795755A (fr) 1973-08-21
GB1407123A (en) 1975-09-24
SE383785B (sv) 1976-03-29
ZA731287B (en) 1973-11-28
IT977451B (it) 1974-09-10
DE2208639C3 (de) 1982-10-21

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Legal Events

Date Code Title Description
ST Notification of lapse