CH569310A5 - - Google Patents

Info

Publication number
CH569310A5
CH569310A5 CH248773A CH248773A CH569310A5 CH 569310 A5 CH569310 A5 CH 569310A5 CH 248773 A CH248773 A CH 248773A CH 248773 A CH248773 A CH 248773A CH 569310 A5 CH569310 A5 CH 569310A5
Authority
CH
Switzerland
Application number
CH248773A
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of CH569310A5 publication Critical patent/CH569310A5/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CH248773A 1972-02-24 1973-02-21 CH569310A5 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2208639A DE2208639C3 (de) 1972-02-24 1972-02-24 Verfahren zum Herstellen der Offsetdruckformen für einen Mehrfarbendruck aus mit einer o-Chinon-diazidverbindung vorsensibilisierten Offsetdruckplatten

Publications (1)

Publication Number Publication Date
CH569310A5 true CH569310A5 (xx) 1975-11-14

Family

ID=5836895

Family Applications (1)

Application Number Title Priority Date Filing Date
CH248773A CH569310A5 (xx) 1972-02-24 1973-02-21

Country Status (10)

Country Link
AT (1) AT321958B (xx)
BE (1) BE795755A (xx)
CH (1) CH569310A5 (xx)
DE (1) DE2208639C3 (xx)
FR (1) FR2173603A5 (xx)
GB (1) GB1407123A (xx)
IT (1) IT977451B (xx)
NL (1) NL7302066A (xx)
SE (1) SE383785B (xx)
ZA (1) ZA731287B (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3110632A1 (de) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen
JPS61189636A (ja) * 1985-02-19 1986-08-23 Ushio Inc キセノン・水銀放電灯による半導体ウエハ−の露光方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
GB1116737A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Bis-(o-quinone diazide) modified bisphenols

Also Published As

Publication number Publication date
DE2208639B2 (de) 1977-06-16
NL7302066A (xx) 1973-08-28
AT321958B (de) 1975-04-25
DE2208639A1 (de) 1973-09-13
BE795755A (fr) 1973-08-21
GB1407123A (en) 1975-09-24
FR2173603A5 (xx) 1973-10-05
SE383785B (sv) 1976-03-29
ZA731287B (en) 1973-11-28
IT977451B (it) 1974-09-10
DE2208639C3 (de) 1982-10-21

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Legal Events

Date Code Title Description
PL Patent ceased