AU6984274A - Printing plate process - Google Patents

Printing plate process

Info

Publication number
AU6984274A
AU6984274A AU69842/74A AU6984274A AU6984274A AU 6984274 A AU6984274 A AU 6984274A AU 69842/74 A AU69842/74 A AU 69842/74A AU 6984274 A AU6984274 A AU 6984274A AU 6984274 A AU6984274 A AU 6984274A
Authority
AU
Australia
Prior art keywords
printing plate
plate process
printing
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU69842/74A
Inventor
John Grear Hutchison
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace and Co
Original Assignee
WR Grace and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co filed Critical WR Grace and Co
Publication of AU6984274A publication Critical patent/AU6984274A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU69842/74A 1973-06-08 1974-06-06 Printing plate process Expired AU6984274A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US36815473A 1973-06-08 1973-06-08

Publications (1)

Publication Number Publication Date
AU6984274A true AU6984274A (en) 1975-12-11

Family

ID=23450066

Family Applications (1)

Application Number Title Priority Date Filing Date
AU69842/74A Expired AU6984274A (en) 1973-06-08 1974-06-06 Printing plate process

Country Status (7)

Country Link
JP (1) JPS5053106A (en)
AU (1) AU6984274A (en)
BE (1) BE816067A (en)
DE (1) DE2427788A1 (en)
FR (1) FR2232781A1 (en)
IT (1) IT1014922B (en)
NL (1) NL7407727A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU631393B2 (en) * 1988-11-28 1992-11-26 Stork Screens B.V. Process and device for forming a resist pattern on a cylindrical object, and an etched metal cylinder obtained using such a resist pattern

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1540413A (en) * 1976-01-21 1979-02-14 Eocom Corp Scanning system for the production of copies
US4419675A (en) * 1979-05-24 1983-12-06 American Hoechst Corporation Imaging system and method for printed circuit artwork and the like
EP0164461A1 (en) * 1984-06-06 1985-12-18 Roneo Alcatel Limited IMprovements in or relating to electro-sensitive materials
JPS59114543A (en) * 1982-12-15 1984-07-02 ロネオ・アルカテル・リミテツド Opaque recording sheet and manufacture of offset lithographic plate using same
US4990286A (en) * 1989-03-17 1991-02-05 President And Fellows Of Harvard College Zinc oxyfluoride transparent conductor
US4985116A (en) * 1990-02-23 1991-01-15 Mint-Pac Technologies, Inc. Three dimensional plating or etching process and masks therefor
EP0896694A1 (en) * 1996-05-02 1999-02-17 WINDI WINDERLICH GmbH Process and device for preparation of exposed typesetting films for phototypesetting
AU4570597A (en) * 1996-10-16 1998-05-11 J.G. Systems Inc. Process for imaging a flexo-graphic printing plate from liquid photopolymers and without using phototools

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU631393B2 (en) * 1988-11-28 1992-11-26 Stork Screens B.V. Process and device for forming a resist pattern on a cylindrical object, and an etched metal cylinder obtained using such a resist pattern

Also Published As

Publication number Publication date
FR2232781A1 (en) 1975-01-03
IT1014922B (en) 1977-04-30
BE816067A (en) 1974-09-30
JPS5053106A (en) 1975-05-12
DE2427788A1 (en) 1975-01-02
NL7407727A (en) 1974-12-10
FR2232781B3 (en) 1977-04-08

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