JPS5053106A - - Google Patents
Info
- Publication number
- JPS5053106A JPS5053106A JP6418874A JP6418874A JPS5053106A JP S5053106 A JPS5053106 A JP S5053106A JP 6418874 A JP6418874 A JP 6418874A JP 6418874 A JP6418874 A JP 6418874A JP S5053106 A JPS5053106 A JP S5053106A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US36815473A | 1973-06-08 | 1973-06-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5053106A true JPS5053106A (en) | 1975-05-12 |
Family
ID=23450066
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6418874A Pending JPS5053106A (en) | 1973-06-08 | 1974-06-07 |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5053106A (en) |
| AU (1) | AU6984274A (en) |
| BE (1) | BE816067A (en) |
| DE (1) | DE2427788A1 (en) |
| FR (1) | FR2232781A1 (en) |
| IT (1) | IT1014922B (en) |
| NL (1) | NL7407727A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04506505A (en) * | 1989-03-17 | 1992-11-12 | プレジデント・アンド・フェローズ・オブ・ハーバード・カレッジ | Zinc oxyfluoride transparent conductor |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1540413A (en) * | 1976-01-21 | 1979-02-14 | Eocom Corp | Scanning system for the production of copies |
| US4419675A (en) * | 1979-05-24 | 1983-12-06 | American Hoechst Corporation | Imaging system and method for printed circuit artwork and the like |
| JPS59114543A (en) * | 1982-12-15 | 1984-07-02 | ロネオ・アルカテル・リミテツド | Opaque recording sheet and manufacture of offset lithographic plate using same |
| EP0164461A1 (en) * | 1984-06-06 | 1985-12-18 | Roneo Alcatel Limited | IMprovements in or relating to electro-sensitive materials |
| NL8802928A (en) * | 1988-11-28 | 1990-06-18 | Stork Screens Bv | A METHOD AND APPARATUS FOR FORMING A RESISTANT PATTERN ON A CYLINDRICAL ART AND A METAL CYLINDER CREATED BY THE USE OF SUCH A RESISTANCE PATTERN. |
| US4985116A (en) * | 1990-02-23 | 1991-01-15 | Mint-Pac Technologies, Inc. | Three dimensional plating or etching process and masks therefor |
| EP0896694A1 (en) * | 1996-05-02 | 1999-02-17 | WINDI WINDERLICH GmbH | Process and device for preparation of exposed typesetting films for phototypesetting |
| WO1998016874A1 (en) * | 1996-10-16 | 1998-04-23 | J.G. Systems Inc. | Process for imaging a flexo-graphic printing plate from liquid photopolymers and without using phototools |
-
1974
- 1974-06-06 AU AU69842/74A patent/AU6984274A/en not_active Expired
- 1974-06-07 BE BE145202A patent/BE816067A/en unknown
- 1974-06-07 JP JP6418874A patent/JPS5053106A/ja active Pending
- 1974-06-08 DE DE19742427788 patent/DE2427788A1/en active Pending
- 1974-06-10 IT IT2380774A patent/IT1014922B/en active
- 1974-06-10 FR FR7419978A patent/FR2232781A1/en active Granted
- 1974-06-10 NL NL7407727A patent/NL7407727A/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04506505A (en) * | 1989-03-17 | 1992-11-12 | プレジデント・アンド・フェローズ・オブ・ハーバード・カレッジ | Zinc oxyfluoride transparent conductor |
Also Published As
| Publication number | Publication date |
|---|---|
| AU6984274A (en) | 1975-12-11 |
| FR2232781B3 (en) | 1977-04-08 |
| DE2427788A1 (en) | 1975-01-02 |
| BE816067A (en) | 1974-09-30 |
| IT1014922B (en) | 1977-04-30 |
| NL7407727A (en) | 1974-12-10 |
| FR2232781A1 (en) | 1975-01-03 |