FR2232781B3 - - Google Patents

Info

Publication number
FR2232781B3
FR2232781B3 FR7419978A FR7419978A FR2232781B3 FR 2232781 B3 FR2232781 B3 FR 2232781B3 FR 7419978 A FR7419978 A FR 7419978A FR 7419978 A FR7419978 A FR 7419978A FR 2232781 B3 FR2232781 B3 FR 2232781B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7419978A
Other languages
French (fr)
Other versions
FR2232781A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GCP Products UK Ltd
WR Grace and Co Conn
Original Assignee
WR Grace Ltd
WR Grace and Co Conn
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace Ltd, WR Grace and Co Conn filed Critical WR Grace Ltd
Publication of FR2232781A1 publication Critical patent/FR2232781A1/en
Application granted granted Critical
Publication of FR2232781B3 publication Critical patent/FR2232781B3/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7419978A 1973-06-08 1974-06-10 Prc5printing pla0e prodn. using laser beam - to form image by perforation of metallised plastic sheet, followed by photopolymsn. Granted FR2232781A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US36815473A 1973-06-08 1973-06-08

Publications (2)

Publication Number Publication Date
FR2232781A1 FR2232781A1 (en) 1975-01-03
FR2232781B3 true FR2232781B3 (en) 1977-04-08

Family

ID=23450066

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7419978A Granted FR2232781A1 (en) 1973-06-08 1974-06-10 Prc5printing pla0e prodn. using laser beam - to form image by perforation of metallised plastic sheet, followed by photopolymsn.

Country Status (7)

Country Link
JP (1) JPS5053106A (en)
AU (1) AU6984274A (en)
BE (1) BE816067A (en)
DE (1) DE2427788A1 (en)
FR (1) FR2232781A1 (en)
IT (1) IT1014922B (en)
NL (1) NL7407727A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1540413A (en) * 1976-01-21 1979-02-14 Eocom Corp Scanning system for the production of copies
US4419675A (en) * 1979-05-24 1983-12-06 American Hoechst Corporation Imaging system and method for printed circuit artwork and the like
JPS59114543A (en) * 1982-12-15 1984-07-02 ロネオ・アルカテル・リミテツド Opaque recording sheet and manufacture of offset lithographic plate using same
EP0164461A1 (en) * 1984-06-06 1985-12-18 Roneo Alcatel Limited IMprovements in or relating to electro-sensitive materials
NL8802928A (en) * 1988-11-28 1990-06-18 Stork Screens Bv A METHOD AND APPARATUS FOR FORMING A RESISTANT PATTERN ON A CYLINDRICAL ART AND A METAL CYLINDER CREATED BY THE USE OF SUCH A RESISTANCE PATTERN.
US4990286A (en) * 1989-03-17 1991-02-05 President And Fellows Of Harvard College Zinc oxyfluoride transparent conductor
US4985116A (en) * 1990-02-23 1991-01-15 Mint-Pac Technologies, Inc. Three dimensional plating or etching process and masks therefor
WO1997042547A1 (en) * 1996-05-02 1997-11-13 Windi Winderlich Gmbh Process and device for preparation of exposed typesetting films for phototypesetting
WO1998016874A1 (en) * 1996-10-16 1998-04-23 J.G. Systems Inc. Process for imaging a flexo-graphic printing plate from liquid photopolymers and without using phototools

Also Published As

Publication number Publication date
IT1014922B (en) 1977-04-30
DE2427788A1 (en) 1975-01-02
AU6984274A (en) 1975-12-11
BE816067A (en) 1974-09-30
FR2232781A1 (en) 1975-01-03
JPS5053106A (en) 1975-05-12
NL7407727A (en) 1974-12-10

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Legal Events

Date Code Title Description
ST Notification of lapse