NL7209179A - - Google Patents

Info

Publication number
NL7209179A
NL7209179A NL7209179A NL7209179A NL7209179A NL 7209179 A NL7209179 A NL 7209179A NL 7209179 A NL7209179 A NL 7209179A NL 7209179 A NL7209179 A NL 7209179A NL 7209179 A NL7209179 A NL 7209179A
Authority
NL
Netherlands
Application number
NL7209179A
Other versions
NL165604C (nl
NL165604B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7209179A publication Critical patent/NL7209179A/xx
Publication of NL165604B publication Critical patent/NL165604B/xx
Application granted granted Critical
Publication of NL165604C publication Critical patent/NL165604C/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/248—Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H01J37/292—Reflection microscopes using scanning ray

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
NL7209179.A 1970-06-15 1972-06-30 Veldmissie-elektonenmicroscoop. NL165604C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US4642570A 1970-06-15 1970-06-15
US17181571A 1971-08-16 1971-08-16

Publications (3)

Publication Number Publication Date
NL7209179A true NL7209179A (de) 1973-02-20
NL165604B NL165604B (nl) 1980-11-17
NL165604C NL165604C (nl) 1981-04-15

Family

ID=26723901

Family Applications (2)

Application Number Title Priority Date Filing Date
NL7108096.A NL161297C (nl) 1970-06-15 1971-06-14 Veldemissie-elektronenkanon.
NL7209179.A NL165604C (nl) 1970-06-15 1972-06-30 Veldmissie-elektonenmicroscoop.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL7108096.A NL161297C (nl) 1970-06-15 1971-06-14 Veldemissie-elektronenkanon.

Country Status (7)

Country Link
US (2) US3678333A (de)
AU (1) AU466190B2 (de)
CA (1) CA950592A (de)
DE (2) DE2129636C2 (de)
FR (2) FR2099295A5 (de)
GB (2) GB1355365A (de)
NL (2) NL161297C (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5217392B1 (de) * 1970-09-18 1977-05-14
JPS5015109B1 (de) * 1970-12-24 1975-06-02
US3921078A (en) * 1971-04-20 1975-11-18 Jeol Ltd Breakdown protection for field emission electron gun
JPS5318862B1 (de) * 1971-07-19 1978-06-17
DE2151167C3 (de) * 1971-10-14 1974-05-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahl-Mikroanalysator mit Auger-Elektronen-Nachweis
CA976594A (en) * 1972-02-14 1975-10-21 Vincent J. Coates Field emission electron gun
JPS5420828B2 (de) * 1972-06-09 1979-07-25
DE2234381C3 (de) * 1972-07-10 1975-10-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahl-Beleuchtungssystem
US3809899A (en) * 1972-08-17 1974-05-07 Tektronix Inc Electron-beam tube including a thermionic-field emission cathode for a scanning electron microscope
NL7213355A (de) * 1972-10-03 1974-04-05
JPS49112565A (de) * 1973-02-23 1974-10-26
US3842272A (en) * 1973-07-24 1974-10-15 American Optical Corp Scanning charged particle microprobe with external spurious electric field effect correction
US4041316A (en) * 1974-09-20 1977-08-09 Hitachi, Ltd. Field emission electron gun with an evaporation source
US3946268A (en) * 1974-10-21 1976-03-23 American Optical Corporation Field emission gun improvement
DE2548831C2 (de) * 1974-12-20 1985-11-14 Nanometrics Inc., Sunnyvale, Calif. Impulsgenerator für Rasteranzeigegeräte
DE2819165A1 (de) * 1978-05-02 1979-11-15 Siemens Ag Rasterelektronenmikroskop
FR2527383A1 (fr) * 1982-05-24 1983-11-25 Univ Reims Champagne Ardenne Canon a electrons avec cathode a emission de champ et lentille magnetique
US4663525A (en) * 1985-07-08 1987-05-05 Nanometrics Incorporated Method for electron gun alignment in electron microscopes
WO1988002180A1 (en) * 1986-09-18 1988-03-24 Crewe Albert V Differential pressure electron beam system, method and gun
JPH0640475B2 (ja) * 1988-01-25 1994-05-25 日本電子株式会社 電界放出型電子銃
US4833362A (en) * 1988-04-19 1989-05-23 Orchid One Encapsulated high brightness electron beam source and system
US5150001A (en) * 1990-04-10 1992-09-22 Orchid One Corporation Field emission electron gun and method having complementary passive and active vacuum pumping
DE69131870T2 (de) * 1990-08-10 2000-08-17 Koninklijke Philips Electronics N.V., Eindhoven Ladungsträgerstrahl-Vorrichtung
US5401973A (en) * 1992-12-04 1995-03-28 Atomic Energy Of Canada Limited Industrial material processing electron linear accelerator
US5698942A (en) * 1996-07-22 1997-12-16 University Of North Carolina Field emitter flat panel display device and method for operating same
JP3147227B2 (ja) * 1998-09-01 2001-03-19 日本電気株式会社 冷陰極電子銃
EP1122761B1 (de) * 2000-02-01 2004-05-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Optische Säule für Teilchenstrahlvorrichtung
JP4262158B2 (ja) * 2004-07-13 2009-05-13 株式会社日立ハイテクサイエンスシステムズ 低真空走査電子顕微鏡
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
EP1983548A1 (de) * 2007-04-20 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitterkammer, Ladungsträgerteilchenstrahlvorrichtung und Bedienungsverfahren
US9189728B2 (en) 2009-07-23 2015-11-17 I-Property Holding Corp. Method for the authentication of dosage forms
WO2011096227A1 (ja) * 2010-02-08 2011-08-11 株式会社日立ハイテクノロジーズ 荷電粒子顕微鏡及びイオン顕微鏡
US8796638B2 (en) 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for a gas analysis with a two-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US8796620B2 (en) * 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US8450681B2 (en) 2011-06-08 2013-05-28 Mks Instruments, Inc. Mass spectrometry for gas analysis in which both a charged particle source and a charged particle analyzer are offset from an axis of a deflector lens, resulting in reduced baseline signal offsets
US9224572B2 (en) * 2012-12-18 2015-12-29 General Electric Company X-ray tube with adjustable electron beam
US10297416B2 (en) 2014-10-20 2019-05-21 Hitachi High-Technologies Corporation Scanning electron microscope
US9981293B2 (en) * 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE735313C (de) * 1937-06-30 1943-05-12 Aeg Einrichtung zur Erzeugung eines vorzugsweise intensitaetsgesteuerten Elektronenstrahles durch Feldemission einer mit einer Spitze versehenen kalten Kathode unter Verwendung eines elektronenoptischen Abbildungssystems
US2243362A (en) * 1938-08-20 1941-05-27 Thomas W Sukumlyn Electron microscope system
US2363359A (en) * 1941-05-01 1944-11-21 Gen Electric Electron microscope
US2289071A (en) * 1941-10-03 1942-07-07 Gen Electric Electron lens
FR937296A (fr) * 1947-06-21 1948-08-12 Csf Perfectionnements aux dispositifs de mise au point, pour microscope électronique
BE481554A (de) * 1947-06-26
US3090882A (en) * 1960-04-13 1963-05-21 Rca Corp Electron gun
US3191028A (en) * 1963-04-22 1965-06-22 Albert V Crewe Scanning electron microscope
US3394874A (en) * 1967-02-09 1968-07-30 Gen Electrodynamics Corp Ion pumping electron gun

Also Published As

Publication number Publication date
US3678333A (en) 1972-07-18
DE2129636C2 (de) 1986-04-10
NL161297C (nl) 1980-01-15
NL165604C (nl) 1981-04-15
US3784815A (en) 1974-01-08
AU466190B2 (en) 1973-12-13
FR2149412B1 (de) 1978-02-03
FR2099295A5 (de) 1972-03-10
GB1355365A (en) 1974-06-05
DE2235903A1 (de) 1973-03-01
DE2129636A1 (de) 1971-12-23
NL165604B (nl) 1980-11-17
NL161297B (nl) 1979-08-15
GB1378554A (en) 1974-12-27
AU4319672A (en) 1973-12-13
NL7108096A (de) 1971-12-17
CA950592A (en) 1974-07-02
DE2235903C2 (de) 1986-04-17
FR2149412A1 (de) 1973-03-30

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Legal Events

Date Code Title Description
BK Erratum
SNR Assignments of patents or rights arising from examined patent applications

Owner name: WARNER LAMBERT TECHNOLOGIES, INC.

SNR Assignments of patents or rights arising from examined patent applications

Owner name: NANOMETRICS, INC.

V4 Discontinued because of reaching the maximum lifetime of a patent